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公开(公告)号：EP2113085B1
公开(公告)日：2019-06-12
申请号：EP08729944.2
申请日：2008-02-15
发明人： ILIC, Milan , SHILO, Vladislav, V. , HUFF, Robert
CPC分类号： H05H1/46 , H01J37/32174 , H01J37/32623
摘要： A system and method for over-voltage protection is described. In one embodiment of the invention, an apparatus includes an output port configured to deliver power to a plasma chamber to ignite a plasma. The apparatus also includes a shunt switch in parallel with the output port and a processor configured to receive an indicator of an arc in the plasma. The processor is configured to close the shunt switch for a period of time to divert current away from the arc. The processor is also configured to trigger a pulse of the shunt switch to limit a voltage of an increasing voltage condition associated with the arc.
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公开(公告)号：EP3237859A1
公开(公告)日：2017-11-01
申请号：EP15874368.2
申请日：2015-12-28
发明人： MURRAY, Donald F.
CPC分类号： G01J5/24 , G01J1/44 , G01J2001/4406 , G01J2001/446
摘要： This disclosure describes systems, methods, and apparatus for improving the signal-to-noise ratio, increasing sampling speed, and increasing the dynamic range of a pyrometer via improvements to the amplification section. In particular, single-stage non- differentiated amplifiers can be replaced with a differential amplifier circuit that increases gain without a proportional increase in noise. The differential amplifier circuit can comprise a pair of transimpedance amplifier circuits arranged in parallel that receive a differential current from a photo detector and generate a differential voltage output in response having a transconductance gain.
摘要翻译： 本公开描述了通过改进放大部分来改善信噪比，提高采样速度并增加高温计的动态范围的系统，方法和设备。 特别是，单级非差分放大器可以用一个差分放大器电路代替，该电路可以增加增益而不会使噪声成比例增加。 差分放大器电路可以包括并联布置的一对互阻抗放大器电路，其接收来自光电检测器的差分电流并且响应于具有跨导增益而生成差分电压输出。
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公开(公告)号：EP2062278B1
公开(公告)日：2016-11-09
申请号：EP07814831.9
申请日：2007-09-13
发明人： PANKRATZ, Josh
CPC分类号： H05H1/46 , H01J37/32064 , H01J37/32935 , H01J2237/0206 , H05H2001/4682
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4.发明公开RATE ENHANCED PULSED DC SPUTTERING SYSTEM 有权GEPULSTES GLEICHSTROM-SPUTTERSYSTEM的RATENERWEITERTES GEPULSTES GLEICHSTROM-SPUTTERSYSTEM
公开(公告)号：EP3089196A1
公开(公告)日：2016-11-02
申请号：EP16165652.5
申请日：2016-04-15
IPC分类号： H01J37/34
CPC分类号： H01J37/3476 , C23C14/3485 , C23C14/35 , H01J37/3405 , H01J37/3438 , H01J37/3444 , H01J37/3467 , H01J2237/2485 , H01J2237/327 , H01J2237/332
摘要： A pulsed direct current sputtering system and method are disclosed. The system has a plasma chamber with two targets, two magnetrons and one anode, a first power source, and a second power source. The first power source is coupled to the first magnetron and the anode, and provides a cyclic first-power-source voltage with a positive potential and a negative potential during each cycle between the anode and the first magnetron. The second power source is coupled to the second magnetron and the anode, and provides a cyclic second-power-source voltage. The controller phase-synchronizes and controls the first-power-source voltage and second-power-source voltage to apply a combined anode voltage, and phase-synchronizes a first magnetron voltage with a second magnetron voltage, wherein the combined anode voltage applied to the anode has a magnitude of at least 80 percent of a magnitude of a sum of the first magnetron voltage and the second magnetron voltage.
