公开(公告)号：EP3206083A1

公开(公告)日：2017-08-16

申请号：EP16205778.0

申请日：2004-10-12

申请人： Nikon Corporation

发明人： Yasuda, Masahiko ,  Masada, Takahiro ,  Kanaya, Yuho ,  Nagayama, Tadashi ,  Shiraishi, Kenichi

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70141 ,  G03F7/70716 ,  G03F9/7088

摘要： An exposure apparatus for exposing a substrate by projecting a pattern image onto the substrate through a liquid in a liquid immersion area formed locally on the substrate, the exposure apparatus comprising:
a projection optical system for projecting the pattern image onto the substrate;
a substrate stage having a substrate holder for holding the substrate and which is movable while holding the substrate on the substrate holder;
a first detecting system for detecting an alignment mark on the substrate held by the substrate stage not through the liquid; and
a second detecting system for detecting a projection position of the image by using a reference provided on the substrate stage through the liquid,
wherein:
the reference is covered with a light-transmissive material; and
the exposure apparatus is configured such that the projection position of the pattern image is detected through the liquid by using the second detecting system and the reference when the substrate or a dummy substrate is arranged on the substrate holder.

摘要翻译： 一种曝光装置，用于通过将图案图像通过在基板上局部形成的液浸区域中的液体投影到基板上来曝光基板，曝光装置包括：投影光学系统，用于将图案图像投影到基板上; 衬底台，其具有用于保持所述衬底的衬底保持器并且能够在将所述衬底保持在所述衬底保持器上的同时移动; 第一检测系统，用于不通过液体来检测由衬底台保持的衬底上的对准标记; 以及第二检测系统，用于通过使用通过液体设置在基板台上的基准来检测图像的投影位置，其中：基准由透光材料覆盖; 并且曝光设备被配置为使得当基板或虚设基板布置在基板保持器上时，通过使用第二检测系统和基准通过液体来检测图案图像的投影位置。

公开(公告)号：EP3098835B1

公开(公告)日：2017-07-26

申请号：EP16167248.0

申请日：2005-06-21

申请人： Nikon Corporation

发明人： NAGASAKA, Hiroyuki ,  SHIRAISHI, Kenichi

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus EXS forms an immersion area AR2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure apparatus EXS has an optical cleaning unit (80) which irradiates a predetermined irradiation light Lu, having an optical cleaning effect, onto, for example, the upper surface (31) of the substrate stage PST which makes contact with the liquid LQ for forming the immersion area AR2. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

公开(公告)号：EP3064999B1

公开(公告)日：2017-07-26

申请号：EP16163509.9

申请日：2007-08-31

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F9/00 ,  G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/7085 ,  G03F9/7088

摘要： During the drive of a stage (WST), positional information in a movement plane of the stage (WST) is measured by three encoders (Enc1 Enc2, and Enc3) that include at least one each of an X encoder and a Y encoder of an encoder system, and a controller switches the encoders used for a measurement of positional information of the stage (WST) in the movement plane from the encoders (Enc1 Enc2, and Enc3) to encoders (Enc4, Enc2, and Enc3) so that the position of the stage (WST) in the movement plane is maintained before and after the switching. Therefore, although the switching of the encoders used for controlling the position of the stage is performed, the position of the stage in the movement plane is maintained before and after the switching, and a correct linkage becomes possible.

摘要翻译： 在阶段（WST）的驱动期间，阶段（WST）的移动平面中的位置信息由三个编码器（Enc1 Enc2和Enc3）测量，所述三个编码器分别包括X编码器和Y编码器中的至少一个 编码器系统，并且控制器将用于测量移动平面中的工作台（WST）的位置信息的编码器从编码器（Enc1 Enc2和Enc3）切换到编码器（Enc4，Enc2和Enc3），使得位置 （WST）在切换前后保持在运动平面内。 因此，尽管执行用于控制平台位置的编码器的切换，但在切换之前和之后维持移动平面中平台的位置，并且能够进行正确的连接。

公开(公告)号：EP2963498B8

公开(公告)日：2017-07-26

申请号：EP15178235.6

申请日：2007-01-19

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G01B11/27 ,  G01D5/26 ,  G01D5/266 ,  G01D18/002 ,  G03F7/70141 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70516 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70975 ,  Y10T29/49826

