公开(公告)号：EP2365512A2

公开(公告)日：2011-09-14

申请号：EP11004165.4

申请日：2001-06-27

申请人： EBARA CORPORATION ,  Kabushiki Kaisha Toshiba

发明人： Nakasuji, Mamoru ,  Noji, Nobuharu ,  Satake, Toru ,  Hatakeyama, Masahiro ,  Kimba, Toshifumi ,  Sobukawa, Hirosi ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Karimata, Tsutomu ,  Oowada, Shin ,  Saito, Mutsumi ,  Yamazaki, Yuichiro ,  Nagai, Takamitsu ,  Nagahama, Ichirota

IPC分类号： H01J37/063 ,  H01J37/29 ,  H01L21/027 ,  H01L21/66 ,  H01L21/677

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束的检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子光学系统;以及用于检测由电子束投影的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳舞台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; ; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：EP2365512A3

公开(公告)日：2012-01-04

申请号：EP11004165.4

申请日：2001-06-27

申请人： EBARA CORPORATION ,  Kabushiki Kaisha Toshiba

发明人： Nakasuji, Mamoru ,  Noji, Nobuharu ,  Satake, Toru ,  Hatakeyama, Masahiro ,  Kimba, Toshifumi ,  Sobukawa, Hirosi ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Karimata, Tsutomu ,  Oowada, Shin ,  Saito, Mutsumi ,  Yamazaki, Yuichiro ,  Nagai, Takamitsu ,  Nagahama, Ichirota

IPC分类号： H01J37/063 ,  H01J37/29 ,  H01L21/027 ,  H01L21/66 ,  H01L21/677 ,  G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01L21/67

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.

公开(公告)号：EP2587515A1

公开(公告)日：2013-05-01

申请号：EP13000328.8

申请日：2001-06-27

申请人： EBARA CORPORATION ,  Kabushiki Kaisha Toshiba

发明人： Nakasuji, Mamoru ,  Noji, Nobuharu ,  Satake, Tohru ,  Hatakeyama, Masahiro ,  Kimba, Toshifumi ,  Sobukawa, Hirosi ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Karimata, Tsutomu ,  Oowada, Shin ,  Saito, Mutsumi ,  Yamazaki, Yuichiro ,  Nagai, Takamitsu ,  Nagahama, Ichirota

IPC分类号： H01J37/063 ,  H01J37/29 ,  H01L21/027 ,  H01L21/66 ,  G03F1/86

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 在包括由电子束检查装置70具有为电子 - 光学系统，用于从在电子束源与一次电子束照射物体的电子光学器件，和用电子投射用于检测所述二次电子图像检测器 光学系统; 用于保持和相对于电子光学系统中的物体移动的阶段系统50; 用于供给清洁气体至该物体，以防止接触到物体灰尘微环境腔室20; 用于容纳所述载物台装置的工作室31，工作腔室是可控制的，以便具有一个真空气氛; 至少两个装载室41，42中的微环境腔和工作腔，angepasst之间布置成unabhängig可控的，从而有一个真空气氛; ; 和用于传递环装载机60通过装载室中的对象到载置台系统。

公开(公告)号：EP0663671B1

公开(公告)日：1998-07-22

申请号：EP94120961.1

申请日：1994-12-30

申请人： EBARA CORPORATION

发明人： Saito, Mutsumi ,  Yahiro, Tomoyuki ,  Hatakeyama, Masahiro

IPC分类号： G21K1/14 ,  H05H3/02

CPC分类号： G21K1/14 ,  H05H3/02

公开(公告)号：EP0663671A1

公开(公告)日：1995-07-19

申请号：EP94120961.1

申请日：1994-12-30

申请人： EBARA CORPORATION

发明人： Saito, Mutsumi ,  Yahiro, Tomoyuki ,  Hatakeyama, Masahiro

IPC分类号： G21K1/14 ,  H05H3/02

CPC分类号： G21K1/14 ,  H05H3/02

摘要： A beam charge exchanging apparatus for exchanging the charges of charged particles in a fast particle beam emitted from a source of the fast particle beam is disclosed. The apparatus comprises; a gas container for charge exchange placed in a vacuum atmosphere; holes provided in the container for passing the fast particle beam through the container; a source of gas; means for introducing the gas in the container as a high speed gas fluid; the fast particle beam is collided with the high speed gas fluid in the container for exchanging charges therebetween and turning the fast particle beam to a neutral particle beam. The apparatus further may include means for detecting the quantity of neutral particles resulting from the charge exchange by measuring the quantity of ionized gas generated in the high speed gas fluid as an electric current.

摘要翻译： 公开了一种用于交换从快速粒子束的源发射的快速粒子束中的带电粒子的电荷的束电荷交换装置。 该装置包括： 用于充电交换的气体容器置于真空气氛中; 设置在容器中的用于使快速粒子束通过容器的孔; 气源; 用于将气体作为高速气体流体引入容器的装置; 快速粒子束与容器中的高速气体流体相撞，用于在其间交换电荷并将快速粒子束转向中性粒子束。 该装置还可以包括用于通过测量在高速气体流体中产生的电离气体的量作为电流来检测由电荷交换产生的中性粒子的量的装置。