摘要:
An ion gun system 60 includes an ion gun 14 for irradiating an ion beam; an electric power supply unit 61 for supplying electric power to the ion gun; two mass flow regulators 64, 65 for introducing each of two types of gas in the ion gun; a control unit 12 connected to the electric power supply unit for working as ion gun control means for controlling electric power supplied to the ion gun from the electric power supply unit; and a control unit 12 connected to the mass flow regulators for working as mass flow control means for controlling the flow rate of gas introduced from the mass flow regulators in the ion gun. The control unit 12 as mass flow control means is provided with a function of changing the set value for the flow rate of each of the two types of gas to another set value by changing it stepwise within a range where the ion gun is working stably. Accordingly, shortening of film formation time can be attained.
摘要:
A soft ionization device is disclosed that comprises a series of electrodes (120, 122) having spacing less than the means free path of the molecules to be ionized. In some embodiments, the soft ionization device (99) is used in various applications that require ion or electron sources such as biological or chemical reactors, ion milling, and numerous replacements for conventional hot cathode systems. In another embodiment, a valence spectrometer is disclosed that is configured to variably ionize molecules (301) by their valiancy. In other embodiments, the ionization device is coupled to a spectrometer for the characterization of biological matter. Also disclosed is a preconditioner for preparing biological matter to be ionized.
摘要:
An ion source (10) for use in ion assisted deposition of films, has an ionisation region (13), a gas supply (22), supplying ionisable gas to the ionisation region, a gas excitation system (11, 12) causing ionisation of the gas, ion influencing means forming the ions into a current directed at a target, and an ion source controller controlling the ion source so as to intermittently produce the current.
摘要:
An ion gun (42) for producing a pulsed microfocused beam of ions comprises an ion source (1) arranged to produce a continuous ion beam along a z-axis toward a collector (13) having an aperture (14) on the axis. A deflector (7) is arranged to maintain the beam substantially stationary and incident on the aperture for a pulse time, to deflect the beam away from the aperture to the collector and subsequently to return the beam to be incident at the aperture. A focussing lens (15) focusses the beam from the deflection point (at 7) to a final image point, and a condensing lens (2) focusses the beam at the deflection point. A mass filter (6) selects a single ion species, and a second deflector (10) deflects the beam orthogonally to the deflector (7) so that the returning path of the beam on the collector (13) does not cross the aperture (14). A stigmator (60,61) and a beam scanner (19) are also provided.
摘要:
A plasma ion source comprising coaxially oriented electrodes (1,2), a first rod-shaped electrode (1) and a second annular-shape electrode (2). The electrodes are positioned inside an enclosure filled with a gas with an atomic number higher than five. The current source is capable of delivering a current up to 100 KA within 1 micro sec. A focusing means (7) is positioned near the desired plasma pinch.
摘要:
L'invention concerne une source d'ions. Cette source comprend une chambre d'ionisation (1) à gaz, une source d'électrons (SE,), des moyens pour faire osciller les électrons dans la chambre de manière à créer une zone d'ionisation (Z) du gaz. Elle est caractérisée en ce que les moyens pour faire osciller les électrons comprennent deux lentilles électroniques (L 1 , L 2 ) identiques dont les axes coïncident avec la direction d'oscillation, deux miroirs sphériques (M 1 , M 2 ) concaves tournés l'un vers l'autre et situés respectivement de part et d'autre des deux lentilles (L 1 , L 2 ) et dont leurs centres coïncident respectivement avec les foyers (F 1 , F 2 ) des lentilles, la source (SE 1 ) d'électrons étant située au foyer (F,) de l'une des deux lentilles (L 1 , L 2 ). Application à l'analyse des gaz par spectrométrie de masse.
摘要:
An ion source is disclosed wherein a sample is introduced into the sample chamber (1) of the ion source in the gas phase via a sample introduction capillary tube (2). The sample is directed onto a heated surface (6) coated with an oxidising reagent such as copper oxide. Carbon in the sample is oxidised to form carbon dioxide. The resulting carbon dioxide molecules are then ionised by electron impact ionisation with an electron beam (3) and the resulting ions are passed to a mass analyser for mass analysis.