REACTEUR ET PROCEDE POUR DEPOT CHIMIQUE EN PHASE VAPEUR
    13.
    发明授权
    REACTEUR ET PROCEDE POUR DEPOT CHIMIQUE EN PHASE VAPEUR 有权
    CVD反应器和方法及其操作方法

    公开(公告)号:EP1049813B1

    公开(公告)日:2006-08-23

    申请号:EP99956143.4

    申请日:1999-11-25

    发明人: LEYCURAS, André

    IPC分类号: C23C16/46 C30B25/10

    摘要: The invention concerns a method for chemical vapour deposition of coats of a material on a substrate (10) extending globally in a plane, comprising: a step which consists in arranging the substrate (10) in a conduit (6) made of a refractory material and swept by the gas components required for deposition, said conduit (6) being interposed between the substrate (10) and first (8) and second (9) heating means, located on either side of the substrate (10) plane, characterised in that it further comprises a step which consists in heating the substrate (10) by the thermal radiation from the conduit (10) which is itself heated by the first (8) and second (9) heating means.

    Method of preparing a compound semiconductor crystal doped with carbon
    14.
    发明公开
    Method of preparing a compound semiconductor crystal doped with carbon 有权
    一种用于生产碳掺杂的化合物半导体晶体的制造方法

    公开(公告)号:EP1428912A3

    公开(公告)日:2004-06-23

    申请号:EP04003550.3

    申请日:1998-03-25

    CPC分类号: C30B29/42 C30B11/06 C30B11/12

    摘要: There is provided a method of preparing a compound semiconductor crystal, allowing the compound semiconductor crystal to be doped with carbon in high reproducibility. The method includes the steps of sealing a semiconductor raw material and a boron oxide based substance in a gas-impermeable airtight vessel and increasing a temperature of said airtight vessel to melt said raw material and said boron oxide based substance in said airtight vessel and thereby form a melted material from said raw material; and decreasing said temperature of said airtight vessel to solidify said melted material and thereby grow said compound semiconductor crystal containing a resultant content of said carbon, selecting a partial pressure of a carbon oxide gas, and making said carbon oxide gas coexistent with said melted material, so that said resultant content of said carbon is dependent on said selected partial pressure of said carbon oxide gas. With this method, a compound semiconductor crystal with a carbon concentration of 0.1 X 10 15 cm -3 to 20 X 10 15 cm -3 is also prepared in high reproducibility.

    Method of preparing a compound semiconductor crystal doped with carbon
    15.
    发明公开
    Method of preparing a compound semiconductor crystal doped with carbon 有权
    制备掺杂有碳的化合物半导体晶体的方法

    公开(公告)号:EP1428912A2

    公开(公告)日:2004-06-16

    申请号:EP04003550.3

    申请日:1998-03-25

    CPC分类号: C30B29/42 C30B11/06 C30B11/12

    摘要: There is provided a method of preparing a compound semiconductor crystal, allowing the compound semiconductor crystal to be doped with carbon in high reproducibility. The method includes the steps of sealing a semiconductor raw material and a boron oxide based substance in a gas-impermeable airtight vessel and increasing a temperature of said airtight vessel to melt said raw material and said boron oxide based substance in said airtight vessel and thereby form a melted material from said raw material; and decreasing said temperature of said airtight vessel to solidify said melted material and thereby grow said compound semiconductor crystal containing a resultant content of said carbon, selecting a partial pressure of a carbon oxide gas, and making said carbon oxide gas coexistent with said melted material, so that said resultant content of said carbon is dependent on said selected partial pressure of said carbon oxide gas. With this method, a compound semiconductor crystal with a carbon concentration of 0.1 X 10 15 cm -3 to 20 X 10 15 cm -3 is also prepared in high reproducibility.

    摘要翻译: 提供了制备化合物半导体晶体的方法,使化合物半导体晶体以高重现性掺杂有碳。 该方法包括以下步骤:在不透气的气密容器中密封半导体原料和氧化硼基物质,并升高所述气密容器的温度以熔化所述气密容器中的所述原料和所述氧化硼基物质,从而形成 来自所述原材料的熔融材料; 并降低所述气密容器的所述温度以固化所述熔融材料,由此使包含所得碳含量的所述化合物半导体晶体生长,选择碳氧化物气体的分压,并使所述碳氧化物气体与所述熔化材料共存, 使得所述碳的所述所得含量取决于所述选定的所述碳氧化物气体的分压。 利用该方法,还以高重复性制备碳浓度为0.1×1015cm-3至20×1015cm-3的化合物半导体晶体。