公开(公告)号：EP3241075A4

公开(公告)日：2018-07-11

申请号：EP15876079

申请日：2015-12-28

申请人： FUJIFILM ELECTRONIC MAT USA INC

发明人： DU BING ,  DORY THOMAS ,  WOJTCZAK WILLIAM A

IPC分类号： G03F7/32 ,  C11D3/00 ,  C11D3/20 ,  C11D3/43 ,  G03F7/42

CPC分类号： C11D11/0047 ,  C11D3/0026 ,  C11D3/2006 ,  C11D3/28 ,  C11D3/30 ,  C11D3/43 ,  C11D7/261 ,  C11D7/3209 ,  C11D7/3281 ,  C11D7/5009 ,  C11D7/5013 ,  C11D7/5022 ,  G03F7/423 ,  G03F7/425 ,  G03F7/426 ,  H01L21/31133

摘要： This disclosure relates to photoresist stripping compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one alcohol solvent; 3) at least one quaternary ammonium hydroxide; 4) water; 5) at least one copper corrosion inhibitor selected from 6-substituted-2,4-diamino-1,3,5-triazines; and 6) optionally, at least one defoaming surfactant.

公开(公告)号：EP3077129A4

公开(公告)日：2017-10-04

申请号：EP14867771

申请日：2014-12-03

申请人： FUJIFILM ELECTRONIC MAT USA INC

发明人： TAKAHASHI TOMONORI ,  DU BING ,  WOJTCZAK WILLIAM A ,  DORY THOMAS ,  KNEER EMIL A

IPC分类号： H01L21/311 ,  C11D3/00 ,  C11D7/32 ,  C11D7/50 ,  C11D11/00 ,  H01L21/02

CPC分类号： C11D11/0047 ,  C11D3/0073 ,  C11D7/3218 ,  C11D7/3245 ,  C11D7/3281 ,  C11D7/5022 ,  H01L21/0206 ,  H01L21/02063 ,  H01L21/02068 ,  H01L21/02071 ,  H01L21/0273 ,  H01L21/31133

摘要： This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

摘要翻译： 本公开涉及一种清洁组合物，其包含1）至少一种氧化还原剂; 2）至少一种第一螯合剂，第一螯合剂是聚氨基多羧酸; 3）至少一种不同于第一螯合剂的第二螯合剂，第二螯合剂含有至少两个含氮基团; 4）至少一种金属腐蚀抑制剂，所述金属腐蚀抑制剂为取代或未取代的苯并三唑; 5）至少一种选自水溶性醇，水溶性酮，水溶性酯和水溶性醚的有机溶剂; 6）水; 和7）任选地，至少一种pH调节剂，该pH调节剂是不含金属离子的碱。 本公开还涉及使用上述组合物来清洁半导体衬底的方法。