摘要:
A rotary silicon wafer cleaning apparatus capable of enhancing the stability of silicon wafer through perfecting of the hydrogen termination for silicon wafer having undergone cleaning operation with the use of chemicals and pure water. The rotary silicon wafer cleaning apparatus comprises a silicon wafer drying equipment, the silicon wafer drying equipment composed of a mixed gas heating unit for heating a mixed gas consisting of a hydrogen gas, the hydrogen gas containing gaseous hydrogen in an amount of 0.05 vol.% or more, and an inert gas and a hydrogen radical generating unit provided with a platinum coating film capable of forming hydrogen radicals at portion in contact with the heated mixed gas, wherein a mixed gas containing hydrogen radicals generated by the hydrogen radical generating unit is jetted on a rotating silicon wafer after cleaning operation so that the drying and hydrogen termination treatment of the external surface of silicon wafer are simultaneously carried out.
摘要:
At the abutting end faces of coupling members (1, 2), annular recesses (3, 4) having annular protrusions (5, 6) on the bottom face are provided while surrounding fluid channels (1a, 2a). A gasket (10) comprises a seal part (11) interposed between the protrusions (5, 6) of the coupling members (1, 2) while having an outside diameter smaller than the diameter of the annular recesses (3, 4), and a guide part (12) disposed on the outside of the seal part (11) while having an outside diameter being fitted in the annular recesses (3, 4). When the coupling members (1, 2) are fastened properly, the end faces thereof abut each other. An annular groove (14) is made in the outer circumference of the seal part (11) and a snap ring (13) fitted in the annular groove (14) couples the seal part (11) and the guide part (12).
摘要:
A method for detecting abnormal flow rate by easily detecting an obstruction of an orifice while a fluid pressure flow rate controller using an orifice is controlling the flow rate. The method uses a flow rate controller (FCS) so as to calculate the flow rate Qc on the downstream side when the upstream-side pressure P1 is maintained at a value about twice or more the downstream-side pressure P2 from Qc=KP1 (K: constant) and to control the operation of a control valve (CV) according to a signal Qy representing the difference between the calculated flow rate Qc and a preset flow rate Qs. A testing circuit or flow rate setting circuit provided separately outputs a testing signal ΔQs having a testing amplitude V0 to the control valve (CV). The pressure amplitude V of a pressure variation ΔP1 of the upstream-side pressure P1 occurring in response to the opening/closing of the control valve (CV) is measured. When the pressure amplitude V decreases below a limit amplitude Vt, the obstruction of the orifice is announced, thus implementing the method. If the testing signal ΔQs is superimposed on a steady-state preset flow rate signal Qs0 and outputted together from the testing circuit or the flow rate setting circuit to the control valve (CV), an abnormal flow rate can be detected while controlling the flow rate by using the steady-state preset flow rate signal Qs0.
摘要:
Summary The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket S 5 having a cylinder-shaped vacuum thermal insulating pipe receiving part J on a side and with its upper face made open, and the square-shaped upper vacuum jackets S 4 , which is hermetically fitted to the lower vacuum jacket S 5 and with its lower face made open.
摘要:
It is an object of the present invention to provide at low costs a valve with an integral orifice for use in a gas feeding equipment provided with a pressure-type flow volume control device to be employed for manufacturing of semi-conductors and chemical goods. The valve with an integral orifice has the excellent flow rate control characteristics by improving the processing accuracy of the orifice and preventing the distortion of the orifice at the time of assembling. To realize the objects of the present invention, the main part of the valve with an integral orifice comprises a valve main body made of heat-resisting materials having a gas inflow passage in communication with a valve chamber with an upper open end and a gas outflow passage, a synthetic resin made valve seat body formed in the valve chamber and having a gas outflow passage in communication with the gas outflow passage of the aforementioned valve main body and a valve seat, an orifice disc made of heat-resisting materials removably installed in the gas outflow passage of the valve seat body, and an orifice formed in the orifice disc to reduce the gas outflow passage of the valve seat body; wherein the orifice is formed in the stainless steel made orifice disc in advance and the metal made orifice disc with the orifice formed by a separate processing and the synthetic resin made valve seat body are removably assembled, wherein the orifice disc and the synthetic resin made valve seat body are fixed airtight to the valve main body by pressing the valve seat body via the metal inner disc.
摘要:
Two coupling member 1, 2 are provided in respective butting end faces thereof with annular recessed portions 3, 4 surrounding respective fluid channels 1a, 2a thereof and having annular projections 5, 6 each formed in a bottom face of the recessed portion. A gasket 10 comprises a sealing portion 11 having an outside diameter smaller than the diameter of the recessed portions 3, 4 and positioned between the projections 5, 6 of the coupling members 1, 2, and a guide 12 having an outside diameter permitting the guide to be fitted into the recessed portions 3, 4 and positioned externally of the sealing portion 11. The butting end faces of the coupling members 1, 2 are movable into contact with each other when the coupling is tightened up properly. The sealing portion 11 has an annular groove 14 formed in an outer periphery thereof, and the sealing portion 11 and the guide 12 are connected together by a snap ring 13 fitted in the annular groove 14.
摘要:
A method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice - the pressure-type flow controller wherein with the upstream pressure P 1 maintained about two or more times higher than the downstream pressure P 2 , the downstream flow rate Q C is calculated by the equation Q C = KP 1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal Q Y between the calculated flow rate Q C and the set flow rate Q S . The method comprises, outputting a testing signal ΔQs having a testing amplitude Vo from a testing circuit provided separately or a flow rate setting circuit to the control valve CV, measuring the pressure amplitude V of the variable pressure ΔP1 of the pressure P1 on the upstream side of the orifice that arises in response to actuation of the control valve CV and setting off an alarm for the clogging of the orifice when the pressure amplitude V is smaller than a limit amplitude Vt. If the testing signal ΔQs is superimposed on a steady-state set flow rate signal Qso and outputted to control the valve CV from the testing circuit or the flow rate setting circuit, the flow rate can be checked for abnormalities while controlling the flow rate by the steady-state set flow rate signal Qso.
摘要:
A high precision flow rate control of a clustering fluid such as the HF gas and the like to be supplied to a vacuum chamber and the like is made possible in the flow rate range of 3∼300SCCM using a pressure type flow rate control device. Specifically, disclosed herein is a method of controlling the flow rate of the clustering fluid using a pressure type flow rate control device in which the flow rate Q of the gas passing through an orifice is computed as K=KP 1 (where K is a constant) with the gas being in a state where the ratio P 2 /P 1 between the gas pressure P 1 on the upstream side of the orifice and the gas pressure P 2 on the downstream side of the orifice is held at a value not higher than the critical pressure ratio of the gas wherein the association of molecules is dissociated either by heating the afore-mentioned pressure type flow rate control device to the temperature higher than 40°C, or by applying the diluting gas to the clustering fluid to make it lower than a partial pressure so that the clustering fluid is permitted to pass through the afore-mentioned orifice in a monomolecular state.
摘要:
A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrogen and oxygen are reacted to generate moisture without high temperature combustion is made of an alloy containing aluminum. A principally aluminum oxide (Al 2 O 3 )-composed barrier film is formed by applying an aluminum selective oxidation treatment on the inner wall surface of the moisture-generating reactor, and thereafter a platinum film is stacked on and stuck to the barrier film so that a platinum coating catalyst layer is formed.
摘要:
A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.