专利检索 ap:("FUJIFILM CORP") AND inv:"SAITOH SHOICHI" 第 1 页

1.

发明公开
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 有权
标题翻译：结构上形成过程对光合辐射敏感或辐射敏感树脂组合物，涂料层，方法生产电子器件和电子设备

公开(公告)号：EP2715451A4

公开(公告)日：2015-03-04

申请号：EP12793094

申请日：2012-05-25

申请人： FUJIFILM CORP

发明人： KATO KEITA , SHIRAKAWA MICHIHIRO , TAKAHASHI HIDENORI , SAITOH SHOICHI , YOSHINO FUMIHIRO

IPC分类号： G03F7/039 , C08F220/12 , G03F7/038 , G03F7/20 , G03F7/32 , H01L21/027

CPC分类号： G03F7/0382 , C08F220/12 , G03F7/0392 , G03F7/0397 , G03F7/30 , G03F7/325

2.

发明公开
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM 审中-公开
标题翻译：及图案形成装置，反对光化射线或敏感性树脂组合物和抵御辐射膜

公开(公告)号：EP2681623A4

公开(公告)日：2015-05-06

申请号：EP12752967

申请日：2012-02-24

申请人： FUJIFILM CORP

发明人： TAKAHASHI HIDENORI , YAMAGUCHI SHUHEI , KATAOKA SHOHEI , SHIRAKAWA MICHIHIRO , YOSHINO FUMIHIRO , SAITOH SHOICHI

IPC分类号： G03F7/038 , G03F7/004 , G03F7/039 , G03F7/11 , G03F7/20 , G03F7/32 , G03F7/40

CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , G03F7/325 , G03F7/40

摘要： A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.