公开(公告)号：EP4094125A1

公开(公告)日：2022-11-30

申请号：EP20838574.0

申请日：2020-12-24

申请人： ASML Holding N.V. ,  ASML Netherlands B.V.

发明人： ALBRIGHT, Ronald, Peter ,  BAL, Kursat ,  BANINE, Vadim, Yevgenyevich ,  BRULS, Richard, Joseph ,  DE VRIES, Sjoerd, Frans ,  FRIJNS, Olav, Waldemar, Vladimir ,  HUANG, Yang-Shan ,  HUANG, Zhuangxiong ,  JACOBS, Johannes, Henricus, Wilhelmus ,  MOORS, Johannes, Hubertus, Josephina ,  NENCHEV, Georgi, Nenchev ,  NIKIPELOV, Andrey ,  RAASVELD, Thomas, Maarten ,  RANJAN, Manish ,  TE SLIGTE, Edwin ,  UMSTADTER, Karl, Robert ,  UZGÖREN, Eray ,  VAN DE KERKHOF, Marcus, Adrianus ,  YAGHOOBI, Parham

IPC分类号： G03F7/20 ,  H05G2/00

公开(公告)号：EP2041624A2

公开(公告)日：2009-04-01

申请号：EP07747548.1

申请日：2007-07-04

申请人： ASML Netherlands B.V.

发明人： FRIJNS, Olav, Waldemar, Vladimir

IPC分类号： G03F7/20

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70091 ,  G03F7/70133 ,  G03F7/70191 ,  H05G2/003 ,  H05G2/008

摘要： A method to align a discharge axis of a discharge radiation source with respect to optics of the lithographic apparatus includes creating a discharge in a substance in a discharge space between an anode and a cathode to form a plasma so as to generate electromagnetic radiation. The discharge is triggered by irradiating an area on a surface proximate the discharge space with an energetic beam. The position of the area is controlled in response to a property of the radiation in the lithographic apparatus and/or the temperature of a collector of the lithographic apparatus. Controlling the position of the area which is irradiated improves alignment of the discharge axis with the different lithographic modules, such as the contamination barrier, the illumination system, the substrate table and/or the projection system.

公开(公告)号：EP3371814A1

公开(公告)日：2018-09-12

申请号：EP16791002.5

申请日：2016-11-03

申请人： ASML Netherlands B.V.

发明人： DE JAGER, Pieter, Willem, Herman ,  BIJLSMA, Sipke, Jacob ,  FRIJNS, Olav, Waldemar, Vladimir ,  NIKIPELOV, Andrey, Alexandrovich ,  TEN KATE, Nicolaas ,  DERKSEN, Antonius, Theodorus, Anna, Maria ,  VERSPAY, Jacobus, Johannus, Leonardus, Hendricus ,  LANSBERGEN, Robert, Gabriël, Maria ,  KASTELIJN, Aukje, Arianne, Annette

IPC分类号： G21G1/12 ,  G21K5/04 ,  G21K5/08 ,  G21K5/10

摘要： A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).

公开(公告)号：EP3584801A1

公开(公告)日：2019-12-25

申请号：EP19190727.8

申请日：2016-11-03

申请人： ASML Netherlands B.V.

发明人： DE JAGER, Pieter, Willem, Herman ,  BIJLSMA, Sipke, Jacob ,  FRIJNS, Olav, Waldemar, Vladimir ,  NIKIPELOV, Andrey ,  TEN KATE, Nicolaas ,  DERKSEN, Antonius, Theodorus, Anna, Maria ,  VERSPAY, Jacobus, Johannus, Leonardus, Hendricus ,  LANSBERGEN, Robert, Gabriël, Maria ,  KASTELIJN, Aukje, Arianne, Annette

IPC分类号： G21G1/12 ,  G21K5/04 ,  G21K5/08 ,  G21K5/10

摘要： A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam (E) along a first path towards a first side of the target (30) and to direct a second portion of the electron beam (E) along a second path towards a second side of the target (30).

公开(公告)号：EP2041624B1

公开(公告)日：2013-12-18

申请号：EP07747548.1

申请日：2007-07-04

申请人： ASML Netherlands B.V.

发明人： FRIJNS, Olav, Waldemar, Vladimir

IPC分类号： G03F7/20

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70091 ,  G03F7/70133 ,  G03F7/70191 ,  H05G2/003 ,  H05G2/008

摘要： A method to align a discharge axis of a discharge radiation source with respect to optics of the lithographic apparatus includes creating a discharge in a substance in a discharge space between an anode and a cathode to form a plasma so as to generate electromagnetic radiation. The discharge is triggered by irradiating an area on a surface proximate the discharge space with an energetic beam. The position of the area is controlled in response to a property of the radiation in the lithographic apparatus and/or the temperature of a collector of the lithographic apparatus. Controlling the position of the area which is irradiated improves alignment of the discharge axis with the different lithographic modules, such as the contamination barrier, the illumination system, the substrate table and/or the projection system.

公开(公告)号：EP2236014A1

公开(公告)日：2010-10-06

申请号：EP08868996.3

申请日：2008-12-19

申请人： ASML Netherlands B.V.

发明人： SIDELNIKOV, Yurii, Victorovitch ,  BANINE, Valdim, Yevgenyevich ,  KOSHELEV, Konstantin, Nikolaevich ,  FRIJNS, Olav, Waldemar, Vladimir ,  KRIVTSUN, Vladimir, Mihailovitch

IPC分类号： H05G2/00

CPC分类号： H05G2/003

摘要： A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about (1) Pa and about (10) Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium.