公开(公告)号：EP4039669A1

公开(公告)日：2022-08-10

申请号：EP20872132.4

申请日：2020-09-14

申请人： FUJIFILM Corporation

发明人： MIYOSHI, Taro ,  YONEKUTA, Yasunori ,  FUKUZAKI, Eiji ,  TAKAHASHI, Toshiya

IPC分类号： C07C25/02 ,  C07C43/225 ,  C07C309/12 ,  C07C309/22 ,  C07C309/42 ,  C07C309/58 ,  C07C381/12 ,  C08F12/24 ,  C08F20/16 ,  C08F20/58 ,  C09K3/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20

摘要： An active light sensitive or radiation sensitive resin composition which contains (A) an acid-decomposable resin, (B) a compound represented by general formula (bl), and (C) a compound represented by general formula (c1), wherein the ratio of the content of the compound (C) to the content of the compound (B) is from 0.01% by mass to 10% by mass; an active light sensitive or radiation sensitive film which uses this active light sensitive or radiation sensitive resin composition; a pattern forming method; and a method for producing an electronic device. In the formulae, L1 represents a single bond or a divalent linking group; A represents a group that is decomposed by the action of an acid; each B represents a group that is decomposed by the action of an acid, a hydroxy group or a carboxy group, provided that at least one B represents a hydroxy group or a carboxy group; n represents an integer from 1 or 5; X represents an (n+1)-valent linking group; and M + represents a sulfonium ion or an iodonium ion.

公开(公告)号：EP2691809A1

公开(公告)日：2014-02-05

申请号：EP12763123.2

申请日：2012-03-29

申请人： FUJIFILM Corporation

发明人： TAKAHASHI, Toshiya ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki ,  HIRANO, Shuji ,  TSUCHIMURA, Tomotaka

IPC分类号： G03F7/039 ,  G03F7/004 ,  H01L21/027

CPC分类号： G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

摘要： Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.