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公开(公告)号：EP1529245A1
公开(公告)日：2005-05-11
申请号：EP03762666.0
申请日：2003-07-09
摘要： The invention relates to an arrangement and method for the production of photomasks, whereby at least one defect control system is connected to at least one repair system via a stationary data link or an on-line link and the defect control system and the repair system are connected to each other data-wise in such a way that results obtained on one of the systems are directly available for reprocessing on the other system. The defect control system transmits defects, which are determined, to the repair system via a data link for data exchange. Said repair system controls the repair process according to the defects thus determined. An AIMS is advantageously provided as a defect control system, in addition to an electron beam system for defect control.
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2.发明授权VERFAHREN ZUR MASKENINSPEKTION IM RAHMEN DES MASKENDESIGNS UND DER MASKENHERSTELLUNG 有权方法掩模检查的面罩设计下方和掩模制造
公开(公告)号：EP1875307B1
公开(公告)日：2009-08-05
申请号：EP06706655.5
申请日：2006-02-04
申请人： Carl Zeiss SMS GmbH , Synopsys GmbH
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.
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3.发明授权REFLEKTIVES ROENTGENMIKROSKOP ZUR UNTERSUCHUNG VON OBJEKTEN MIT WELLENLAENGEN = 100NM IN REFLEXION 有权反光ROENTGENMIKROSKOP的对象与Wellenlaengen = 100NM反射调查
公开(公告)号：EP1446813B1
公开(公告)日：2010-11-10
申请号：EP03740130.4
申请日：2003-05-08
发明人： MANN, Hans-Jürgen , DINGER, Udo , ULRICH, Wilhelm , REINECKE, Wolfgang , ENGEL, Thomas , ZIBOLD, Axel , HARNISCH, Wolfgang , WEDOWSKI, Marco , PAUSCHINGER, Dieter
摘要： The invention relates to a reflective X-ray microscope for examining an object on an object plane wherein the object is illuminated with radiation at a wavelength of
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4.发明公开VERFAHREN ZUR MASKENINSPEKTION IM RAHMEN DES MASKENDESIGNS UND DER MASKENHERSTELLUNG 有权方法掩模检查的面罩设计下方和掩模制造
公开(公告)号：EP1875307A1
公开(公告)日：2008-01-09
申请号：EP06706655.5
申请日：2006-02-04
申请人： Carl Zeiss SMS GmbH , Synopsys GmbH
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.
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5.发明公开IN LAGE, FORM UND/ODER DEN OPTISCHEN EIGENSCHAFTEN VERÄNDERBARE BLENDEN- UND/ODER FILTERANORDNUNG FÜR OPTISCHE GERÄTE, INSBESONDERE MIKROSKOPE 审中-公开在适当的位置，以形成和/或用于光设备的可变光学性能光圈和/或过滤器装置，特别是MICROSCOPE
公开(公告)号：EP1680699A1
公开(公告)日：2006-07-19
申请号：EP04797515.6
申请日：2004-11-02
申请人： Carl Zeiss SMS GmbH
发明人： BÖHM, Klaus , SCHÄFFER, Peter , HARNISCH, Wolfgang , ENGEL, Thomas , ZIBOLD, Axel , GEH, Bernd
CPC分类号： G03F7/701 , G02B5/005 , G02B21/24 , G02B26/007
摘要： The invention relates to the use of two-dimensional arrays comprising individually triggerable elements for creating diaphragms in beam paths of optical devices. At least one two-dimensional array comprising individually triggerable elements for creating diaphragms and/or filters is disposed in the optical imaging and/or illuminating beam path of the diaphragm array and/or filter array for optical devices, the shape, position, and/or optical properties of which can be modified, and is connected to a control unit for triggering the individual elements. The inventive technical solution allows diaphragms and/or filters to be modified very quickly regarding the geometry, optical properties, and/or position thereof by electronically triggering the same. Said modifications can also be done online as an optical fine-tuning step during the measurement and adjustment process. Furthermore, using said systems makes it possible to dispense with the expensive and time-consuming production of diaphragms having geometrical shapes.
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