Abstract:
An Al-Te-Cu-Zr alloy sputtering target, comprising 20 at% to 40 at% of Te, 5 at% to 20 at% of Cu, 5 at% to 15 at% of Zr and the remainder of Al, wherein a Te phase, a Cu phase and a CuTe phase are not present in a structure of the target. An object of the present invention is to provide an Al-Te-Cu-Zr alloy sputtering target capable of effectively reducing particle generation, nodule formation and the like upon sputtering and further capable of reducing oxygen contained in the target.
Abstract:
A method for fabricating a metal foam component from an aerogel containing a polymer and nanoparticles is disclosed. The method may comprise: 1) exposing the aerogel to a reducing condition at an elevated temperature for a reaction time to provide a metal foam; and 2) using the metal foam to fabricate the metal foam component. At least one of the elevated temperature and the reaction time may be selected so that at least some ligaments of the metal foam have a desired ligament diameter or at least some pores of the metal foam have a desired pore size. The desired ligament diameter may be less than about one micron and the component may be a component of a gas turbine engine.
Abstract:
A powder is supplied to a shaping chamber without interrupting processing of shaping a three-dimensional laminated and shaped object. A three-dimensional laminating and shaping apparatus includes a shaping chamber in which a three-dimensional laminated and shaped object is shaped, a powder storage that stores a powder conveyed to the shaping chamber, an intermediate powder storage that is provided between the shaping chamber and the powder storage, is connected to the shaping chamber via a first valve, is connected to the powder storage via a second valve, and temporarily stores the powder, a valve controller that controls opening/closing of each of the first valve and the second valve, and an atmosphere controller that controls an atmosphere in the intermediate powder storage and an atmosphere in the shaping chamber.
Abstract:
A metal powder additive manufacturing system (100) and method are disclosed that use increased trace amounts of oxygen to improve physical attributes of an object. The system (100) may include: a processing chamber (130); a metal powder bed (132) within the processing chamber (130); a melting element (134) configured to sequentially melt layers of metal powder on the metal powder bed (132) to generate an object (102); and a control system (104) configured to control a flow of a gas mixture (160) within the processing chamber (130) from a source of inert gas (154) and a source of an oxygen containing material (162), the gas mixture (160) including the inert gas (154) and oxygen from the oxygen containing material (162).
Abstract:
Disclosed are a lead-free, high-sulphur and easy-cutting copper-manganese alloy and preparation method thereof. The alloy comprises the following components in percentage by weight: 52.0-95.0 wt.% of copper, 0.01-0.20 wt.% of phosphorus, 0.01-20 wt.% of tin, 0.55-7.0 wt.% of manganese, 0.191-1.0 wt.% of sulphur, one or more metals other than zinc that have an affinity to sulphur less than the affinity of manganese to sulphur, with the sum of the contents thereof no more than 2.0 wt.%, and the balance being zinc and inevitable impurities, wherein the metals other than zinc that have an affinity to sulphur less than the affinity of manganese to sulphur are nickel, iron, tungsten, cobalt, molybdenum, antimony, bismuth and niobium. The copper alloy is manufactured by a powder metallurgy method, in which after uniformly mixing the alloy powder, sulphide powder and nickel powder, pressing and shaping, sintering, re-pressing, and re-sintering are carried out to obtain the copper alloy, and the resulting copper alloy is thermally treated.
Abstract:
The present invention provides a process for preparing a tantalum powder with high specific capacity, which process comprising the steps of, in sequence, (1) a first reduction step: mixing tantalum oxide powder and a first reducing agent powder homogenously, and then carrying out reduction reaction in hydrogen and/or inert gas or vacuum atmosphere to obtain a tantalum suboxides powder; (2) a second reduction step: mixing the tantalum suboxides powder obtained from the step (1), in which impurities have been removed, and a second reducing agent powder homogenously, and then carrying out reduction reaction in hydrogen and/or inert gas or vacuum atmosphere to obtain a tantalum powder having high oxygen content; (3) a third reduction step: mixing the tantalum powder having high oxygen content obtained from the step (2), in which impurities have been removed, with a third reducing agent powder homogenously, and then carrying out reduction reaction in hydrogen and/or inert gas or vacuum atmosphere to obtain a tantalum metal powder suitable for capacitors; wherein after each reduction step, the oxidation product of reducing agent and the residual reducing agent are removed from the reaction product.