专利检索 ap:("FUJIFILM CORP") AND inv:"FUJITA MITSUHIRO" 第 1 页

1.

发明公开
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 审中-公开
标题翻译：光化辐射敏感或敏感性树脂组合物及散热结构，教育的过程，

公开(公告)号：EP2414896A4

公开(公告)日：2012-08-08

申请号：EP10758878

申请日：2010-03-26

申请人： FUJIFILM CORP

发明人： TANGO NAOHIRO , SHIRAKAWA MICHIHIRO , FUJITA MITSUHIRO , YAMAGUCHI SHUHEI , SHUBUYA AKINORI , KATAOKA SHOHEI

IPC分类号： G03F7/004 , C07C381/12 , C07D217/08 , C07D285/00 , C07D333/16 , C08F20/10 , G03F7/039 , G03F7/20 , G03F7/38 , H01L21/027

CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/42 , G03F7/0397 , G03F7/2041 , C08F220/22

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.

2.

发明公开
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION 审中-公开
标题翻译：对光合或其它辐射敏感树脂组合物，对光合或其它辐射感光胶片体和结构形成方法使用该组合物

公开(公告)号：EP2580624A4

公开(公告)日：2014-07-30

申请号：EP11849906

申请日：2011-12-22

申请人： FUJIFILM CORP

发明人： MATSUDA TOMOKI , SHIBUYA AKINORU , TOKUGAWA YOKO , YAMAGUCHI SHUHEI , FUJITA MITSUHIRO

IPC分类号： G03F7/004 , G03F7/039 , G03F7/11 , H01L21/027

CPC分类号： G03F7/0045 , C07C381/12 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041