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    F2 laser with visible red and IR control
    36.
    发明公开
    F2 laser with visible red and IR control 有权
    F2激光与可见的红光和IR范围的控制

    公开(公告)号：EP1100167A3

    公开(公告)日：2002-03-27

    申请号：EP00111119.4

    申请日：2000-05-23

    申请人： Cymer, Inc.

    发明人： Onkels, Eckehard D. ,  Sandstrom, Richard L. ,  Duffey, Thomas P.

    IPC分类号： H01S3/225 ,  H01S3/097 ,  H01S3/03

    CPC分类号： H01S3/10092 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/225

    摘要： A reliable, modular, production quality F 2 excimer laser capable of producing, at repetition rates in the range of 1,000 to 2,000 Hz or greater, laser pulses with pulse energies greater than 10 mJ with a full width half, maximum bandwidth of about 1 pm or less at wavelength in the range of 157 nm. Laser gas concentrations are disclosed for reducing unwasted infrared emissions from the laser. Also disclosed are UV energy detectors which are substantially insensitive to infrared light. Preferred embodiments of the present invention can be operated in the range of 1000 to 4000 Hz with pulse energies in the range of 10 to 5 mJ with power outputs in the range of 10 to 40 watts. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.1 µm or less. Replaceable modules include a laser chamber and a modular pulse power system. In a preferred embodiment the laser was tuned to the F 2 157.6 nm line using a set of two external prisms. In a second preferred embodiment the laser is operated broad band and the 157.6 nm line is selected external to the resonance cavity. In a third preferred embodiment a line width of 0.2 pm is provided using injection seeding. Another embodiment utilizes a grating for line selection and increases the tuning range by operating the laser at a pressure in excess of 4 atmospheres.

    LASER PROCESSING POWER OUTPUT STABILIZATION
    38.
    发明公开
    LASER PROCESSING POWER OUTPUT STABILIZATION 有权
    镇定的激光加工功率级

    公开(公告)号：EP1150797A1

    公开(公告)日：2001-11-07

    申请号：EP00919278.2

    申请日：2000-02-10

    申请人： ELECTRO SCIENTIFIC INDUSTRIES, INC.

    发明人： BAIRD, Brian, W. ,  JORDENS, William, J. ,  SWARINGEN, Stephen, N.

    IPC分类号： B23K26/06 ,  B23K26/08

    CPC分类号： B23K26/0853 ,  B23K26/0622 ,  G03F7/70041 ,  G03F7/70725

    摘要： A Q-switched solid state laser system (24) operates in a pulse processing control system (10) that employs an autopulse mode and a pulse-on-position mode to stabilize the pulse-to-pulse laser energy delivered to a workpiece (20) that is moved by an X-Y positioner (18). In the autopulse mode, laser pulses are emitted at a near maximum PRF, but the pulses are blocked from reaching the workpiece by an external modulator (28, 32), such as an acousto-optic modulator ('AOM') or electro-optic modulator (also referred to as a Pockels cell). In the pulse-on-position mode, the laser emits a pulse in response to the positioner moving to a location on the workpiece that coincides with a commanded coordinate location. The processing control system delivers a stream of coordinate locations, some requiring processing, at a rate that moves the positioner and triggers the laser at about the near maximum PRF. The pulse processing control system sets the AOM to a transmissive state whenever a coordinate location requiring processing is commanded and otherwise sets the AOM to a blocking state. This pulse timing technique provides a nearly constant interpulse period for the laser, thereby improving its pulse-to-pulse energy stability at the near maximum PRF.

    ENERGY STABILIZED GAS DISCHARGE LASER
    39.
    发明公开
    ENERGY STABILIZED GAS DISCHARGE LASER 审中-公开
    ENERGIESTABILISIERTER GASENTLADUNGSLASER

    公开(公告)号：EP1147583A1

    公开(公告)日：2001-10-24

    申请号：EP00971649.9

    申请日：2000-10-16

    申请人： Lambda Physik AG

    发明人： STAMM, Uwe ,  BRAGIN, Igor ,  ZSCHOCKE, Wolfgang

    IPC分类号： H01S3/225 ,  H01S3/104

    CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/104 ,  H01S3/225 ,  H01S3/2251

    摘要： An excimer or molecular fluorine laser, such as a KrF- or ArF-laser, or a molecular fluorine (F2) laser, particularly for photolithography applications, has a gas mixture including a trace amount of a gas additive. The concentration of the gas additive in the gas mixture is optimized for improving energy stability and/or the overshoot control of the laser output beam. The concentration is further determined and adjusted at new fills and/or during laser operation based on its effect on the output pulse energy in view of constraints and/or aging on the discharge circuit and/or other components of the laser system. Attenuation control is also provided for increasing the lifetimes of components of the laser system by controlling the concentration of the gas additive over time. A specific preferred concentration of xenon is more than 100 ppm for improving the energy stability and/or overshoot control. The laser system may be equipped with an internal gas supply unit including an internal xenon gas supply, or a xenon generator for supplying xenon gas from condensed matter xenon.

    Very stable excimer or molecular fluorine laser
    40.
    发明公开
    Very stable excimer or molecular fluorine laser 有权
    Besondes稳定准分子或分子氟激光

    公开(公告)号：EP1037339A3

    公开(公告)日：2001-04-25

    申请号：EP00105119.2

    申请日：2000-03-10

    申请人： Lambda Physik AG

    发明人： Borneis, Stefan ,  Brunwinkel, Klaus ,  Stamm, Uwe, Dr. ,  Voss, Frank

    IPC分类号： H01S3/225

    CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225

    摘要： A technique of stabilizing during operation a gas mixture with a gas composition initially provided within a discharge chamber of an excimer or molecular fluorine gas discharge laser includes monitoring a temporal pulse shape of the laser beam and adjusting and/or determining the status of the gas mixture based on the monitored temporal pulse shape. The monitored temporal pulse shape is preferably compared with a reference temporal pulse shape. The difference or deviation between the monitored temporal pulse shape and a reference temporal pulse shape is calculated. The amounts of and intervals between gas replenishment actions are determined based on the calculated deviation. The energy of the beam is also monitored and the driving voltage and gas actions are adjusted to stabilize the energy, energy stability and/or energy dose.