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公开(公告)号：EP1406292A2
公开(公告)日：2004-04-07
申请号：EP03023423.1
申请日：1999-11-25
发明人： Nakano, Akira , Kim, Sung, Chul , Fukuda, Koichi , Kasama, Yasuhiko , Ohmi, Tadahiro , Ono, Shoichi
CPC分类号： H01J37/32082 , G01R1/06772 , G01R27/02 , H01J37/32935
摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster with comparison with the conventional plasma equipment, and the film quality is high. Metalplates (80a, 80b) AC short between a chamber wall (10) and a shield (12) of an electrode of the same DC potential as the chamber.
摘要翻译： 本发明提供了一种等离子体设备，其优点在于，感光体阻抗小，对频率的依赖性低，功率消耗效率高，与传统等离子体设备相比成膜速度更快，并且膜质量 高。 在腔室壁（10）和与腔室具有相同DC电势的电极的屏蔽（12）之间的金属板（80a，80b）AC短路。
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公开(公告)号：EP1406292A3
公开(公告)日：2004-06-09
申请号：EP03023423.1
申请日：1999-11-25
发明人： Nakano, Akira , Kim, Sung, Chul , Fukuda, Koichi , Kasama, Yasuhiko , Ohmi, Tadahiro , Ono, Shoichi
CPC分类号： H01J37/32082 , G01R1/06772 , G01R27/02 , H01J37/32935
摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster with comparison with the conventional plasma equipment, and the film quality is high. Metalplates (80a, 80b) AC short between a chamber wall (10) and a shield (12) of an electrode of the same DC potential as the chamber.
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公开(公告)号：EP1406292B1
公开(公告)日：2005-04-13
申请号：EP03023423.1
申请日：1999-11-25
发明人： Nakano, Akira , Kim, Sung, Chul , Fukuda, Koichi , Kasama, Yasuhiko , Ohmi, Tadahiro , Ono, Shoichi
CPC分类号： H01J37/32082 , G01R1/06772 , G01R27/02 , H01J37/32935
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公开(公告)号：EP1030345B1
公开(公告)日：2005-10-19
申请号：EP99309434.1
申请日：1999-11-25
发明人： Nakano, Akira , Kim, Sung Chul , Kasama, Yasuhiko , Ohmi, Tadahiro , Ono, Shoichi , Fukuda, Koichi
CPC分类号： H01J37/32082 , G01R1/06772 , G01R27/02 , H01J37/32935
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公开(公告)号：EP1030345A3
公开(公告)日：2003-02-05
申请号：EP99309434.1
申请日：1999-11-25
发明人： Nakano, Akira , Kim, Sung Chul , Kasama, Yasuhiko , Ohmi, Tadahiro , Ono, Shoichi , Fukuda, Koichi
CPC分类号： H01J37/32082 , G01R1/06772 , G01R27/02 , H01J37/32935
摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster with comparison with the conventional plasma equipment, and the film quality is high. Metal plates (80a, 80b) AC short between a chamber wall (10) and a shield (12) of an electrode of the same DC potential as the chamber.
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6.发明公开Plasma treatment equipment and impedance measurement tool 有权Plasmabearbeitungsgerätund Werkzeug zur Impedanzmessung
公开(公告)号：EP1030345A2
公开(公告)日：2000-08-23
申请号：EP99309434.1
申请日：1999-11-25
发明人： Nakano, Akira , Kim, Sung Chul , Kasama, Yasuhiko , Ohmi, Tadahiro , Ono, Shoichi , Fukuda, Koichi
IPC分类号： H01J37/32
CPC分类号： H01J37/32082 , G01R1/06772 , G01R27/02 , H01J37/32935
摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster with comparison with the conventional plasma equipment, and the film quality is high. Metal plates (80a, 80b) AC short between a chamber wall (10) and a shield (12) of an electrode of the same DC potential as the chamber.
摘要翻译： 本发明提供一种等离子体设备，其优点在于，阻抗较小，与频率的依赖性低，功耗效率高，与常规等离子体设备相比成膜速度更快，并且膜质量 高。 金属板（80a，80b）在室壁（10）和与腔室相同的DC电位的电极的屏蔽（12）之间交流短路。
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