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151 条记录 (耗时 0.017 秒)

    HOLLOW RESIN PARTICLES, METHOD FOR PRODUCING HOLLOW RESIN PARTICLES, AND USE OF HOLLOW RESIN PARTICLES
    84.
    发明公开
    HOLLOW RESIN PARTICLES, METHOD FOR PRODUCING HOLLOW RESIN PARTICLES, AND USE OF HOLLOW RESIN PARTICLES 审中-公开

    公开(公告)号：EP4265647A1

    公开(公告)日：2023-10-25

    申请号：EP21906490.4

    申请日：2021-12-09

    申请人： Sekisui Kasei Co., Ltd.

    发明人： MATSUURA Haruhiko ,  MATSUNO Shinya

    IPC分类号： C08F12/34 ,  C08F12/36 ,  C08F20/20 ,  C08F2/44

    摘要： Provided is a hollow resin particle that has a shell portion and a hollow portion surrounded by the shell portion and that can achieve reductions in dielectricity and dielectric loss tangent and can exhibit excellent heat resistance. In addition, a method for producing such a hollow resin particle in a simple manner is provided. Furthermore, use of such a hollow resin particle is provided. A hollow resin particle according to an embodiment of the present invention is a hollow resin particle including a shell portion and a hollow portion surrounded by the shell portion, wherein the shell portion has an ether structure represented by formula (1).

    HOLLOW PARTICLES
    86.
    发明公开
    HOLLOW PARTICLES 审中-公开

    公开(公告)号：EP4249526A1

    公开(公告)日：2023-09-27

    申请号：EP21894548.3

    申请日：2021-11-11

    申请人： Zeon Corporation

    发明人： KUROKAWA, Hisashi

    IPC分类号： C08F20/20 ,  C08J3/12 ,  C08F2/18

    摘要： To provide hollow particles excellent in performance stability in a high-humidity environment and low in relative permittivity. Hollow particles which comprise a shell containing a resin and a hollow portion surrounded by the shell, wherein the shell contains, as the resin, a polymer in which from 70 parts by mass to 100 parts by mass of a crosslinkable monomer unit is contained in 100 parts by mass of all monomer units; wherein a void ratio is 60% or more; wherein a content of a surfactant present on a surface of the hollow particles is 200 ppm or less; and wherein a relative permittivity at a frequency of 1 MHz is 1.6 or less.

    COMPOSITION FOR FORMING LOW DIELECTRIC CONSTANT RESIN, LOW DIELECTRIC MEMBER, AND ELECTRONIC DEVICE USING SAME
    87.
    发明公开
    COMPOSITION FOR FORMING LOW DIELECTRIC CONSTANT RESIN, LOW DIELECTRIC MEMBER, AND ELECTRONIC DEVICE USING SAME 审中-公开

    公开(公告)号：EP4239000A1

    公开(公告)日：2023-09-06

    申请号：EP21886181.3

    申请日：2021-10-26

    申请人： JNC Corporation

    发明人： FUJIWARA, Takeshi ,  SAGO, Koki

    IPC分类号： C08F20/20 ,  C08F20/26 ,  C08G59/50 ,  H01B3/30

    摘要： The purpose of the present invention is to achieve a composition for forming a low dielectric constant resin which is suitable for use in a substrate for radar, next-generation communication devices and the like using higher frequencies, while having high heat dissipation properties. The present invention enables the achievement of a polymerizable composition, which is able to be molded by a solution process, while exhibiting thermal conductivity and low dielectric properties lower than those of conventional liquid crystal polymers, by curing a polymerizable polycyclic compound that has less conjugates or polar groups, while exhibiting higher linearity or symmetry of each molecule.

    RESIN COMPOSITION FOR STEREOLITHOGRAPHY
    88.
    发明公开
    RESIN COMPOSITION FOR STEREOLITHOGRAPHY 审中-公开

    公开(公告)号：EP4227330A1

    公开(公告)日：2023-08-16

    申请号：EP21877611.0

    申请日：2021-10-05

    申请人： DIC Corporation

    发明人： ARIGA Youhei ,  NISHIZAWA Shigetoshi

    IPC分类号： C08F20/20 ,  C08F2/44 ,  C08F2/50 ,  B33Y80/00 ,  B29C64/165 ,  B29C64/264 ,  C08K3/013 ,  B33Y70/10

    摘要： An object of the present invention is to provide a resin composition for stereolithography that can reduce generation of color unevenness and provide excellent formability. The present invention has achieved this object by providing a resin composition for stereolithography including an ultraviolet curable resin (A) and an inorganic pigment (B) that are blended, in which the inorganic pigment (B) has a specific gravity of 2.0 ≤ ρ and a particle size distribution of a particle diameter of D50 ≤ 5 µm and D90 ≤ 20 um, and a viscosity of the resin composition for stereolithography at 25°C is 100 Pa·s or more.

    HOLLOW PARTICLES
    89.
    发明公开
    HOLLOW PARTICLES 审中-公开

    公开(公告)号：EP4223801A1

    公开(公告)日：2023-08-09

    申请号：EP21875576.7

    申请日：2021-09-28

    申请人： Zeon Corporation

    发明人： WATANABE, Masashi

    IPC分类号： C08F20/20 ,  C08F2/18

    摘要： Hollow particles which comprise a shell containing a resin and a hollow portion surrounded by the shell and which have a void ratio of 50% or more, wherein the shell contains, as the resin, a polymer in which 70 parts by mass to 100 parts by mass of a crosslinkable monomer unit is contained in 100 parts by mass of all monomer units, and wherein, in a hollow particle immersion test in which a mixture obtained by adding 0.1 mg of the hollow particles to 4 mL of acetone and shaking them for 10 minutes at a shaking rate of 100 rpm, is left to stand for 48 hours in an environment at 25°C, less than 5% by mass of the hollow particles submerge in the acetone.

    THIOL-MODIFIED POLYMER COMPOUND, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF
    90.
    发明公开
    THIOL-MODIFIED POLYMER COMPOUND, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF 审中-公开

    公开(公告)号：EP4063399A1

    公开(公告)日：2022-09-28

    申请号：EP20889336.2

    申请日：2020-03-18

    申请人： Blafar Biotechnology (Hangzhou) Ltd.

    发明人： WANG, Wenxin

    IPC分类号： C08B37/08 ,  C08G65/334 ,  C08H1/00 ,  C08F20/20 ,  C08F16/06 ,  C08F8/34

    摘要： The present invention relates to a thiol-modified polymer compound, and a preparation method therefor and an application thereof. In the present invention, a polymer compound modified by an acryloyl derivative and a polythiol compound are used for preparing a thiol-modified polymer compound by a Michael addition reaction of thiol and conjugated double bonds. In addition to achieving the structural goal of the thiol-modified polymer compound provided in the present invention, the preparation method further has the following advantages: flexibly and effectively controlling the structure and constitution of a synthetic product, and the types and contents of a large number of compound molecular functional groups; using reagents having high biocompatibility, and effectively controlling the production cost and reducing the toxicity in the synthesis process; and obtaining, under the conditions of using safety reagents and simple reaction steps, thiol-modified biocompatible polymer compounds that can be used as extracellular matrix materials and maintain good raw material structure and biological activity, with the types and contents of functional groups adjusted according to requirements, and meeting multiple clinical application requirements.