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公开(公告)号：EP2027594A2
公开(公告)日：2009-02-25
申请号：EP06786767.1
申请日：2006-07-10
IPC分类号： H01J37/302
CPC分类号： H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
摘要： A chamber (102 in Fig. 2) for exposing a workpiece to charged particles (101 in Fig. 2) includes a source, a collimator, a beam digitizer (230 in Fig. 2) downstream of the collimator configured to create a digital beam including groups of at least one charged particle (Fig. 3B and 5) by adjusting longitudinal spacing between the particles along the axis, a deflector (210 in Fig. 6A and 6B) downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
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2.发明授权Apparatus and method for controlled particle beam manufacturing of semiconductors 有权装置和受控生产半导体的方法，通过粒子束的装置
公开(公告)号：EP2027594B1
公开(公告)日：2011-12-14
申请号：EP06786767.1
申请日：2006-07-10
IPC分类号： H01J37/317 , H01J37/04 , H01J37/302
CPC分类号： H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
摘要： A chamber (102 in Fig. 2) for exposing a workpiece to charged particles (101 in Fig. 2) includes a source, a collimator, a beam digitizer (230 in Fig. 2) downstream of the collimator configured to create a digital beam including groups of at least one charged particle (Fig. 3B and 5) by adjusting longitudinal spacing between the particles along the axis, a deflector (210 in Fig. 6A and 6B) downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
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3.发明公开
公开(公告)号：EP2027594A4
公开(公告)日：2010-03-17
申请号：EP06786767
申请日：2006-07-10
IPC分类号： H01J37/317 , H01J37/04 , H01J37/302
CPC分类号： H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
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