摘要翻译： 公开了一种脉冲直流溅射系统和方法。 该系统具有具有两个靶的等离子体室，两个磁控管和一个阳极，第一电源和第二电源。 第一电源耦合到第一磁控管和阳极，并且在阳极和第一磁控管之间的每个循环期间提供具有正电位和负电位的循环第一电源电压。 第二电源耦合到第二磁控管和阳极，并提供循环的二次电源电压。 控制器相位同步并控制第一电源电压和第二电源电压以施加组合的阳极电压，并且将第一磁控管电压与第二磁控管电压相位同步，其中施加到 阳极具有第一磁控管电压和第二磁控管电压之和的幅度的至少80％的量值。
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6.发明公开
公开(公告)号：EP2569798A1
公开(公告)日：2013-03-20
申请号：EP11781217.2
申请日：2011-05-11
CPC分类号： C23C14/54 , C23C14/3485 , C23C14/3492 , C23C14/542 , C23C14/548 , C23C14/564 , H01J37/34 , H01J37/3417 , H01J37/3429 , H01J37/3438 , H01J37/3444 , H01J37/3467 , H05H1/46 , H05H2001/4682
摘要： Methods and apparatus for applying pulsed DC power to a plasma processing chamber are disclosed. In some implementations, frequency of the applied power is varied to achieve desired processing effects such as deposition rate, arc rate, and film characteristics. In addition, a method and apparatus are disclosed that utilize a relatively high potential during a reverse-potential portion of a particular cycle to mitigate possible nodule formation on the target. The relative durations of the reverse- potential portion, a sputtering portion, and a recovery portion of the cycle are adjustable to effectuate desired processing effects.
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公开(公告)号：EP1828429B1
公开(公告)日：2013-01-23
申请号：EP05854173.1
申请日：2005-12-15
发明人： SEYMOUR, Eric , SCHOLL, Richard, A.
CPC分类号： C23C14/3478 , H01J37/34 , H01J37/3438 , H01J37/3444
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公开(公告)号：EP2517360A1
公开(公告)日：2012-10-31
申请号：EP10843522.3
申请日：2010-12-20
CPC分类号： H03H7/40 , H03F1/56 , H05H2001/4682
摘要： A system, method, and apparatus for stabilizing interactions between an electrical generator and a nonlinear load are described. One illustrative embodiment includes an impedance element that is coupled to an output of the generator and a power source coupled to the impedance element. The power source applies power to, or across, the impedance element so as to reduce energy loss that would ordinarily occur due to energy dissipation by way of the impedance element. In many variations, the power source operates within a defined bandwidth so that a stabilizing effect is achieved outside of this bandwidth.
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9.发明公开
公开(公告)号：EP2457033A1
公开(公告)日：2012-05-30
申请号：EP09847661.7
申请日：2009-08-25
发明人： GILMORE, Jack, A. , SEYMOUR, Eric
IPC分类号： F24J2/40 , H01L31/042
CPC分类号： H02J1/10 , H02J3/383 , H02J13/0003 , Y02E10/563 , Y02E40/72 , Y04S10/123 , Y10T307/511
摘要： System, methods and apparatus for coupling photovoltaic arrays are disclosed. The apparatus may include a first input adapted to couple to a neutral line of a first photovoltaic array; a second input adapted to couple to a neutral line of a second photovoltaic array; a contactor configured to switchably couple the neutral line of a first photovoltaic array to the a neutral line of a second photovoltaic array, the contactor being remotely controllable.
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10.发明公开SYSTEM AND METHOD FOR MONITORING CONTROL STATUS OF AN EXHAUST APPARATUS PRESSURE CONTROL SYSTEM 审中-公开系统和方法监测控制系统的排气压力调节器的状态
公开(公告)号：EP2327000A2
公开(公告)日：2011-06-01
申请号：EP09807279.6
申请日：2009-08-13
发明人： NAMBU, Mashahiro
CPC分类号： G05D16/2093 , F23J11/00 , F23N3/002 , F23N2025/04
摘要： An exhaust pressure control apparatus is disclosed. The exhaust pressure control apparatus including a main body in which an inlet port and an outlet port are formed, the main body also including a pilot chamber. The system also includes a spool comprising an upper slide and a lower slide, the upper slide forming a movable portion of the pilot chamber, and the spool is held by the upper slide and the lower slide so that it can slide in an axial direction over a sliding surface connecting the intake port and the discharge port. A control system regulates a pressure in the intake port by controlling a pressure regulating gas supplied to the pilot chamber, and a control status portion provides an indication of the stability of the control system based upon the pressure in the pilot chamber.
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