Group IV based semiconductor light emitting device with improved carrier confinement and method of fabricating the same
    90.
    发明公开
    Group IV based semiconductor light emitting device with improved carrier confinement and method of fabricating the same 审中-公开
    从具有提高的载流子限制和它们的制造方法的第IV族化合物半导体发光器件

    公开(公告)号:EP1727214A3

    公开(公告)日:2008-04-30

    申请号:EP06010198.7

    申请日:2006-05-17

    IPC分类号: H01L33/00

    CPC分类号: H01L33/34 H01L33/0054

    摘要: In one aspect, a semiconductor device (10) includes a p-region (12) and an n-region (14). The p-region (12) includes a first Group IV semiconductor that has a bandgap and is doped with a p-type dopant, and a first region (18) of local crystal modifications inducing localized strain that increases the bandgap of the first Group IV semiconductor and creates a conduction band energy barrier against transport of electrons across the p-region (12). The n-region (14) includes a second Group IV semiconductor that has a bandgap and is doped with an n-type dopant, and a second region (20) of local crystal modifications inducing localized strain that increases the bandgap of the second Group IV semiconductor and creates a valence band energy barrier against transport of holes across the n-region (14).