POLISHING COMPOSITIONS AND METHODS OF USING SAME

    公开(公告)号:EP3995550A1

    公开(公告)日:2022-05-11

    申请号:EP21206058.6

    申请日:2021-11-02

    IPC分类号: C09G1/02 C08K5/523

    摘要: This disclosure relates to a polishing composition that includes at least one abrasive; at least one nitride removal rate reducing agent, an acid or a base; and water. The at least one nitride removal rate reduce agent can include a hydrophobic portion containing a C 4 to C 40 hydrocarbon group; and a hydrophilic portion containing at least one group selected from the group consisting of a sulfinite group, a sulfate group, a sulfonate group, a carboxylate group, a phosphate group, and a phosphonate group; in which the hydrophobic portion and the hydrophilic portion are separated by zero to ten alkylene oxide groups. The polishing composition can have a pH of from about 2 to about 6.5.