公开(公告)号：EP1295172A2

公开(公告)日：2003-03-26

申请号：EP01939413.9

申请日：2001-05-24

申请人： EASTMAN KODAK COMPANY

发明人： YANG, Xiqiang ,  OWCZARCZYK, Zbyslaw, Roland ,  SOUTHBY, David, Thomas ,  IRVING, Mark, Edward ,  MERKEL, Paul, Barrett ,  IRVING, Lyn, Marie ,  LEVY, David, Howard

IPC分类号： G03C1/498 ,  G03C1/42 ,  G03C7/28 ,  G03C8/40

CPC分类号： G03C8/4013 ,  G03C1/42 ,  G03C1/498 ,  G03C1/49845 ,  G03C7/28 ,  G03C8/402 ,  G03C8/408 ,  G03C2200/43 ,  G03C2200/52 ,  G03C2200/60 ,  Y10S430/165

摘要： A color photothermographic element comprising at least three light-sensitive units which have their individual sensitivities in different wavelength regions, each of the units comprising at least one light-sensitive silver-halide emulsion, binder, and dye-providing coupler, and a blocked developer in the presence of a thermal solvent represented by the following structure:wherein the groups are as defined in the specification to promote the thermal development of the photothermographic element.

公开(公告)号：EP1250629A1

公开(公告)日：2002-10-23

申请号：EP00988238.2

申请日：2000-12-20

申请人： EASTMAN KODAK COMPANY(a New Jersey corporation)

发明人： IRVING, Mark, E. ,  SZAJEWSKI, Richard, P. ,  IRVING, Lyn, Marie

IPC分类号： G03C7/413 ,  G03C1/42

CPC分类号： G03C7/30541 ,  G03C1/42 ,  G03C7/12 ,  G03C7/333 ,  G03C7/39224 ,  G03C7/407 ,  G03C7/4136 ,  G03C8/4013 ,  G03C2200/52 ,  G03C2200/60 ,  Y10S430/156 ,  Y10S430/16

摘要： This invention relates to packaged photographic film that is capable of being alternately processed, according to individual consumer choice, by either (1) a traditional wet-chemistry process with a phenylenediamine-containing developer solution followed by desilvering in one or more subsequent solutions to obtain a color negative film, or (2) a thermal process involving the use of a relatively minor amount of an aqueous solution containing a liberating agent such as alkaline base to activate (unblock) a blocked phenylenediamine developing agent located within the photographic element, followed by electronic scanning of the developed film without desilvering. This invention enables a single film stock to be developed in both a conventional deep tank process and in an apparently dry process.

公开(公告)号：EP2217740B1

公开(公告)日：2014-02-26

申请号：EP08833709.2

申请日：2008-09-16

申请人： Eastman Kodak Company

发明人： YANG, Cheng ,  IRVING, Lyn, Marie ,  LEVY, David, Howard ,  COWDERY-CORVAN, Peter, Jerome ,  FREEMAN, Diane, Carol

IPC分类号： C23C16/04 ,  C23C16/455 ,  H01L21/02 ,  H01L21/314 ,  H01L21/316 ,  H01L51/00

CPC分类号： C23C16/45551 ,  C23C16/042 ,  H01L21/02175 ,  H01L21/02178 ,  H01L21/0228 ,  H01L21/02304 ,  H01L21/3141 ,  H01L21/31616 ,  H01L51/0004

公开(公告)号：EP2217740A1

公开(公告)日：2010-08-18

申请号：EP08833709.2

申请日：2008-09-16

申请人： Eastman Kodak Company

发明人： YANG, Cheng ,  IRVING, Lyn, Marie ,  LEVY, David, Howard ,  COWDERY-CORVAN, Peter, Jerome ,  FREEMAN, Diane, Carol

IPC分类号： C23C16/455 ,  C23C16/04

CPC分类号： C23C16/45551 ,  C23C16/042 ,  H01L21/02175 ,  H01L21/02178 ,  H01L21/0228 ,  H01L21/02304 ,  H01L21/3141 ,  H01L21/31616 ,  H01L51/0004

摘要： An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organic compound or polymer; and patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. An inorganic thin film material is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.

公开(公告)号：EP1299769A1

公开(公告)日：2003-04-09

申请号：EP01944226.8

申请日：2001-06-01

申请人： EASTMAN KODAK COMPANY

发明人： IRVING, Lyn, Marie ,  LEVY, David, Howard

IPC分类号： G03C1/498

CPC分类号： G03C1/49845 ,  G03C1/34 ,  G03C1/49809 ,  G03C2200/42 ,  Y10S430/16

摘要： The present invention is directed to the use of a mixture of non-light sensitive organic silver salts in a color photothermographic system comprising a blocked developing agent for color imaging. At least one of the organic silver salts is the sole or primary silver donor during thermal development and at least one other organic silver salt, present at levels in the range of 30,000 to 60,000 mg/mol of silver halide, effectively inhibits fog during thermal development of the photothermographic element. In one embodiment, and the system comprises a mixture of at least two organic silver salts, wherein the first organic silver salts exhibits a cLogP of 0.1 to 10 and a Ksp of 7 to 14 and wherein the second organic silver salt exhibits a cLogP of 0.1 to 10 and a Ksp of 14 to 21.

公开(公告)号：EP2217969A1

公开(公告)日：2010-08-18

申请号：EP08851673.7

申请日：2008-11-12

申请人： Eastman Kodak Company

发明人： IRVING, Lyn, Marie ,  FREEMAN, Diane, Carol ,  COWDERY-CORVAN, Peter, Jerome ,  YANG, Cheng ,  LEVY, David, Howard

IPC分类号： G03F7/00 ,  G03F7/20 ,  H01L21/77

CPC分类号： H01L27/1288 ,  G03F7/0005 ,  G03F7/2022 ,  H01L27/1214 ,  H01L27/1225 ,  H01L27/1292 ,  H01L29/66765 ,  H01L29/7869

摘要： The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer by exposing the first layer through the color mask with visible light to form a first pattern and developing the deposition inhibitor material to provide selected areas of the first layer effectively not having the deposition inhibitor material; and (e) depositing a second layer of functional material over the transparent support; wherein the second layer of functional material is substantially deposited only in selected areas over the transparent support not having the deposition inhibitor material.

公开(公告)号：EP2212744A1

公开(公告)日：2010-08-04

申请号：EP08853119.9

申请日：2008-11-10

申请人： Eastman Kodak Company

发明人： IRVING, Lyn, Marie ,  LEVY, David, Howard ,  IRVING, Mark, Edward ,  ELLINGER, Carolyn, Rae

IPC分类号： G03F7/00 ,  G03F7/20 ,  H01L21/77

CPC分类号： G03F7/0007 ,  G03F1/14 ,  G03F7/2022 ,  H01L27/1214 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/66765 ,  H01L29/7869 ,  Y10T428/24802

摘要： The invention relates to a process for forming a stacked transparent structure comprising providing a support, coating one side of said support with a multicolored mask, coating the other side of the support with a layer curable by visible light, and exposing the light-curable layer through the mask with visible light to cure the layer curable by light in exposed portions to form a cured pattern.