摘要： Positional information of a movable body (RST) in a Y-axis direction is measured using an interferometer (16y) and an encoder ((24A, 26A 1 ), (24B, 26B 1 )) whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining correction information for correcting measurement values of the encoder is performed. Accordingly, by using measurement values of the interferometer, correction information for correcting the measurement values of the encoder whose short-term stability of the measurement values excels the interferometer is obtained. Then, based on the measurement values of the encoder and the correction information, the movable body is driven in the Y-axis direction with good precision.

公开(公告)号：EP3057122A4

公开(公告)日：2017-07-05

申请号：EP13895305

申请日：2013-10-08

申请人： NIPPON KOGAKU KK

发明人： SATO SHINJI

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70341

摘要： A liquid immersion member (4A) forms, in an exposure apparatus (EX1), liquid immersion space (LS) through which exposure light (EL) emitted from an optical member (3) passes, the liquid immersion member includes: a first member (41) that is disposed at at least part of a space around the optical member and that includes a first lower surface (4111) facing an object (5, 51, 52, 6, 61) which is movable below the optical member; and a movable second member (42) that includes a second lower surface (4211) which is disposed at outer side than the first lower surface viewed from optical axis (AX) of the optical member and which faces the object and a third lower surface (4221) which is disposed at inner side than the second lower surface viewed from the optical axis and whose at least part is disposed above at least part of the first lower surface.

摘要翻译： 液浸构件（4A）在曝光装置（EX1）中形成有从光学构件（3）射出的曝光用光（EL）所通过的液浸空间（LS），该液浸构件具备：第一构件 41），其配置在所述光学部件的周围的至少一部分空间中，并具有与能够在所述光学部件的下方移动的物体（5,51,52,6,61）相对的第一下表面（4111） 以及可动第二部件（42），其包括第二下表面（4211），所述第二下表面（4211）设置在所述光学部件的从光轴（AX）观察的第一下表面的外侧并且面向所述物体，并且第三下表面 4221），其从光轴看位于比第二下表面靠内侧的位置，并且至少一部分位于第一下表面的至少一部分的上方。

公开(公告)号：EP2660854B1

公开(公告)日：2017-06-21

申请号：EP13174487

申请日：2006-05-08

申请人： NIPPON KOGAKU KK

发明人： OMURA YASUHIRO ,  OKADA TAKAYA ,  NAGASAKA HIROYUKI

IPC分类号： G03F7/20 ,  G02B1/06 ,  G02B13/24 ,  G02B17/08 ,  G02B21/33 ,  H01L21/027

CPC分类号： G03F7/70725 ,  G02B1/06 ,  G02B17/08 ,  G02B17/0892 ,  G02B21/33 ,  G03F7/702 ,  G03F7/70225 ,  G03F7/70341

摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

摘要翻译： 具有例如反射折射和离轴结构的浸没式投影光学系统减少了充满液体（浸没液体）的图像空间的部分。 通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。 折射光学元件包括发光表面（Lpb），该发光表面（Lpb）被成形为关于在第二平面上彼此垂直的两个轴向（XY轴）基本对称。 发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆形（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。 发光面的中心轴从光轴（AX）在两个轴向（Y轴）中的一个轴向偏心。

公开(公告)号：EP1865541A4

公开(公告)日：2017-06-14

申请号：EP06730630

申请日：2006-03-30

申请人： NIPPON KOGAKU KK

发明人： NAGASAKA HIROYUKI ,  HAGIWARA TSUNEYUKI

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/706

摘要： A liquid immersion region (LR) is formed on a measuring member (65) by use of the liquid immersion mechanism (1), and measurement is performed by receiving measurement light through liquid (LQ) which forms the liquid immersion region (LR), in order to determine an exposure condition of a substrate (P). The substrate (P) is exposed by taking into account a difference between a pressure of the liquid (LQ) in the process of measurement and that in the process of exposure and a result of the measurement thus performed.

