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1.
公开(公告)号:EP4322933A1
公开(公告)日:2024-02-21
申请号:EP22789012.6
申请日:2022-04-15
申请人: ESSA PHARMA INC.
发明人: ZHOU, Han-Jie , VIRSIK, Peter
IPC分类号: A61K31/09 , A61P35/00 , A61P5/28 , C07C43/225
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2.
公开(公告)号:EP4234524A2
公开(公告)日:2023-08-30
申请号:EP23157255.3
申请日:2022-06-24
发明人: KIM, Ki Won , OH, Kyung Hwan , YUN, Bu Yong , LEE, Hyung Dong , SHIN, Jin Woo , MUN, Soung Yun , YOO, Jae Duk , LEE, Jung Geun , LEE, Joon Gu , LEE, Yeon Hwa , KIM, Mi Kyung , SEO, Ji Hyun , LEE, Kwan Hee
IPC分类号: C07C22/08 , C07C25/18 , C07C43/225 , C07C43/174 , C07D333/50 , C07F7/08 , H10K71/00 , C07D213/26 , C07D307/77 , C07D487/04
摘要: The present invention relates to a fluorinated compound as a material for a metal (cathode) patterning material represented by Formula (2-11) and having an intramolecular fluorine content of 30% or more:
wherein b is an integer from 0 to 10, x is an integer of 5 to 15, y+z is an integer of 2x+1, A' is a C6-C30 arylene group; R4 is selected from a group consisting of a C6-C30 aryl group; a fluorenyl group; a C2-C30 heterocyclic group including at least one heteroatom of O, N, 5, Si or P; a C1-C20 alkyl group; and a C1-C20 alkoxyl group; or R4 may be bonded to each other to form a ring, wherein, the aryl group, the arylene group, the heterocyclic group, the fluorenyl group, the alkyl group, and the alkoxyl group may be further substituted with one or more substituents selected from the group consisting of each deuterium; halogen; a C1-C20 alkyl group; C2-C20 alkenyl group; C6-C20 aryl group; C6-C20 aryl group substituted with deuterium; and C2-C20 heterocyclic group.-
公开(公告)号:EP4177244A3
公开(公告)日:2023-08-09
申请号:EP22198307.5
申请日:2020-07-10
申请人: Adama Agan Ltd.
发明人: Barda, Barda , Papo, Nitsan , Recsei, Carl
IPC分类号: C07D261/04 , C07C41/22 , C07C43/225 , C07D231/20 , C07D413/12
摘要: The invention relates to a process for preparing immediate precursors for pyroxasulfone and fenoxasulfone preparation of the formula (I). The process comprises a bromination reaction of a benzylic position without light irradiation (step a), followed by thoination reaction, which substitutes the bromine atom (step b) and after the protecting group is removed, and the revealed thiol or thiolate reacts with a substituted isoxazoline bearing a leaving group at the 3-position (step c).
wherein
Y = protecting group
In another variant of the invention the pyroxasulfone or fenoxasulfone immediate precursor is synthesized from the arylmethyl bromide by first forming a carbon-sulfur bond at the 3-position of a 2-isoxazoline through displacement of a leaving group at the 3-position (particularly acid derived residues such as phosphoryl, sulfanyl, halo, cyano or carboxyl groups) by an appropriate thionating reagent. The resulting adducts, which is a S-protected 3-thio-2-isoxazoline, may be treated with base to remove the protecting group, to reveal a thiol or thiolate which may subsequently react with the arylmethyl bromide to form the Pyroxasulfone or Fenoxasulfone immediate precursor.
Ar = aryl, Y = protecting group and X = leaving group-
公开(公告)号:EP4177252A2
公开(公告)日:2023-05-10
申请号:EP22198312.5
申请日:2020-07-10
申请人: Adama Agan Ltd.
发明人: Barda, Yaniv , Papo, Nitsan , Recsei, Carl
IPC分类号: C07D413/12 , C07D231/20 , C07D261/04 , C07C43/225
摘要: The invention relates to a process for preparing immediate precursors for pyroxasulfone and fenoxasulfone of the formula (I) and (I').
The pyroxasulfone or fenoxasulfone immediate precursor is synthesized from the arylmethyl bromide by first forming a carbon-sulfur bond at the 3-position of a 2-isoxazoline through displacement of a leaving group at the 3-position (particularly acid derived residues such as phosphoryl, sulfanyl, halo, cyano or carboxyl groups) by an appropriate thionating reagent. The resulting adducts, which is a S-protected 3-thio-2-isoxazoline, may be treated with base to remove the protecting group, to reveal a thiol or thiolate which may subsequently react with the arylmethyl bromide to form the Pyroxasulfone or Fenoxasulfone immediate precursor.-
公开(公告)号:EP3016931B1
公开(公告)日:2021-02-24
申请号:EP14738726.0
申请日:2014-06-19
发明人: KOFTIS, V. Theocharis , NEOKOSMIDIS, Efstratios , STATHAKIS, Christos , ANDREOU, Thanos , RAPTIS, Christos , VARVOGLI, Anastasia-Aikaterini
IPC分类号: C07C233/18 , C07C41/18 , C07C41/22 , C07C43/225 , C07C217/60 , C07C213/02 , C07C231/02
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公开(公告)号:EP3322757B1
公开(公告)日:2020-08-26
申请号:EP16741849.0
申请日:2016-07-08
申请人: TWO Teknik ApS
发明人: WARNER, Tim , SCHAUMBURG, Kjeld
IPC分类号: C09D5/00 , C09D163/00 , C07C43/225
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公开(公告)号:EP3131898B1
公开(公告)日:2020-03-18
申请号:EP15727031.5
申请日:2015-04-17
申请人: Lomox Limited
IPC分类号: C07D417/14 , C07C65/26 , C07C35/21 , C07C69/92 , C07C43/225 , C07D207/452 , C07D285/14 , H01L51/00
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公开(公告)号:EP3121160B1
公开(公告)日:2020-01-01
申请号:EP15765516.8
申请日:2015-03-19
发明人: YAMAMOTO, Yuuki , NOSE, Masatoshi , NAMIKAWA, Takashi , NOMURA, Takashi , ISHIHARA, Sumi , YOSHIYAMA, Asako , KISHIMOTO, Masayuki , SUYAMA, Makoto , ADACHI, Kenji , KISHIKAWA, Yosuke
IPC分类号: C07C41/01 , C07C41/16 , C07C43/225 , C07C327/26
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公开(公告)号:EP3406585A1
公开(公告)日:2018-11-28
申请号:EP16886514.5
申请日:2016-12-19
发明人: MORI Ayako , KIMURA Keiji , SATOU Teizi
IPC分类号: C07C43/225 , C07D309/06 , C09K19/12 , C09K19/14 , C09K19/18 , C09K19/20 , C09K19/30 , C09K19/32 , C09K19/34 , C09K19/42 , G02F1/13
摘要: A means is a compound represented by formula (1), a liquid crystal composition containing the compound, and a liquid crystal display device including the composition.
R 1 and R 2 are independently alkyl having 1 to 15 carbons or the like; ring A 1 , ring A 2 and ring A 3 are independently 1, 4-cyclohexylene, 1,4-phenylene or the like; and Z 1 , Z 2 and Z 3 are independently a single bond or the like.-
公开(公告)号:EP3052462B1
公开(公告)日:2018-08-22
申请号:EP14780498.3
申请日:2014-10-02
申请人: BASF SE
发明人: KLAUBER, Eric George , RACK, Michael , ZIERKE, Thomas , HOLUB, Nicole , CORTES, David , SCHMELEBECK, Gerald , JI, Junmin
IPC分类号: C07C37/02 , C07C41/16 , C07C39/30 , C07C43/225
CPC分类号: C07C51/377 , C07C37/02 , C07C41/16 , C07C67/297 , C07F1/005 , C07F1/04 , C07C39/30 , C07C43/225
摘要: The present invention relates to a process for providing a compound of formula (I):, wherein R is hydrogen or R', wherein R' is –(C1-C4)alkyl, and Hal is a halogen, the process comprising the step of: reacting a compound of formula (II) wherein Hal is defined as above, with an alkali metal alkoxide of the formula XOR', wherein X is an alkali metal, and R' is defined as above.
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