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    POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST
    2.
    发明公开
    POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST 有权
    正感光组合物，正型永久抵制和产生正永久抗蚀剂方法

    公开(公告)号：EP2216682A1

    公开(公告)日：2010-08-11

    申请号：EP08850248.9

    申请日：2008-11-12

    申请人： Adeka Corporation

    发明人： MORITA, Hiroshi ,  SATO, Hiromi ,  KOBAYASHI, Atsushi ,  OMI, Jinichi ,  SAITO, Seiichi

    IPC分类号： G03F7/075 ,  C08G77/16 ,  G03F7/023 ,  G03F7/40

    CPC分类号： C08G77/50 ,  C08G77/14 ,  C08G77/80 ,  C08K5/235 ,  C08K5/5419 ,  C08L83/06 ,  G03F7/0233 ,  G03F7/0758 ,  G03F7/40 ,  H01L23/296 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/124 ,  H01L2924/00

    摘要： The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1):

    and one or more arylalkoxysilane compounds represented by the following general formula (2):

    , (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.

    摘要翻译： 本发明提供了：一个正型感光性组合物做了产率，耐溶剂性，在​​不仅在高透明性优越的保温层，因此但在耐热性生产基板和耐时效性的永久的期间承受的温度抗蚀剂; 正型永久抗蚀膜利用该正型感光性组合物; 及其制造正型永久的方法抗蚀剂。 本发明提供：正型感光性组合物含有（A）具有硅烷醇基团，其树脂具有一个或多个由下面通式（1）表示的多环硅氧烷化合物之间通过反应而得到的结构的固化性有机硅树脂：和一个 或多种化合物arylalkoxysilanes代表由下述通式（2）：，（B）重氮萘醌，和（C）溶剂; 正型永久抗蚀膜使用该正型感光性组合物; 及其制造正型永久的方法抗蚀剂。