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148 条记录 (耗时 0.016 秒)

    PROTECTIVE OVERCOAT FOR REPLICATED DIFFRACTION GRATINGS
    42.
    发明授权
    PROTECTIVE OVERCOAT FOR REPLICATED DIFFRACTION GRATINGS 有权
    保护再涂对复制衍射

    公开(公告)号：EP1340106B1

    公开(公告)日：2008-01-09

    申请号：EP01987291.0

    申请日：2001-11-07

    申请人： Cymer, Inc.

    发明人： PAN, Xiaojiang, J. ,  MORTON, Richard, G. ,  ERSHOV, Alexander, I.

    IPC分类号： G02B5/18 ,  C23C14/24

    CPC分类号： C23C14/225 ,  C23C14/0694 ,  C23C14/16 ,  C23C14/24 ,  G02B1/105 ,  G02B1/14 ,  G02B5/1847 ,  G02B5/1852 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70558 ,  G03F7/70575

    摘要： An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be cracked or have relatively thick grain boundaries containing oxides and hydroxides of aluminum and typically is also naturally coated with an aluminum oxide film. The grating is subsequently overcoated in a vacuum chamber with one or two thin, pure, dense aluminum overcoat layers and then also in the vacuum the aluminum overcoat layer or layers are coated with one or more thin protective layers of a material transparent to ultraviolet radiation. In preferred embodiments this protective layer is a single layer of MgF2, S1O2 or Al2O3. In other preferred embodiments the layer is a layer of MgF2 or S1O2 covered with a layer of Al2O3 and in a third preferred embodiment the protective layer is made up of four alternating layers of MgF2 and Al2O3 or four alternating layers of S1O2 and Al2O3. Preferably, the thickness of the transparent protective layers are chosen to produce a phase shift at the proposed operating wavelengths of an integral number of 2π.

    Polarizing optical component and method of manufacturing same
    46.
    发明公开
    Polarizing optical component and method of manufacturing same 有权
    Polarisierendes optisches Element und Herstellungsverfahrendafür

    公开(公告)号：EP1369714A1

    公开(公告)日：2003-12-10

    申请号：EP03253486.9

    申请日：2003-06-03

    申请人： CANON KABUSHIKI KAISHA

    发明人： Sakamoto, Junichi, Canon Kabushiki Kaisha

    IPC分类号： G02B5/30 ,  G02B5/18 ,  G02F1/1335

    CPC分类号： G02B5/3025 ,  G02B5/008 ,  G02B5/1847 ,  Y10S359/90

    摘要： A multilayer film having two kinds of films of different refractive indexes alternately stacked on each other on a substrate composed of an optical element is formed in a plurality of parallel lines, and the adjacent lines of the multilayer film are connected to each other by means of a connecting multilayer film to reinforce them. This makes it possible to provide a highly reliable optical component which shows good polarization characteristic even for a visible light of a wavelength of 400 to 700 nm and in which even when designed to have a high aspect ratio, the linear multilayer film will not fall down. There is also provided a manufacturing method that enables a fine recess/protrusion shape to be surely formed using an inexpensive manufacturing apparatus without use of any organic solvent.

    摘要翻译： 在多个平行线上形成具有在由光学元件构成的基板上彼此交替层叠的具有不同折射率的两种膜的多层膜，多层膜的相邻线通过 连接多层薄膜来加强它们。 这使得可以提供即使对于波长为400至700nm的可见光也显示出良好的极化特性的高度可靠的光学部件，并且即使当设计成具有高纵横比时，线性多层膜也不会下降 。 还提供了一种制造方法，其能够使用不使用任何有机溶剂的便宜的制造装置来确保良好的凹凸形状。

    PROTECTIVE OVERCOAT FOR REPLICATED DIFFRACTION GRATINGS
    47.
    发明公开
    PROTECTIVE OVERCOAT FOR REPLICATED DIFFRACTION GRATINGS 有权
    保护再涂对复制衍射

    公开(公告)号：EP1340106A2

    公开(公告)日：2003-09-03

    申请号：EP01987291.0

    申请日：2001-11-07

    申请人： Cymer, Inc.

