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公开(公告)号：EP1641031B1
公开(公告)日：2019-05-08
申请号：EP05011705.0
申请日：2005-05-31
发明人： Hasper, Albert , Vandezande, Lieve , Bankras, Radko Gerard , Snijders, Gert-Jan , De Blank, Marinus J.
IPC分类号： C23C16/34 , H01L21/285 , C23C16/455
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2.发明公开Apparatus for treating wafers, provided with a sensor box 审中-公开Waferverarbeitungsvorrichtung mit einerFühlerverpackung
公开(公告)号：EP1341213A2
公开(公告)日：2003-09-03
申请号：EP03075327.1
申请日：2003-02-03
IPC分类号： H01L21/00
CPC分类号： H01L21/67769
摘要： An apparatus for treating wafers, provided with at least one treatment chamber, the apparatus being provided with a feeding section in which wafers contained in a wafer storage box can be fed into the apparatus, the apparatus being provided with a wafer handling apparatus, by means of which wafers can be taken out of the wafer storage boxes so as to be treated in the treatment chamber, and the apparatus being provided with at least one sensor box arranged such that the wafer handling apparatus can feed a wafer into the sensor box through an opening provided for that purpose in the at least one sensor box, and the at least one sensor box being arranged to carry out measurements at a wafer, wherein the at least one sensor box is movably arranged and the apparatus is provided with a sensor box handling apparatus arranged to move the at least one sensor box from a storage position to a measuring position.
摘要翻译： 一种用于处理晶片的设备，具有至少一个处理室，所述设备设置有馈送部分，其中容纳在晶片存储盒中的晶片可以被馈送到所述设备中，所述设备通过装置设置有晶片处理装置 其中可以将晶片从晶片储存盒中取出以便在处理室中进行处理，并且该设备设置有至少一个传感器盒，其布置成使得晶片处理装置可以通过一个晶片处理装置将晶片馈送到传感器盒中 在所述至少一个传感器盒中设置用于该目的的开口，并且所述至少一个传感器盒被布置成在晶片处执行测量，其中所述至少一个传感器盒可移动地布置，并且所述设备设置有传感器盒处理 设置成将所述至少一个传感器盒从存储位置移动到测量位置的装置。
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公开(公告)号：EP1016128A1
公开(公告)日：2000-07-05
申请号：EP98967122.7
申请日：1998-07-03
IPC分类号： H01L21/00
CPC分类号： H01L21/67769 , H01L21/67766 , Y10S414/14
摘要： Storage assembly provided with a robot for placing cassettes, which are filled with wafers, in a carousel, comprising a number of magazines. These magazines lie both above one another and next to one another. In order to be able to determine the correct position of the head of the robot which holds the cassettes with respect to the magazines, it is proposed to provide sensor means which determine the vertical position of the head with respect to the base plate of the magazines and sensor means for determining the horizontal position of the head with respect to the magazines. This horizontal position is determined using openings arranged in the base plate of the magazines. In particular, a main opening and an auxiliary opening are present.
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4.发明授权Gas supply system, valve assembly and method of forming reactant pulses by operating a valve assembly 有权气体供给装置，阀组件以及用于与阀装置产生Reaktantpulsen方法
公开(公告)号：EP1486707B1
公开(公告)日：2007-11-21
申请号：EP03076812.1
申请日：2003-06-11
发明人： Snijders, Gert-Jan
IPC分类号： F16K11/02
CPC分类号： B01J4/02 , F16K11/022 , Y10T137/4259 , Y10T137/8667 , Y10T137/87249
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公开(公告)号：EP1111658B1
公开(公告)日：2006-12-13
申请号：EP00204696.9
申请日：2000-12-22
发明人： Snijders, Gert-Jan , de Ridder, Christianus Gerardus Maria , Kuznetsov, Vladimir Ivanovich , Terhorst, Herbert
IPC分类号： H01L21/00
CPC分类号： H01L21/67017 , H01L21/67109 , H01L21/6838
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6.发明公开Gas supply system, valve assembly and method of forming reactant pulses by operating a valve assembly 有权气体供给装置，阀组件以及用于与阀装置产生Reaktantpulsen方法
公开(公告)号：EP1486707A1
公开(公告)日：2004-12-15
申请号：EP03076812.1
申请日：2003-06-11
发明人： Snijders, Gert-Jan
IPC分类号： F16K11/02
CPC分类号： B01J4/02 , F16K11/022 , Y10T137/4259 , Y10T137/8667 , Y10T137/87249
摘要： A gas supply system for pulse-wise feeding a reactant gas to a reactor, the gas supply system comprising:
a first valve (300) being a four-port diaphragm valve;
a second valve (500) which in an open state brings the first port (30) into fluid communication with an exhaust and in a closed state closes off said fluid communication;
wherein the gas supply system provides a reactant flow state in which the first valve (300) is in an open state and the second valve (500) is in a closed state, and wherein the gas supply system provides a purge state in which the first valve (300) is closed and the second valve (500) is in an open state. Also disclosed are a method of switching a process fluid by operating a gas supply system according to the invention and a valve assembly for use in such a gas supply system.摘要翻译： 对于脉冲式进料反应气体到反应器中，气体供给系统包括气体供给系统：第一阀（300）是一个四端口隔膜阀; 其中在打开状态，在排气和在关闭状态使第一端口（30）成流体连通的第二阀（500）关闭所述流体连通; worin气体供给系统提供了其中所述第一阀（300）处于打开状态和第二阀（500）的反应物的流动状态是处于关闭状态，并且worin气体供给系统提供的净化状态，其中所述第一 阀（300）是闭合的，第二阀（500）处于打开状态。 所以圆盘游离缺失是通过操作气体供应系统gemäß本发明的和在搜索的气体供给系统中使用的阀组件切换的处理流体的方法。
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公开(公告)号：EP1111658A1
公开(公告)日：2001-06-27
申请号：EP00204696.9
申请日：2000-12-22
发明人： Snijders, Gert-Jan , de Ridder, Christianus Gerardus Maria , Kuznetsov, Vladimir Ivanovich , Terhorst, Herbert
IPC分类号： H01L21/00
CPC分类号： H01L21/67017 , H01L21/67109 , H01L21/6838
摘要： An apparatus for treating a wafer manufactured from semiconducting material, the apparatus comprising a first and a second housing part arranged for movement away from and towards each other, the two housing parts bounding a treatment chamber, while around the treatment chamber there is provided a first groove connected to gas discharge means, while in at least one of the two boundary surfaces there is provided a second groove connected to gas feed means, the first groove being located radially within the second groove, and, in use, the pressure created by the gas feed means being such that from the second groove, gas flows both in radial inward and in radial outward direction in the gap between the first and the second boundary surface.
