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1.发明公开METHOD TO FORM A PATTERN OF FUNCTIONAL MATERIAL ON A SUBSTRATE USING A STAMP HAVING A SURFACE MODIFYING MATERIAL 审中-公开用于形成功能材料结构在基底上使用的印章WITH A面变材料
公开(公告)号：EP2126631A1
公开(公告)日：2009-12-02
申请号：EP08727035.1
申请日：2008-03-20
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The invention provides a method to form a pattern of functional material on a substrate. The method uses an elastomeric stamp having a relief structure with a raised surface and having a modulus of elasticity of at least 10 MegaPascal. A surface modifying material is applied to the relief structure and forms a layer at least on the raised surface. A composition of the functional material and a liquid is applied to the layer of the surface modifying material on the relief structure and the liquid is removed to form a film. The elastomeric stamp transfers the functional material from the raised surface to the substrate to form a pattern of the functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.
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公开(公告)号：EP1879544A1
公开(公告)日：2008-01-23
申请号：EP06752529.5
申请日：2006-05-12
IPC分类号： A61K6/083
CPC分类号： A61K6/083 , A61K6/0017 , A61K6/0023 , C08L33/00
摘要： This invention relates to composite materials for restorative dentistry. More particularly, it relates to new components for dental composites, which impart an attractive combination of good mechanical properties and low shrinkage.
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公开(公告)号：EP2612201B1
公开(公告)日：2016-04-20
申请号：EP11757470.7
申请日：2011-09-01
CPC分类号： G03F7/033 , B41N1/12 , G03F7/0046 , G03F7/027 , G03F7/028 , G03F7/11 , Y10T428/24992 , Y10T428/3154
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公开(公告)号：EP1879545A1
公开(公告)日：2008-01-23
申请号：EP06759726.0
申请日：2006-05-12
IPC分类号： A61K6/083
CPC分类号： A61K6/083 , A61K6/0017 , A61K6/0023 , C08L33/00
摘要： This invention relates to composite materials for restorative dentistry. More particularly, it relates to new components for dental composites, which impart an attractive combination of good mechanical properties and low shrinkage.
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5.发明授权
公开(公告)号：EP2612202B1
公开(公告)日：2019-05-15
申请号：EP11760615.2
申请日：2011-09-01
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6.发明公开METHOD TO FORM A PATTERN OF FUNCTIONAL MATERIAL ON A SUBSTRATE INCLUDING THE TREATMENT OF A SURFACE OF A STAMP 审中-公开用于生产印面功能性材料处理的模式印象深刻KEEP
公开(公告)号：EP2126630A2
公开(公告)日：2009-12-02
申请号：EP08727034.4
申请日：2008-03-20
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , Y10T428/16
摘要： The invention provides a method to form a pattern of functional material on a substrate. The method uses an elastomeric stamp having a relief structure with a raised surface and having a modulus of elasticity of at least 10 MegaPascal. At least the raised surface of the stamp is treated by exposing the stamp to heat, radiation, electrons, a stream of charged gas, chemical fluids, chemical vapors, and combinations thereof, to enhance wettability of the surface. A composition of the functional material and a liquid is applied to the relief structure and the liquid is removed to form a film on the raised surface. The elastomeric stamp transfers the functional material from the raised surface to the substrate to form a pattern of the functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.
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7.发明公开
公开(公告)号：EP2041814A2
公开(公告)日：2009-04-01
申请号：EP07872556.1
申请日：2007-07-16
发明人： ANDREWS, Gerald, Donald , BAILEY, Richard, Kevin , BLANCHET, Graciela, Beatriz , CASPAR, Jonathan, V. , CATRON, John, W. , CHESTERFIELD, Reid, John , FELDER, Thomas, C. , GAO, Feng , GLICKSMAN, Howard, David , GOLDFINGER, Marc, B. , HARMER, Mark, Andrew , JAYCOX, Gary, Delmar , JOHNSON, Lynda, Kaye , KEUSSEYAN, Roupen, Leon , KEYS, Dalen, E. , MALAJOVICH, Irina , MARSHALL, William, J. , MCCORD, Elizabeth, Forrester , MCEWEN, Charles, Nehemiah , METH, Jeffrey, Scott , NUNES, Geoffrey , SCHIFFINO, Rinaldo, S. , SHANNON, Paul, J. , SHARP, Kenneth, George , TASSI, Nancy, G. , VISSCHER, Karyn, B.
IPC分类号： H01L51/00
CPC分类号： H01L51/0013 , H01L51/0545 , H05K1/097 , H05K3/046 , H05K2203/0528 , H05K2203/107 , Y10T428/24901
摘要： The invention discloses processes for thermal transfer patterning of a nanoparticle layer and a corresponding proximate portion of a carrier layer, and optionally additional transfer layers, together onto a thermal imaging receiver. The invention is useful for dry fabrication of electronic devices. Additional embodiments of the invention include multilayer thermal imaging donors comprising in layered sequence: a base film, a carrier layer and a nanoparticle layer. The carrier layer can be a dielectric or conducting layer. When the carrier layer is a dielectric layer, the base film includes a light attenuating agent in the form of a dye or pigment.
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8.发明公开TREATMENT OF FILAMENTS OR YARN IN ORDER TO IMPROVE THE ADHESION OF RUBBER 审中-公开BEHANDLUNG VON FILAMENTEN ODER GARN ZUR VERBESSERUNG DER HAFTUNG VON GUMMI
公开(公告)号：EP2917399A2
公开(公告)日：2015-09-16
申请号：EP13795055.6
申请日：2013-11-01
IPC分类号： D06M15/55 , D06M15/564 , D06M15/693 , C09J5/02 , B05D5/10 , C09J5/06 , B05D1/18
CPC分类号： D06M15/59 , B05D1/36 , B05D1/38 , B05D5/10 , B05D7/50 , B05D7/52 , B05D7/546 , C09J5/02 , C09J5/06 , C09J2400/263 , C09J2400/266 , C09J2421/006 , D06M15/05 , D06M15/507 , D06M15/55 , D06M15/564 , D06M15/693 , D06M15/71 , D06M2101/36
摘要： A method for treating an aromatic polyamide filament or yarn to improve its adhesion to rubber wherein, the method comprises exposing the filament or yarn to a first mixture of reagents comprising multi-functional isocyanate oligomers and multi-functional epoxy oligomers, wherein the ratio of total isocyanate groups to total epoxy groups in the mixture is in the range of from 0.8 to 1.2, and heating the exposed filament or yarn to a temperature of at least 100 degrees C. whereby the epoxy and isocyanate oligomers cross-link and form a network on the surface of the filament or yarn.
摘要翻译： 用于处理芳族聚酰胺长丝或纱线以改善其与橡胶的粘合性的方法，其中所述方法包括将长丝或纱线暴露于包含多官能异氰酸酯低聚物和多官能环氧低聚物的试剂的第一混合物中，其中总共 混合物中的异氰酸酯基团与总环氧基团的摩尔比在0.8至1.2的范围内，并将暴露的长丝或纱线加热到至少100℃的温度，由此环氧和异氰酸酯低聚物交联并形成网络 长丝或纱线的表面。
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