    发明人： PAN, Xiaojiang, J. ,  MORTON, Richard, G. ,  ERSHOV, Alexander, I.

    IPC分类号： G02B5/18

    CPC分类号： C23C14/225 ,  C23C14/0694 ,  C23C14/16 ,  C23C14/24 ,  G02B1/105 ,  G02B1/14 ,  G02B5/1847 ,  G02B5/1852 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70558 ,  G03F7/70575

    摘要： An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be cracked or have relatively thick grain boundaries containing oxides and hydroxides of aluminum and typically is also naturally coated with an aluminum oxide film. The grating is subsequently overcoated in a vacuum chamber with one or two thin, pure, dense aluminum overcoat layers and then also in the vacuum the aluminum overcoat layer or layers are coated with one or more thin protective layers of a material transparent to ultraviolet radiation. In preferred embodiments this protective layer is a single layer of MgF2, S1O2 or Al2O3. In other preferred embodiments the layer is a layer of MgF2 or S1O2 covered with a layer of Al2O3 and in a third preferred embodiment the protective layer is made up of four alternating layers of MgF2 and Al2O3 or four alternating layers of S1O2 and Al2O3. Preferably, the thickness of the transparent protective layers are chosen to produce a phase shift at the proposed operating wavelengths of an integral number of 2π.

    Polarisers and mass-production method
    48.
    发明公开
    Polarisers and mass-production method 审中-公开
    偏振镜和方法大规模生产

    公开(公告)号：EP1241490A3

    公开(公告)日：2002-10-09

    申请号：EP02251725.4

    申请日：2002-03-12

    申请人： CSEM Centre Suisse d'Electronique et de Microtechnique SA

    发明人： Gale, Michael T. ,  Soechtig, Jürgen ,  Zchokke, Christian ,  Schnieper, Marc

    IPC分类号： G02B5/30 ,  G02B5/18

    CPC分类号： G02B5/3058 ,  G02B5/1847

    摘要： A method of mass producing polarisers comprises designing by rigorous diffraction theory an optimised grating profile, replicating the profile in a polymer or other substrate, and slope evaporating a metal onto the substrate. The angle of slope evaporation, the metal, and the thickness of the metal are optimised for a given wavelength using rigorous diffraction theory. The polariser may be coated with a protective coating, such as an acrylic based lacquer or Magnesium Fluoride (MgF 2 ). The optical effect of the coating is also taken into account in the design using rigorous diffraction theory.

    Method for designing a refractive or reflective optical system and method for designing a diffraction optical element
    50.
    发明公开
    Method for designing a refractive or reflective optical system and method for designing a diffraction optical element 审中-公开
    一种用于计算一个折射或反射光学系统和方法，用于计算的衍射光学元件的方法

    公开(公告)号：EP0940702A3

    公开(公告)日：2000-10-18

    申请号：EP99102860.6

    申请日：1999-03-03

    申请人： Sumitomo Electric Industries, Ltd.

    发明人： Fuse, Keiji Osaka Works Sumitomo Electric Ind.Ltd

    IPC分类号： G02B13/00 ,  G02B13/14 ,  G02B13/18

    CPC分类号： G02B13/14 ,  G02B5/1847 ,  G02B13/18 ,  G02B27/0012

    摘要： In the design of a lens system, lens parameters are determined by minimizing a merit function which is a sum of squares of ray aberrations or wavefront errors at many sampling points. Prior methods often select the parameters which give very narrow tolerances to production errors. The small tolerance increases the difficulty of production. In order to increase the tolerance, states which allot errors ±δ to some chosen parameters are considered. Merit functions corresponding the error-allotted states are made. An integrated merit function is produced by adding the error-allotted merit functions to the non-error allotted normal merit function. Parameters are determined by minimizing the integrated merit function. The optimized parameters will give wider tolerances for the error-allotted parameters. DOE (diffraction optical element) design includes the steps of considering error-allotted states S 1 , S 2 ,··· in addition to a non-error state S o , making merit functions E 1 , E 2 , ··· for S 1 , S 2 ··· besides E o for S o , defining an integrated merit function E=ΣwkEk by multiplying the merit function with weights and summing up, minimizing the integrated merit function and determining optimum variables for the DOE.