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    PROTECTION MODULE FOR EUV LITHOGRAPHY APPARATUS, AND EUV LITHOGRAPHY APPARATUS
    2.
    发明公开
    PROTECTION MODULE FOR EUV LITHOGRAPHY APPARATUS, AND EUV LITHOGRAPHY APPARATUS 有权
    SCHUTZMODULFÜREUV-LITHOGRAPHIEVORRICHTUNG，SOWIE EUV-LITHOGRAPHIEVORRICHTUNG

    公开(公告)号：EP2335118A1

    公开(公告)日：2011-06-22

    申请号：EP09777597.7

    申请日：2009-08-01

    申请人： Carl Zeiss SMT GmbH

    发明人： EHM, Dirk, Heinrich ,  LAUFER, Timo ,  BANNEY, Ben ,  KUGLER, Jens ,  NIEKEN, Ulrich ,  KELLER, Franz

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70933 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70983

    摘要： In EUV lithography apparatus (10), it is proposed, in order to lengthen the lifetime of contamination- sensitive components, to arrange them in a protection module. The protection module comprises a housing (23-29) having at least one opening (37-47), in which at least one component (13a, 13b, 15, 16, 18, 19) is arranged and at which one or more gas feeds (30-36) are provided in order to introduce a gas flow into the housing (23-29), which emerges through the at least one opening (37-47). In order to effectively prevent contaminating substances from penetrating into the protection module, a light source (48-56) is arranged at the at least one opening (37-47), which light source illuminates the opening (37-47) with one or more wavelengths by which the contaminating substances can be dissociated before they penetrate through the opening (37-47).

    摘要翻译： 在EUV光刻设备（10）中，为了延长污染敏感元件的寿命，提出将它们安置在保护模块中。 保护模块包括具有至少一个开口（37-47）的壳体（23-29），其中布置有至少一个部件（13a，13b，15,16,18,19），并且一个或多个气体 提供进料（30-36）以便将气流引入到通过至少一个开口（37-47）出现的壳体（23-29）中。 为了有效地防止污染物质渗透到保护模块中，光源（48-56）布置在至少一个开口（37-47）处，该光源照射开口（37-47），其中一个或 污染物质在穿透开口（37-47）之前可以分解的更多波长。

    VERFAHREN ZUM HERSTELLEN EINES SPIEGELS FÜR EINE LITHOGRAPHIEANLAGE
    4.
    发明公开
    VERFAHREN ZUM HERSTELLEN EINES SPIEGELS FÜR EINE LITHOGRAPHIEANLAGE 审中-公开
    制造光刻设备的镜子的方法

    公开(公告)号：EP3268790A1

    公开(公告)日：2018-01-17

    申请号：EP16706356.9

    申请日：2016-02-25

    申请人： Carl Zeiss SMT GmbH

    发明人： LAUFER, Timo ,  AKBARINIA, Alireza

    IPC分类号： G02B7/182 ,  G03F7/20

    CPC分类号： G02B7/1815 ,  G02B17/0605 ,  G02B19/0023 ,  G03F7/70825 ,  G03F7/70891

    摘要： A method for producing a mirror (124) for a lithography apparatus (100) is disclosed, comprising the following steps. In a first step a), a likely heat flux distribution (518) on the mirror (124) is determined. In a second step b), a number of heating zones (HZ1 - HZ13) are formed on the mirror (124) in dependence on the determined heat flux distribution (518). In a third step c), a respective heating zone (HZ1 - HZ13) is provided with a respective heating device (HE1 - HE13) for heating the respective heating zone (HZ1 - HZ13) in dependence on a recorded temperature of the respective heating zone (HZ1 - HZ13) or the likely heat flux distribution (518) on the mirror (124).