公开(公告)号：EP4039669A1

公开(公告)日：2022-08-10

申请号：EP20872132.4

申请日：2020-09-14

申请人： FUJIFILM Corporation

发明人： MIYOSHI, Taro ,  YONEKUTA, Yasunori ,  FUKUZAKI, Eiji ,  TAKAHASHI, Toshiya

IPC分类号： C07C25/02 ,  C07C43/225 ,  C07C309/12 ,  C07C309/22 ,  C07C309/42 ,  C07C309/58 ,  C07C381/12 ,  C08F12/24 ,  C08F20/16 ,  C08F20/58 ,  C09K3/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20

摘要： An active light sensitive or radiation sensitive resin composition which contains (A) an acid-decomposable resin, (B) a compound represented by general formula (bl), and (C) a compound represented by general formula (c1), wherein the ratio of the content of the compound (C) to the content of the compound (B) is from 0.01% by mass to 10% by mass; an active light sensitive or radiation sensitive film which uses this active light sensitive or radiation sensitive resin composition; a pattern forming method; and a method for producing an electronic device. In the formulae, L1 represents a single bond or a divalent linking group; A represents a group that is decomposed by the action of an acid; each B represents a group that is decomposed by the action of an acid, a hydroxy group or a carboxy group, provided that at least one B represents a hydroxy group or a carboxy group; n represents an integer from 1 or 5; X represents an (n+1)-valent linking group; and M + represents a sulfonium ion or an iodonium ion.

公开(公告)号：EP4293054A1

公开(公告)日：2023-12-20

申请号：EP22752522.7

申请日：2022-01-17

申请人： FUJIFILM Corporation

发明人： YAMAGUCHI, Shuhei ,  MIYOSHI, Taro ,  YOSHIOKA, Tomoaki ,  FUKUZAKI, Eiji

IPC分类号： C08F212/08 ,  C08F220/18 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20

摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition with which LWR of a pattern to be formed can be reduced; a resist film; a pattern forming method; and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit (a), in which the repeating unit (a) is a repeating unit having an ionic group which generates an acid in a case where a leaving group is eliminated by irradiation with an actinic ray or a radiation, in which a repeating unit obtained by replacing the leaving group with a hydrogen atom has a molecular weight of 300 or less, and the repeating unit (a) is a predetermined amount or more with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.