Abstract:
A method and apparatus for treating material surfaces (13) using a repetitively pulsed ion beam (11). In particular, the treatment is tailored by adjusting treatment parameters of a pulsed ion beam (11) to a duration less than or equal to 1000 ns and a repetition rate of less than 1 Hz.
Abstract:
A multiple charged-particle detector system includes a plurality of charged-particle detector assemblies (10-12) which are each made up of a first arm (19-22) and a second arm (24-27) extending at an angle to each other. Charged particles (4-7) enter an aperture (14-18) at the entrance of the first arm (19-22) of each detector assembly (10-12) and strike a dynode (30-33) positioned at the intersection of the two arms causing electrons to be emitted by the dynode (30-33). Some of the electrons pass into the second arms (24-27) of the detector assemblies (10-12) and are detected by a continuous-dynode electron multiplier (35-38). The first arms (19-22) are narrower than the detectors (35-38), and the detector assemblies (10-12) are arranged in such a way that the minimum separation at which charged-particle beams (4-7) can be detected is determined by the widths of the said first arms (19-22) of the detector assemblies (10-12), and not by the widths of the detectors (35-38) themselves.
Abstract:
A cathode assembly is for use in a radiation generator and includes an ohmically heated cathode, and a support having formed therein a hole and a recess at least partially surrounding the hole. In addition, there is a mount coupled to the support. The mount includes a larger outer frame positioned within the recess, a smaller inner frame carrying the ohmically heated cathode and spaced apart from the larger outer frame, and a plurality of members coupling the smaller inner frame to the larger outer frame.
Abstract:
The disclosure relates to a system for implanting ions into a target element including a source arrangement (230) for producing an ion beam; a beam analyzing arrangent for receiving the ion beam and selectively separating various ion species in the beam on the basis of mass to produce an analyzed beam; and a beam resolving arrangent disposed in the path of the analyzed beam for permitting a preselected ion species to pass to the target element. The ion source arrangement (230) comprises an arc chamber (230C) having an elongate exit aperture (232), and an elongate filament-cathode (230D). Bias and operating potentials are provided for the source arrangement and gaseous material to be ionized is supplied to the chamber. The ion source (230) utilises an electromagnet arrangement (280) having poles (281) aligned with the source filament (230D) for causing the electrons emitted by the filament to spiral around and create ions of the gaseous material supplied to the chamber (230C) and to compensate for non-uniformity in the ion beam emitted along the chamber, current to the field coils of the magnet for each pole is controlled independently.
Abstract:
Method and systems for managing clear-down are provided. The method can include generating a clear-down trigger associated with an ion mobility spectrometer and operating the ion mobility spectrometer in fast clear-down mode in response to the clear-down trigger. Methods and systems can further provide that where the ion mobility spectrometer operates in fast-switching mode, the ion mobility spectrometer alternating a plurality of times between operation according to a positive ion mode and operation according to a negative ion mode, and further operating according to the positive ion mode for less than about 1 second before switching to the operation according to the negative ion mode, and operating according to the negative ion mode for less than about 1 second before switching to the operation according to the positive ion mode.
Abstract:
Die Erfindung betrifft eine Quelle zur Erzeugung von gepulsten Ionen- und Elektronenstrahlen. Mit ihr wird ein in seinem Strahlquerschnitt großflächiger Strom geladener Teilchen erzeugt. Die Vakuum-Bogenplasmaquelle wird durch eine den Gesamtstrom bestimmende Last, die aus der Parallelschaltung eines ohmschen Widerstands mit einem Kondensator besteht, zur sichern Zündung geführt. Diese Last ist an den Innenwiderstand des Pulsspannungsgenerators leistungsangepaßt. Die Dimensionierung der elektrischen Bauteile an den Elektroden unter Berücksichtigung vorgegebener Schranken ermöglicht einen in seinem Strahlquerschnitt homogenen Strom geladener Teilchen, der aus ein und demselben Ladungsteilchen bei gleichen Zündelektroden oder aus einem strukturierten Strom unterschiedlicher Teilchensorten bei unterschiedlichem Zündelektrodenmaterial besteht.
Abstract:
There is disclosed a high speed pulse train generator for generating a train of pulses having arbitrarily close spacing. The apparatus in one form consists of a generator loop (82), comprising a fiber optic waveguide looped through a directional coupler (86), with the output fiber (76) serving as the input fiber for a similarly structured multiplexer loop (84). The lengths of the two loops (82, 84) are adjusted such that the time difference (τ) in the propagation times of light around the respective loops (82, 84) is small compared to the time of propagation around either loop (T, T- T ). The times are adjusted to obtain any arbitrary spacing of the pulses in the output pulse train (A. B. C, D, E) which comprises interleaved pulse trains resulting from each pulse input (92, 100) to the multiplexer loop (84). Also disclosed is a single loop embodiment for bidirectional data rate transformation and methods of using all the embodiments.