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公开(公告)号:EP4381022A1
公开(公告)日:2024-06-12
申请号:EP22853720.5
申请日:2022-07-28
发明人: HUANG, Ting-Kai , HU, Bin , LIANG, Yannan , PIAO, Hong
IPC分类号: C09G1/04 , H01L21/321 , B24B37/04
CPC分类号: H01L21/02074 , H01L21/02065 , C09G1/04
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公开(公告)号:EP4211200A1
公开(公告)日:2023-07-19
申请号:EP21867406.7
申请日:2021-09-03
IPC分类号: C09K13/08 , H01L21/306
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公开(公告)号:EP4204490A1
公开(公告)日:2023-07-05
申请号:EP21862835.2
申请日:2021-08-27
发明人: KNEER, Emil A , DORY, Thomas , MIZUTANI, Atsushi
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公开(公告)号:EP4034605A1
公开(公告)日:2022-08-03
申请号:EP20867124.8
申请日:2020-09-18
发明人: LIANG, Yannan , WEN, Liqing , HU, Bin , LIN, Tawei
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公开(公告)号:EP3995550A1
公开(公告)日:2022-05-11
申请号:EP21206058.6
申请日:2021-11-02
摘要: This disclosure relates to a polishing composition that includes at least one abrasive; at least one nitride removal rate reducing agent, an acid or a base; and water. The at least one nitride removal rate reduce agent can include a hydrophobic portion containing a C 4 to C 40 hydrocarbon group; and a hydrophilic portion containing at least one group selected from the group consisting of a sulfinite group, a sulfate group, a sulfonate group, a carboxylate group, a phosphate group, and a phosphonate group; in which the hydrophobic portion and the hydrophilic portion are separated by zero to ten alkylene oxide groups. The polishing composition can have a pH of from about 2 to about 6.5.
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公开(公告)号:EP3918110A1
公开(公告)日:2021-12-08
申请号:EP20748869.3
申请日:2020-01-22
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公开(公告)号:EP3891248A1
公开(公告)日:2021-10-13
申请号:EP19892583.6
申请日:2019-07-22
IPC分类号: C09K13/08 , H01L21/311
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公开(公告)号:EP3883676A1
公开(公告)日:2021-09-29
申请号:EP19887485.1
申请日:2019-11-15
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公开(公告)号:EP3883663A1
公开(公告)日:2021-09-29
申请号:EP19888213.6
申请日:2019-11-21
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