摘要翻译： 一种用于处理由半导体材料制造的晶片的设备，该设备包括布置成彼此远离并朝向彼此移动的第一和第二壳体部分，两个壳体部分包围处理室，而在处理室周围设置有第一 沟槽连接到气体排出装置，而在两个边界表面中的至少一个中设置有连接到气体供给装置的第二凹槽，第一凹槽径向位于第二凹槽内，并且在使用中由 气体供给装置使得从第二凹槽，气体在第一和第二边界表面之间的间隙中径向向内和径向向外的方向流动。
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公开(公告)号：EP1641031A3
公开(公告)日：2007-09-05
申请号：EP05011705.0
申请日：2005-05-31
发明人： Hasper, Albert , Vandezande, Lieve , Bankras, Radko Gerard , Snijders, Gert-Jan , De Blank, Marinus J.
IPC分类号： H01L21/285 , C23C16/455
CPC分类号： H01L21/28562 , C23C16/34 , C23C16/45527 , C23C16/45546 , H01L21/28556
摘要： Titanium nitride (TiN) films are formed in a batch reactor (10) using titanium chloride (TiCl 4 ) and ammonia (NH 3 ) as precursors. The TiCl 4 is flowed into the reactor (10) in temporally separated pulses. The NH 3 can also be flowed into the reactor (10) in temporally spaced pulses which alternate with the TiCl 4 pulses, or the NH 3 can be flowed continuously into the reactor (10) while the TiCl 4 is introduced in pulses. The resulting TiN films exhibit low resistivity and good uniformity.
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9.发明公开
公开(公告)号：EP1641031A2
公开(公告)日：2006-03-29
申请号：EP05011705.0
申请日：2005-05-31
发明人： Hasper, Albert , Vandezande, Lieve , Bankras, Radko Gerard , Snijders, Gert-Jan , De Blank, Marinus J.
IPC分类号： H01L21/285
CPC分类号： H01L21/28562 , C23C16/34 , C23C16/45527 , C23C16/45546 , H01L21/28556
摘要： Titanium nitride (TiN) films are formed in a batch reactor (10) using titanium chloride (TiCl 4 ) and ammonia (NH 3 ) as precursors. The TiCl 4 is flowed into the reactor (10) in temporally separated pulses. The NH 3 can also be flowed into the reactor (10) in temporally spaced pulses which alternate with the TiCl 4 pulses, or the NH 3 can be flowed continuously into the reactor (10) while the TiCl 4 is introduced in pulses. The resulting TiN films exhibit low resistivity and good uniformity.
摘要翻译： 使用氯化钛（TiCl 4）和氨（NH 3）作为前体在间歇反应器（10）中形成氮化钛（TiN）膜。 TiCl 4在时间上分离的脉冲中流入反应器（10）。 NH 3也可以在与TiCl 4脉冲交替的时间间隔的脉冲中流入反应器（10），或者NH 3可以连续流入反应器（10），同时以脉冲形式引入TiCl 4。 所得到的TiN膜具有低电阻率和均匀性。
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公开(公告)号：EP1016128B1
公开(公告)日：2004-08-04
申请号：EP98967122.7
申请日：1998-07-03
IPC分类号： H01L21/00
CPC分类号： H01L21/67769 , H01L21/67766 , Y10S414/14
摘要： Storage assembly provided with a robot for placing cassettes, which are filled with wafers, in a carousel, comprising a number of magazines. These magazines lie both above one another and next to one another. In order to be able to determine the correct position of the head of the robot which holds the cassettes with respect to the magazines, it is proposed to provide sensor means which determine the vertical position of the head with respect to the base plate of the magazines and sensor means for determining the horizontal position of the head with respect to the magazines. This horizontal position is determined using openings arranged in the base plate of the magazines. In particular, a main opening and an auxiliary opening are present.
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