公开(公告)号：EP1466034A1

公开(公告)日：2004-10-13

申请号：EP03731983.7

申请日：2003-01-17

申请人： Sundew Technologies, LLC

发明人： SNEH, Ofer

IPC分类号： C23C16/455 ,  C23C16/56 ,  C23C16/44 ,  G05D16/00

CPC分类号： H01L21/68785 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/45557 ,  C23C16/45561 ,  C23C16/45565 ,  C23C16/56 ,  H01L21/67126 ,  H01L21/6719 ,  Y10T137/0396

摘要： An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance.

公开(公告)号：EP1649076A2

公开(公告)日：2006-04-26

申请号：EP04777158.9

申请日：2004-06-28

申请人： Sundew Technologies, LLC

发明人： SNEH, Ofer

IPC分类号： C23C16/448 ,  C30B25/14

CPC分类号： C23C16/4488 ,  C23C16/4409 ,  C23C16/45544 ,  C23C16/45557 ,  C30B25/14 ,  Y10T117/1004

摘要： Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SMFD source apparatuses (700, 700', 700'') and methods from volatile and non-volatile liquid and solid precursors are disclosed, e.g., a method for substantially controlling the vapor pressure of a chemical source (722) within a source space comprising: sensing the accumulation of the chemical on a sensing surface (711); and controlling the temperature of the chemical source depending on said sensed accumulation.

公开(公告)号：EP1649076B1

公开(公告)日：2010-05-19

申请号：EP04777158.9

申请日：2004-06-28

申请人： Sundew Technologies, LLC

发明人： SNEH, Ofer

IPC分类号： C23C16/448 ,  C30B25/14

CPC分类号： C23C16/4488 ,  C23C16/4409 ,  C23C16/45544 ,  C23C16/45557 ,  C30B25/14 ,  Y10T117/1004

公开(公告)号：EP1676067B1

公开(公告)日：2010-03-31

申请号：EP04795595.0

申请日：2004-10-18

申请人： Sundew Technologies, LLC

发明人： SNEH, Ofer

IPC分类号： F16K7/17 ,  F16K31/42 ,  F16K31/00 ,  F16K1/42

CPC分类号： F16K7/14 ,  F16K7/17 ,  F16K31/003 ,  F16K31/1221 ,  Y10T137/87209

公开(公告)号：EP1485513A2

公开(公告)日：2004-12-15

申请号：EP03716378.9

申请日：2003-03-07

申请人： Sundew Technologies, LLC

发明人： SNEH, Ofer

IPC分类号： C23C2/00

CPC分类号： C23C16/45529 ,  C23C16/02 ,  C23C16/14 ,  C23C16/306 ,  C23C16/34 ,  C23C16/40 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45534

摘要： A method and an apparatus for executing efficient and cost-effective Atomic Layer Deposition (ALD) at low temperatures are presented. ALD films such as oxides and nitrides are produced at low temperatures under controllable and mild oxidizing conditions over substrates and devices that are moisture- and oxygen-sensitive. ALD films, such as oxides, nitrides, semiconductors and metals, are efficiently and cost-effectively deposited from conventional metal precursors and activated nonmetal sources. Additionally, substrate preparation methods for optimized ALD are disclosed.

公开(公告)号：EP1676067A2

公开(公告)日：2006-07-05

申请号：EP04795595.0

申请日：2004-10-18

申请人： Sundew Technologies, LLC

发明人： SNEH, Ofer

IPC分类号： F16K7/17 ,  F16K31/42 ,  F16K31/00 ,  F16K1/42

CPC分类号： F16K7/14 ,  F16K7/17 ,  F16K31/003 ,  F16K31/1221 ,  Y10T137/87209

摘要： Apparatus and method for fail-safe high-speed-pneumatic valve is disclosed. Fail-safe dependability is provided by a spring-loaded normally-closed pneumatic actuator. When the spring-loaded actuator is pressurized, the normally closed mechanism is actuated to the valve active position. Concurrently, the pressure is directly applied to deflect a diaphragm or a bellow-assembly back to sealing position. Ultra high purity embodiments with standard dome shaped diaphragms are disclosed. Additional high conductance diaphragms and bellows embodiments are employed for higher conductance valves. Novel flow path layouts are disclosed. The valves are applicable for fast gas and fluid switching and are particularly suitable for high productivity Atomic Layer Deposition (ALD) applications. Additional embodiments cover improved diaphragm and seal reliability, externally adjustable valve conductance, improved valve safety and high temperature valve seals.

公开(公告)号：EP1661161A2

公开(公告)日：2006-05-31

申请号：EP04780447.1

申请日：2004-08-09

申请人： Sundew Technologies, LLC

发明人： SNEH, Ofer

IPC分类号： H01L21/00

CPC分类号： H01L21/67167 ,  C23C14/566 ,  C23C16/4409 ,  C23C16/45519 ,  C23C16/54 ,  H01L21/67126 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67201 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/68742 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68785 ,  H01L21/68792

摘要： A seal-protected perimeter partition valve apparatus (450) defines a vacuum and pressure sealed space (401) within a larger space (540) confining a substrate processing chamber with optimized geometry, minimized footprint and 360° substrate accessibility. A compact perimeter partitioned assembly (520) with seal protected perimeter partition valve (450) and internally contained substrate placement member (480) further provides processing system modularity and substantially minimized system footprint.