Abstract:
An optical analysis tool includes an integrated computational element (ICE). The ICE includes a plurality of layers stacked along a first axis. Constitutive materials of the layers are electrically conductive and patterned with corresponding patterns. An arrangement of the patterns with respect to each other is related to a characteristic of a sample.
Abstract:
A system includes a computational system to receive a design of an integrated computational element (ICE) including specification of a substrate and a plurality of layers, their respective target thicknesses and complex indices, such that a notional ICE fabricated based on the ICE design is related to a characteristic of a sample. Additionally, the system includes a deposition chamber including a deposition source to provide a deposition plume having a plume spatial profile, and a support to support a plurality of instances of the substrate during fabrication of a plurality of instances of the ICE. The support is spaced apart from the deposition source and has a shape that corresponds to the plume spatial profile, such that when the supported instances of the substrate are distributed over the support, thicknesses of instances of each of the deposited layers are substantially uniform across the plurality of instances of the ICE.
Abstract:
A system includes a computational system to receive a design of an integrated computational element (ICE) including specification of a substrate and a plurality of layers, their respective target thicknesses and complex indices, such that a notional ICE fabricated based on the ICE design is related to a characteristic of a sample. Additionally, the system includes a deposition chamber including a deposition source to provide a deposition plume having a plume spatial profile, and a support to support a plurality of instances of the substrate during fabrication of a plurality of instances of the ICE. The support is spaced apart from the deposition source and has a shape that corresponds to the plume spatial profile, such that when the supported instances of the substrate are distributed over the support, thicknesses of instances of each of the deposited layers are substantially uniform across the plurality of instances of the ICE.
Abstract:
A lithography method and apparatus is disclosed herein. In a described embodiment, the method comprises (i) providing a first mask 316 having an exposure pattern 332,334 for forming a three dimensional structure; (ii) exposing the first mask 316 to radiation to form the exposure pattern 332,334 on a radiation-sensitive resist 314; the exposure pattern 332,334 defined by irradiated areas 336 and non-irradiated areas 337 of the resist 314; (ii) providing a second mask 328; and (iii) during exposure, changing relative positions (arrows B and C) between the first mask 316 and the second mask 328 to shield selected portions of the irradiated areas 336 from radiation to enable varying depth profiles to be created in the three dimensional structure.
Abstract:
A spectroscopic detector (110) includes a spectroscopic element (11) for dispersing light, a photodetector (12) for detecting the light dispersed by the spectroscopic element and a condensing optical system (13) for condensing the dispersed light to the photodetector and compensating for a deviation in a detected wavelength deriving from nonlinearity of the angle of emergence generated in the spectroscopic element through chromatic aberration of magnification.
Abstract:
Es wird ein differentieller Meßkopf für photoakustische Messungen zur Verfügung gestellt, der zwei oder mehrere Meßzellen enthält und wobei intensitätsmoduliertes Licht gleicher Wellenlängen in jeweils zwei benachbarten Meßzellen eingestrahlt wird. Die Vorteile der Erfindung liegen in einer höheren Empfindlichkeit für die zu messende Größe bei gleichzeitiger Immunität gegen Störungen von außen, in der Festellung und Kompensation von Inhomogenitäten in der Probenoberfläche z.B. in der Haut des Menschen und in einem vergrößerten Dynamikbereich.