公开(公告)号：EP1867221B1

公开(公告)日：2011-07-27

申请号：EP06724055.6

申请日：2006-04-05

Applicant: Matacotta, Francesco Cino ,  Taliani, Carlo

Inventor： Matacotta, Francesco Cino ,  Taliani, Carlo

IPC: H05H1/54

CPC classification number: H05H1/54 ,  H01J1/025 ,  H01J3/025

Abstract: An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma.

公开(公告)号：EP1353352B1

公开(公告)日：2010-08-25

申请号：EP03007602.0

申请日：2003-04-02

Applicant: Astrium GmbH

Inventor： Schartner, Karl-Heinz, Prof. Dr. ,  Loeb, Horst, Prof. Dr. ,  Leiter, Hans Jürgen ,  Harmann, Hans-Peter

IPC: H01J3/02

CPC classification number: H01J3/025

公开(公告)号：EP1867221A2

公开(公告)日：2007-12-19

申请号：EP06724055.6

申请日：2006-04-05

Applicant: Matacotta, Francesco Cino ,  Taliani, Carlo

Inventor： Matacotta, Francesco Cino ,  Taliani, Carlo

IPC: H05H1/54

CPC classification number: H05H1/54 ,  H01J1/025 ,  H01J3/025

Abstract: An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma.

公开(公告)号：EP0810628A3

公开(公告)日：1999-12-22

申请号：EP97105519.9

申请日：1997-04-03

Applicant: Forschungszentrum Karlsruhe GmbH

Inventor： Engelko, Vladimir, Dr. ,  Giese, Harald ,  Müller, Georg ,  Schalk, Sven ,  Schultheiss, Christoph, Dr. ,  Würz, Hermann, Dr.

IPC: H01J33/00 ,  H01J3/02 ,  H01J3/04 ,  H01J27/08 ,  H01J29/48 ,  H01J37/077 ,  H01J37/317 ,  H01J1/00

CPC classification number: H01J37/08 ,  H01J3/025 ,  H01J27/08 ,  H01J37/077

Abstract: Die Erfindung betrifft eine Quelle zur Erzeugung von gepulsten Ionen- und Elektronenstrahlen. Mit ihr wird ein in seinem Strahlquerschnitt großflächiger Strom geladener Teilchen erzeugt. Die Vakuum-Bogenplasmaquelle wird durch eine den Gesamtstrom bestimmende Last, die aus der Parallelschaltung eines ohmschen Widerstands mit einem Kondensator besteht, zur sichern Zündung geführt. Diese Last ist an den Innenwiderstand des Pulsspannungsgenerators leistungsangepaßt. Die Dimensionierung der elektrischen Bauteile an den Elektroden unter Berücksichtigung vorgegebener Schranken ermöglicht einen in seinem Strahlquerschnitt homogenen Strom geladener Teilchen, der aus ein und demselben Ladungsteilchen bei gleichen Zündelektroden oder aus einem strukturierten Strom unterschiedlicher Teilchensorten bei unterschiedlichem Zündelektrodenmaterial besteht.

公开(公告)号：EP0464383A2

公开(公告)日：1992-01-08

申请号：EP91109114.8

申请日：1991-06-04

Applicant: HAUZER TECHNO COATING EUROPE BV

Inventor： Alexeevich, Arkhipov Boris ,  Mitrofanovich, Gorbachev Yuriy ,  Alexeevich, Ivanov Viktor ,  Nikolaevich, Kozubsky Konstantin ,  Alexeevich, Komarov Georgy

IPC: H01J3/02

CPC classification number: H01J3/025

Abstract: A plasma compensation cathode comprises a casing (1) accommodating coaxially with its outlet hole (2) a hollow holder (3) and a thermal emitter (4) with a central passage (5), a layer (10) of material chemically inert at high temperatures to the materials of the holder and emitter being interposed therebetween. The central passage (5) is blind at the side of admission of gas, and is communicated with the interior of the holder (3) by way of a through passage (8) made in the wall of the thermal emitter (4) so that its axis intersects the axis of passage (5), and longitudinal grooves (9) made in the side surface of the thermal emitter (4) at the location of the inlet holes of the through passage (8). The holder (3) is embraced by heater (6) having a support ring (7) positioned in its midportion and secured in an insulation sleeve (18) separating the heater (6) from the coaxial heat screens (11) interconnected successively to define a sealed cavity (14) wherethrough the interior of the holder (3) communicates with the gas feeding pipe (13) secured in the casing (1) through the support insulator (17). Interposed between mechanical filters (16) and between holder (3) and pipe (13) is a getter (15).

Abstract translation: 等离子体补偿阴极包括与其出口孔（2）同轴的壳体（1），空心保持器（3）和具有中心通道（5）的热发射器（4），具有化学惰性的材料层（10） 保持器和发射器的材料的高温被插入其间。 中心通道（5）在入口侧是盲目的，并且通过在热发射器（4）的壁中形成的通道（8）与保持器（3）的内部连通，使得 其轴线与通道（5）的轴线相交，以及在通过通道（8）的入口孔的位置处在热发射器（4）的侧表面中形成的纵向槽（9）。 保持器（3）由加热器（6）包围，该加热器具有位于其中间部分中的支撑环（7），并固定在绝缘套筒（18）中，该绝缘套筒将加热器（6）与同轴互连的热筛（11）分开连接， 密封腔（14），其中保持器（3）的内部通过支撑绝缘体（17）与固定在壳体（1）中的气体供给管（13）连通。 介于机械过滤器（16）和保持器（3）和管道（13）之间的是吸气剂（15）。

公开(公告)号：EP0264709A3

公开(公告)日：1990-01-10

申请号：EP87114573.6

申请日：1987-10-07

Applicant: MILJEVIC, Vujo, Dr.

Inventor： Miljevic, Vujo I., Dr.

IPC: H01J61/06 ,  G01J3/10 ,  H01J3/02 ,  H01J27/02

CPC classification number: H01J3/025 ,  H01J27/02

Abstract: An ion-electron source based on a new type of gas discharge in a hollow anode is presented. A small surface of the exit aperture and a high density of the current enable high brightness of the source; high efficiency and simple construction make possible the low production price and long lifetime of the source.

公开(公告)号：EP0158970A1

公开(公告)日：1985-10-23

申请号：EP85104350.5

申请日：1985-04-10

Applicant: SPECTRUM CONTROL, INC. (a Pennsylvania corporation)

Inventor： Ham, Mooyoung

IPC: H01J37/077

CPC classification number: H01J17/44 ,  H01J3/025 ,  H01J33/00 ,  H01J37/077

Abstract: @ Apparatus and method for producing a pluri-energetic electron beam source. The apparatus includes a housing (10) which functions as an anode, the same having an electron emission window (12) convered by an electron-transparent grid, a cathode body mounted within the housing (10) and electically isolated therefrom, the spacing between the cathode body and grid being sufficient to permit a gas discharge to be maintained between them having a plasma region substantially thinner than the cathode sheath region. The method involves the simultaneous feeding of gas between a cathode body and an anode grid, applying voltages of about 10 kV to 20 kV and regulating the gas feed rate and the voltage to maintain a discharge condition of the character described above.