ELECTRONIC DEVICE AND METHOD FOR DETERMINING CAUSE OF MOUNTING DEFECT IN COMPONENTS MOUNTED ON SUBSTRATE

    公开(公告)号:EP3634101A1

    公开(公告)日:2020-04-08

    申请号:EP19812895.1

    申请日:2019-06-28

    IPC分类号: H05K13/08 H04N17/00 G03B43/00

    摘要: A method for determining a cause of a mounting failure for a component mounted on a substrate, which is performed by an electronic apparatus, comprises: receiving an inspection result of a mounting failure for each of a plurality of first components determined by inspecting a plurality of substrates of a first type; calculating a mounting failure rate of each of the plurality of first components using the inspection result; determining a plurality of second components in which a mounting failure has occurred based on the mounting failure rate; and determining a cause of the mounting failure for each of the plurality of second components as at least one of a component mounting position setting error, a mounting condition setting error according to a component type and a defect of a nozzle, based on the mounting failure rate of each of the plurality of first components.

    OCT SYSTEM, METHOD OF GENERATING OCT IMAGE AND STORAGE MEDIUM

    公开(公告)号:EP3572766A1

    公开(公告)日:2019-11-27

    申请号:EP19175284.9

    申请日:2019-05-20

    IPC分类号: G01B9/02

    摘要: The present disclosure relates to a method of correcting a three-dimensional image. To correct an image distorted by coherence gate curvature (CGC) occurring by an optical system, the method generates a three-dimensional image of a sample holder on which an object to be measured is placed from an interference signal, generates a CGC profile on the basis of an image of a cover glass of the sample holder appearing in the three-dimensional image, generates a CGC fitting curve from the CGC profile, and corrects the interference signal by using the CGC fitting curve. The present disclosure also relates to an OCT system capable of performing a method of correcting a three-dimensional image.

    APPARATUS FOR INSPECTING SUBSTRATE AND METHOD THEREOF

    公开(公告)号:EP3489620A1

    公开(公告)日:2019-05-29

    申请号:EP18208784.1

    申请日:2018-11-28

    IPC分类号: G01B11/06 G01B9/02

    摘要: A substrate inspection apparatus is disclosed. The substrate inspection apparatus according to the present disclosure may include: a light source configured to radiate laser light onto a coated film that is spread on a region of a substrate; a light detector configured to obtain optical interference data on an interference between reference light, that is generated by the laser light being reflected from a surface of the coated film, and measurement light, that is generated by the laser light penetrating the coated film and being scattered; and a processor configured to derive a thickness of the coated film corresponding to the region, based on the optical interference data.

    BIOLOGICAL TISSUE INSPECTION DEVICE AND METHOD THEREFOR

    公开(公告)号:EP3456244A1

    公开(公告)日:2019-03-20

    申请号:EP17796423.6

    申请日:2017-05-12

    摘要: A biological tissue inspection device is disclosed. The biological tissue inspection device comprises a stage portion and a probe portion. The probe portion comprises an optical imaging portion, an optical interference detection portion, and an optical induction portion. An inspection object is loaded on the stage portion. The probe portion acquires data regarding optical images and optical interference, which are related to the inspection object, through the optical imaging portion and the optical interference detection portion. The stage portion or the probe portion may move such that a selected area of the inspection object is positioned in the FOV of the optical imaging portion and of the optical interference detection portion. The optical induction portion is configured such that illumination light from the optical imaging portion and measurement light from the optical interference detection portion are coaxially emitted to the inspection object. A guide beam may be additionally emitted to display the area that is being measured. A magnification changing portion is included to adjust the magnification of the measured image. As lenses are changed by the magnification changing portion, the position of a reference mirror included in the optical interference detection portion is changed together in order to correct the optical path difference.

    PATTERNED LIGHT IRRADIATION APPARATUS AND METHOD

    公开(公告)号:EP3425437A1

    公开(公告)日:2019-01-09

    申请号:EP17760352.9

    申请日:2017-03-03

    发明人: HONG, Jong Kyu

    摘要: A patterned light irradiation apparatus is enclosed. The patterned light irradiation apparatus comprises a light source, a pattern grating, a diaphragm, wherein the pattern grating includes a stripe shape in a form including repetition of a transmission part and a shielding part, and the diaphragm includes an aperture having a sinusoidal wave-shaped cross section. When the patterned light irradiation apparatus irradiates patterned light to a subject, the patterned irradiation apparatus performs defocusing and thus can irradiate patterned light having an ideal sinusoidal form to the subject. Therefore, a three-dimensional image of high quality can be acquired.