公开(公告)号：EP1924890A1

公开(公告)日：2008-05-28

申请号：EP06793489.3

申请日：2006-09-13

申请人： Carl Zeiss SMT AG

发明人： TOTZECK, Michael ,  BEDER, Susanne ,  CLAUSS, Wilfried ,  FELDMANN, Heiko ,  KRÄHMER, Daniel ,  DODOC, Aurelian

IPC分类号： G03F7/20

CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70566 ,  G03F7/70966

摘要： An optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, according to one aspect of the present invention has an optical system axis (OA) and at least one element group (200) consisting of three birefringent elements (211 ,212,213) each of which being made of optically uniaxial material and having an aspheric surface, wherein a first birefringent element (211 ) of said group has a first orientation of its optical crystal axis, a second birefringent element (212) of said group has a second orientation of its optical crystal axis, wherein said second orientation can be described as emerging from a rotation of said first orientation, said rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element (213) of said group has a third orientation of its optical crystal axis, wherein said third orientation can be described as emerging from a rotation of said second orientation said rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

公开(公告)号：EP1820050A1

公开(公告)日：2007-08-22

申请号：EP05824575.4

申请日：2005-12-08

申请人： Carl Zeiss SMT AG

发明人： CLAUSS, Wilfried ,  TOTZECK, Michael ,  MUELLER-RISSMANN, Werner

IPC分类号： G02B1/02 ,  C04B35/443 ,  G03F7/20

CPC分类号： C04B35/443 ,  C04B35/053 ,  C04B35/44 ,  C04B35/6455 ,  C04B2235/3225 ,  C04B2235/72 ,  C04B2235/762 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/9646 ,  G02B1/02 ,  G03F7/70341 ,  G03F7/70941 ,  G03F7/70958

摘要： A transmitting optical element (33, 37) adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material (100), with the polycrystalline material (100) having crystallites (102) with a cubic crystal structure, and with the mean crystallite size of these crystallites (102) being at least (0.5) micrometers, and at most (100) micrometers.

公开(公告)号：EP2030070A1

公开(公告)日：2009-03-04

申请号：EP07764671.9

申请日：2007-06-15

申请人： Carl Zeiss SMT AG

发明人： SCHUSTER, Karl-Heinz ,  FELDMANN, Heiko ,  GRUNER, Toralf ,  TOTZECK, Michael ,  CLAUSS, Wilfried ,  BEDER, Susanne ,  KRÄHMER, Daniel ,  DITTMANN, Olaf

IPC分类号： G02B27/00 ,  G03F7/20 ,  G02B5/30

CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3') which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.