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公开(公告)号:EP4217422A1
公开(公告)日:2023-08-02
申请号:EP20954413.9
申请日:2020-09-23
发明人: ZHANG, Jiguang , ZHENG, Yan , HE, Chao , GAO, Xuedong , GE, Qiangqing , BHAGWAGAR, Dorab , WEI, Peng , CHEN, Chen , CHEN, Hongyu
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公开(公告)号:EP4314159A1
公开(公告)日:2024-02-07
申请号:EP21933619.5
申请日:2021-03-30
发明人: HE, Chao , BHAGWAGAR, Dorab , LING, Ling , CHEN, Hongyu , CHEN, Chen , ZHANG, Jiguang
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公开(公告)号:EP4267675A1
公开(公告)日:2023-11-01
申请号:EP20966423.4
申请日:2020-12-24
发明人: HE, Chao , BHAGWAGAR, Dorab , ZHANG, Jiguang , LING, Ling , CHEN, Hongyu , WEI, Peng , ZHENG, Yan , CHEN, Chen
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公开(公告)号:EP4437044A1
公开(公告)日:2024-10-02
申请号:EP21964999.3
申请日:2021-11-23
发明人: WANG, Chenxu , ZHENG, Yan , HE, Chao , CHEN, Hongyu , CHEN, Chen
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公开(公告)号:EP4301825A1
公开(公告)日:2024-01-10
申请号:EP21928482.5
申请日:2021-03-03
发明人: HE, Chao , WEI, Peng , ZHANG, Jiguang , CHEN, Hongyu , ZHENG, Yan , CHEN, Chen , BHAGWAGAR, Dorab
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6.
公开(公告)号:EP3902873A1
公开(公告)日:2021-11-03
申请号:EP18944661.0
申请日:2018-12-29
发明人: HU, Xiaolian , ZHANG, Jiguang , ZHENG, Yan , CHEN, Hongyu , CHEN, Chen , BHAGWAGAR, Dorab , HANSEN, Darren
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公开(公告)号:EP3288991B1
公开(公告)日:2020-03-18
申请号:EP15890233.8
申请日:2015-04-28
IPC分类号: C08G73/10 , C07D241/04 , C07D413/10 , C07D265/33 , C09D179/02 , C09D179/08 , C08G73/02 , C25D3/38 , C25D3/32 , C25D3/58 , C25D3/60 , C07D413/06 , C07D413/12
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8.
公开(公告)号:EP3359550B1
公开(公告)日:2020-02-12
申请号:EP15905661.3
申请日:2015-10-08
发明人: LU, Weijing , DUAN, Lingli , NIAZIMBETOVA, Zukhra , CHEN, Chen , RZEZNIK, Maria
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9.
公开(公告)号:EP3359709A1
公开(公告)日:2018-08-15
申请号:EP15905660.5
申请日:2015-10-08
发明人: LU, Weijing , DUAN, Lingli , NIAZIMBETOVA, Zukhra , CHEN, Chen , RZEZNIK, Maria
IPC分类号: C25D3/38
摘要: Copper electroplating baths include reaction products of amines and polyacrylamides. The reaction products function as levelers and enable copper electroplating baths which have high throwing power and provide copper deposits with reduced nodules.
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10.
公开(公告)号:EP3359550A1
公开(公告)日:2018-08-15
申请号:EP15905661.3
申请日:2015-10-08
发明人: LU, Weijing , DUAN, Lingli , NIAZIMBETOVA, Zukhra , CHEN, Chen , RZEZNIK, Maria
CPC分类号: C25D3/38 , C08G73/024 , C23C18/1653 , C25D3/56 , C25D3/58 , C25D7/123 , H01L21/2885 , H01L21/76879 , H05K3/424 , H05K2203/0723
摘要: A polymer composed of a reaction product of an amine and a quinone. The quinone is a Michael addition receptor. The polymer may be an additive for a copper electroplating bath. The polymer may function as a leveler and enable the copper electroplating bath to have high throwing power and provide copper deposits with reduced nodules.
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