A METROLOGY APPARATUS WITH RADIATION SOURCE HAVING MULTIPLE BROADBAND OUTPUTS

    公开(公告)号:EP3696607A1

    公开(公告)日:2020-08-19

    申请号:EP20152335.4

    申请日:2020-01-17

    IPC分类号: G03F7/20 G03F9/00

    摘要: Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.

    A METROLOGY APPARATUS WITH RADIATION SOURCE HAVING MULTIPLE BROADBAND OUTPUTS

    公开(公告)号:EP3696606A1

    公开(公告)日:2020-08-19

    申请号:EP19157342.7

    申请日:2019-02-15

    IPC分类号: G03F7/20 G03F9/00

    摘要: Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.

    TOPOGRAPHY MEASUREMENT SYSTEM
    10.
    发明公开

    公开(公告)号:EP3394563A1

    公开(公告)日:2018-10-31

    申请号:EP16802087.3

    申请日:2016-11-30

    摘要: A topography measurement system includes a radiation source; a first grating; imaging optics; a movement mechanism; detection optics; a second grating; and a detector. The radiation source is configured to generate a radiation beam including ultraviolet radiation and includes a light emitting diode to produce to ultraviolet radiation. The first grating is configured to pattern the radiation beam. The imaging optics is configured to form a first image of the first grating at a target location on a substrate. The movement mechanism is operable to move the substrate relative to the image of the first grating such that the target location moves relative to the substrate. The detection optics is configured to receive radiation from the target location of the substrate and form an image of the first image at the second grating. The detector is configured to receive radiation transmitted through the second grating and produce an output signal.