摘要翻译： 利用液浸机构（1）在测定部件（65）上形成液浸区域（LR），通过接受形成液浸区域（LR）的液体（LQ）的测定光来进行测定， 以确定衬底（P）的暴露条件。 考虑测量过程中的液体压力（LQ）与暴露过程中的液体压力（LQ）之间的差异以及由此执行的测量结果，曝光基板（P）。

公开(公告)号：EP3172623A1

公开(公告)日：2017-05-31

申请号：EP15729193.1

申请日：2015-06-18

申请人： ASML Netherlands B.V.

发明人： VAN SOMMEREN, Daan, Daniel, Johannes, Antonius ,  FRACKOWIAK, Bruno, Jean, François ,  KOOLMA, Arend

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/20 ,  G03F7/2041 ,  H01L21/0274

摘要： A fluid handling structure, an immersion lithographic apparatus and a device manufacturing method are disclosed. In one arrangement, a fluid handling structure has a fluid extraction conduit with a recovery port configured to receive a used fluid into the conduit. A plurality of flow breakers are provided that each extends across at least a portion of the conduit. The flow breakers are positioned downstream of the recovery port. The flow breakers are arranged so that a common plane cuts through at least a portion of two or more of the flow breakers. The common plane is aligned so as to be perpendicular to the average direction of flow in the conduit at the position of the common plane.

摘要翻译： 公开了流体处理结构，浸没式光刻设备和器件制造方法。 在一种布置中，流体处理结构具有带有回收端口（73）的流体抽取导管（102），该回收端口（73）被配置为将用过的流体（106）接收到导管中。 提供多个断流器（108），每个断流器延伸穿过导管的至少一部分。 断流器位于回收口的下游。 断流器布置成使得公共平面切穿两个或更多个断流器的至少一部分。 公共平面对齐，以便与公共平面位置处的导管中的平均流动方向垂直。

公开(公告)号：EP3171220A1

公开(公告)日：2017-05-24

申请号：EP16197284.9

申请日：2007-01-19

申请人： Nikon Corporation

发明人： Shibazaki, Yuichi

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G01B11/27 ,  G01D5/26 ,  G01D5/266 ,  G01D18/002 ,  G03F7/70141 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70516 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70975 ,  Y10T29/49826

摘要： An exposure apparatus (100) for exposing a substrate (W) via a projection optical system (PL), the apparatus comprising an encoder system for measuring positional information of a movable body by irradiating each of four areas (52A, 52B, 52C, 52D), in which a grating (44) is formed, with a beam via each of four heads (46A, 46B, 46C, 46D). A controller controls the drive of the movable body such that as the movable body moves, a relationship between the grating and the heads changes between a first state and a second state. In the first state, the four heads respectively face the four areas. In the second state, only three of the heads respectively face three areas of the four areas, such that none of the heads face a fourth one of the four areas.

摘要翻译： 一种用于通过投影光学系统（PL）曝光衬底（W）的曝光设备（100），该设备包括编码器系统，用于通过照射四个区域（52A，52B，52C，52D）中的每一个来测量可移动体的位置信息 ），其中形成光栅（44），其中光束通过四个头（46A，46B，46C，46D）中的每一个形成。 控制器控制可移动体的驱动，使得随着可移动体的移动，光栅与头之间的关系在第一状态和第二状态之间变化。 在第一种状态下，四个头分别面向四个区域。 在第二状态中，只有三个头分别面对四个区域中的三个区域，使得没有一个头朝向四个区域中的第四个。

公开(公告)号：EP3163375A1

公开(公告)日：2017-05-03

申请号：EP16183984

申请日：2004-08-27

申请人： NIPPON KOGAKU KK

发明人： ARAI DAI ,  HARA HIDEAKI ,  TAKAIWA HIROAKI

IPC分类号： G03F7/20 ,  G03B27/42 ,  H01L21/027

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.

摘要翻译： 曝光设备通过经由投影光学系统和填充投影光学系统和基板之间的间隙的液体将图案的图像投影到基板上来曝光基板。 该曝光装置具有液体回收机构，该液体回收机构具有由商用电源供应的电力驱动的驱动部分以及与商用电源分离的不间断电源。 当商用电源发生故障时，驱动部分的电力供应被切换到不间断电源。