公开(公告)号：EP1030345B1

公开(公告)日：2005-10-19

申请号：EP99309434.1

申请日：1999-11-25

申请人： ALPS ELECTRIC CO., LTD. ,  OHMI, Tadahiro

发明人： Nakano, Akira ,  Kim, Sung Chul ,  Kasama, Yasuhiko ,  Ohmi, Tadahiro ,  Ono, Shoichi ,  Fukuda, Koichi

IPC分类号： H01J37/32 ,  G01R27/22

CPC分类号： H01J37/32082 ,  G01R1/06772 ,  G01R27/02 ,  H01J37/32935

公开(公告)号：EP1030345A3

公开(公告)日：2003-02-05

申请号：EP99309434.1

申请日：1999-11-25

申请人： ALPS ELECTRIC CO., LTD. ,  Ohmi, Tadahiro

发明人： Nakano, Akira ,  Kim, Sung Chul ,  Kasama, Yasuhiko ,  Ohmi, Tadahiro ,  Ono, Shoichi ,  Fukuda, Koichi

IPC分类号： H01J37/32 ,  G01R27/22

CPC分类号： H01J37/32082 ,  G01R1/06772 ,  G01R27/02 ,  H01J37/32935

摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster with comparison with the conventional plasma equipment, and the film quality is high. Metal plates (80a, 80b) AC short between a chamber wall (10) and a shield (12) of an electrode of the same DC potential as the chamber.

公开(公告)号：EP1030345A2

公开(公告)日：2000-08-23

申请号：EP99309434.1

申请日：1999-11-25

申请人： ALPS ELECTRIC CO., LTD. ,  Ohmi, Tadahiro

发明人： Nakano, Akira ,  Kim, Sung Chul ,  Kasama, Yasuhiko ,  Ohmi, Tadahiro ,  Ono, Shoichi ,  Fukuda, Koichi

IPC分类号： H01J37/32

CPC分类号： H01J37/32082 ,  G01R1/06772 ,  G01R27/02 ,  H01J37/32935

摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster with comparison with the conventional plasma equipment, and the film quality is high. Metal plates (80a, 80b) AC short between a chamber wall (10) and a shield (12) of an electrode of the same DC potential as the chamber.

摘要翻译： 本发明提供一种等离子体设备，其优点在于，阻抗较小，与频率的依赖性低，功耗效率高，与常规等离子体设备相比成膜速度更快，并且膜质量 高。 金属板（80a，80b）在室壁（10）和与腔室相同的DC电位的电极的屏蔽（12）之间交流短路。