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1.发明公开
公开(公告)号：EP4094125A1
公开(公告)日：2022-11-30
申请号：EP20838574.0
申请日：2020-12-24
发明人： ALBRIGHT, Ronald, Peter , BAL, Kursat , BANINE, Vadim, Yevgenyevich , BRULS, Richard, Joseph , DE VRIES, Sjoerd, Frans , FRIJNS, Olav, Waldemar, Vladimir , HUANG, Yang-Shan , HUANG, Zhuangxiong , JACOBS, Johannes, Henricus, Wilhelmus , MOORS, Johannes, Hubertus, Josephina , NENCHEV, Georgi, Nenchev , NIKIPELOV, Andrey , RAASVELD, Thomas, Maarten , RANJAN, Manish , TE SLIGTE, Edwin , UMSTADTER, Karl, Robert , UZGÖREN, Eray , VAN DE KERKHOF, Marcus, Adrianus , YAGHOOBI, Parham
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2.发明公开OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH AN OPTICAL ELEMENT, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY 有权光学元件中，光刻设备与用于制造部件，例如光学元件及其制造方法
公开(公告)号：EP2247968A1
公开(公告)日：2010-11-10
申请号：EP09715126.0
申请日：2009-02-24
发明人： SOER, Wouter, Anthon , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , YAKURIN, Andrey, Mikhailovich
CPC分类号： G02B5/208 , B82Y10/00 , G02B5/0891 , G02B5/22 , G02B5/26 , G03F7/70191 , G03F7/702 , G03F7/70575 , G03F7/70958 , G21K1/067 , G21K2201/061 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： An optical element includes a first layer (4) that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer (2) that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer (3) that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.
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3.发明授权OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH AN OPTICAL ELEMENT AND DEVICE MANUFACTURING METHOD 有权光学元件中，光刻设备与用于制造部件，例如光学元件及其制造方法
公开(公告)号：EP2247968B1
公开(公告)日：2012-04-04
申请号：EP09715126.0
申请日：2009-02-24
发明人： SOER, Wouter, Anthon , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , YAKURIN, Andrey, Mikhailovich
CPC分类号： G02B5/208 , B82Y10/00 , G02B5/0891 , G02B5/22 , G02B5/26 , G03F7/70191 , G03F7/702 , G03F7/70575 , G03F7/70958 , G21K1/067 , G21K2201/061 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： An optical element includes a first layer (4) that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer (2) that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer (3) that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.
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公开(公告)号：EP4200670A1
公开(公告)日：2023-06-28
申请号：EP21749855.9
申请日：2021-07-29
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公开(公告)号：EP1891480A2
公开(公告)日：2008-02-27
申请号：EP06747569.9
申请日：2006-06-13
发明人： VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , KLUNDER, Derk , Jan, Wilfred
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes a source (5) for supplying hydrogen radicals (1), a guide (2) for use in conjunction with the source, for directing hydrogen radicals to an application surface (4) to be targeted by the hydrogen radicals. The guide is provided with a coating (8) having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.
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公开(公告)号：EP1927032B1
公开(公告)日：2013-01-23
申请号：EP07818215.1
申请日：2007-09-18
发明人： EHM, Dirk, Heinrich , MUELLENDER, Stephan , STEIN, Thomas , MOORS, Johannes, Hubertus, Josephina , WOLSCHRIJN, Bastiaan, Theodoor , KRAUS, Dieter , VERSLUIS, Richard , MEIJERINK, Marcus, Gerhardus, Hendrikus
IPC分类号： G03F7/20
CPC分类号： G03B27/16 , B82Y10/00 , G03F7/70841 , G03F7/70883 , G03F7/70916 , G21K2201/061
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7.发明公开GETTER AND CLEANING ARRANGEMENT FOR A LITHOGRAPHIC APPARATUS AND METHOD FOR CLEANING A SURFACE 审中-公开Getter和清洗装置清洁表面的光刻设备和方法
公开(公告)号：EP2041623A2
公开(公告)日：2009-04-01
申请号：EP07747540.8
申请日：2007-06-28
发明人： VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , SOER, Wouter, Anthon
CPC分类号： G03F7/70925 , G03F7/70916
摘要： A lithographic apparatus includes a radiation source and an object (301) with a first surface (302) which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.
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8.发明公开
公开(公告)号：EP1927032A2
公开(公告)日：2008-06-04
申请号：EP07818215.1
申请日：2007-09-18
发明人： EHM, Dirk, Heinrich , MUELLENDER, Stephan , STEIN, Thomas , MOORS, Johannes, Hubertus, Josephina , WOLSCHRIJN, Bastiaan, Theodoor , KRAUS, Dieter , VERSLUIS, Richard , MEIJERINK, Marcus, Gerhardus, Hendrikus
IPC分类号： G03F7/20
CPC分类号： G03B27/16 , B82Y10/00 , G03F7/70841 , G03F7/70883 , G03F7/70916 , G21K2201/061
摘要： The invention relates to an optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, comprising: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
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