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公开(公告)号：EP1847877A3
公开(公告)日：2009-02-11
申请号：EP07015576.7
申请日：2006-11-28
发明人： Visser, Huibert , Callan, David William , Munnig Schmidt, Robert-Han , Wiener, Roberto B , Van de Ven, Johannes Theodorus Guillelmus Maria , Robbins, George Howard
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70041 , G03F7/70358 , G03F7/70425
摘要： Apparatus and methods for compensating for the movement of a substrate (W) in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror (10) configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
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公开(公告)号：EP1847877A2
公开(公告)日：2007-10-24
申请号：EP07015576.7
申请日：2006-11-28
发明人： Visser, Huibert , Callan, David William , Munnig Schmidt, Robert-Han , Wiener, Roberto B , Van de Ven, Johannes Theodorus Guillelmus Maria , Robbins, George Howard
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70041 , G03F7/70358 , G03F7/70425
摘要： Apparatus and methods for compensating for the movement of a substrate (W) in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror (10) configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
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公开(公告)号：EP1793278A2
公开(公告)日：2007-06-06
申请号：EP06255958.8
申请日：2006-11-22
发明人： Visser, Huibert , Klinkhamer, Jacob Fredrik Friso , Ryzhikov, Lev , Coston, Scott , Joobeur, Adel , Vink, Henri Johannes Petrus , Shmarev, Yevgeniy Konstantinovich
IPC分类号： G03F7/20
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： A system and method are used to substantially homogenize and remove at least some coherence from a beam of radiation.
摘要翻译： 系统和方法用于基本均匀化并从辐射束中去除至少一些相干性。
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公开(公告)号：EP1793278A3
公开(公告)日：2007-12-05
申请号：EP06255958.8
申请日：2006-11-22
发明人： Visser, Huibert , Klinkhamer, Jacob Fredrik Friso , Ryzhikov, Lev , Coston, Scott , Joobeur, Adel , Vink, Henri Johannes Petrus , Shmarev, Yevgeniy Konstantinovich
IPC分类号： G03F7/20
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： Illumination system comprising a plate integrator (100) for forming a plurality of secondary light sources (104,104a,104b) and a coherence remover (102) having a plurality of transparent rods (102a-c) with different optical path lengths. A first lens (101 ) between integrator and coherence remover focuses each of the plurality of secondary sources on a respective one of the plurality of rods of the coherence remover. A second lens (103) located after the coherence remover recombines the plurality of incoherent beams in the mask plane (106).
摘要翻译： 照明系统包括用于形成多个二次光源（104,104a，104b）的板式积分器（100）和具有多个具有不同光路长度的透明杆（102a-c）的相干移除器（102）。 积分器和相干移除器之间的第一透镜（101）将多个二次源中的每一个聚焦在相干移除器的多个杆中的相应杆上。 位于相干移除器之后的第二透镜（103）将多个非相干光束重新组合在掩模平面（106）中。
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公开(公告)号：EP1795966B1
公开(公告)日：2008-06-18
申请号：EP06256076.8
申请日：2006-11-28
发明人： Visser, Huibert , Callan, David William , Munnig Schmidt, Robert-Han , Wiener, Roberto , Van De Ven, Johannes, T. G. , Robbins, George Howard
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70041 , G03F7/70358 , G03F7/70425
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公开(公告)号：EP1795966A1
公开(公告)日：2007-06-13
申请号：EP06256076.8
申请日：2006-11-28
发明人： Visser, Huibert , Callan, David William , Munnig Schmidt, Robert-Han , Wiener, Roberto , Van De Ven, Johannes, T. G. , Robbins, George Howard
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70041 , G03F7/70358 , G03F7/70425
摘要： Apparatus and methods for compensating for the movement of a substrate (W) in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror (10) configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
摘要翻译： 用于在辐射脉冲期间补偿光刻设备中的衬底（W）的移动的装置和方法包括提供可枢转镜（10），该可旋转镜配置为与衬底基本同步地移动入射在衬底上的图案化辐射束。
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