摘要:
We are familiar with etching printed circuit boards chemically by providing a copper board with a mask and etching copper away chemically at those points where the mask is not present. This is disadvantageous, e.g. from environmental standpoints, because the chemical liquid is increasingly enriched with copper, and, when the liquid has been used, it can no longer be employed and is also difficult to dispose of. The invention is based on the object of providing a method of either applying or removing conductive material electrically. The inventive method of removing electrically conductive material from a printed circuit board having an etching mask, which covers the conductor structure, arranged on it is characterized by the fact that the following steps are carried out:
a) the printed circuit board, together with an electrode, is placed in an electrolytic liquid, b) voltages of different potential are applied to the printed circuit board and the electrode, and c) electrically conductive material is removed from the printed circuit board.
摘要:
The present invention concerns an electrochemical pattern replication method, ECPR, and a construction of a conductive electrode for production of applications involving micro and nano structures. An etching or plating pattern, which is defined by a conductive electrode, a master electrode (8), is replicated on an electrically conductive material, a substrate (9). The master electrode (8) is put in close contact with the substrate (9) and the etching/plating pattern is directly transferred onto the substrate (9) by using a contact etching/plating process. The contact etching/plating process is performed in local etching/plating cells (12,14), that are formed in closed or open cavities between the master electrode (8) and the substrate (9).
摘要:
A method for monitoring a substrate patterning process, wherein at least two electrodes (2, 3) are used to apply a voltage to the substrate (1) to cause a reaction in a portion of the substrate, comprises recording a current driven by said voltage as a function of time and/or as a function of a position of the substrate (1) or a patterning mask. Also disclosed are a device and a computer program product for monitoring the substrate patterning process.
摘要:
Bei einem Verfahren zur Behandlung von elektrisch leitfähigen Substraten wie Leiterplatten, gedruckten Schaltungen und dergleichen, bei dem vorzugsweise mindestens ein Metall in einem Elektrolyten durch ein elektrisches Feld, das zwischen dem Substrat und einer vorzugsweise kathodisch geschalteten Elektrode angelegt wird, mindestens teilweise elektrochemisch abgetragen wird, sind Bereiche des Substrats, insbesondere der Substratoberfläche, zeitweise gegen das elektrische Feld abgeschirmt.
摘要:
The invention is based on the object of providing a method of either applying or removing conductive material electrically. The inventive method of removing electrically conductive material from a printed circuit board (PL) having an etching mask, which covers the conductor structure, arranged on it is characterized by the fact that the following steps are carried out: a) the printed circuit board (PL), together with an electrode (ELC), is placed in an electrolytic liquid (E), b) voltages of different potential are applied to the printed circuit board (PL) and the electrode (ELC), and c) electrically conductive material is removed from the printed circuit board (PL).