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1.发明授权Photosensitive resin composition and photosensitive element using the same 失效一种光敏树脂组合物和使用该组合物的感光元件。
公开(公告)号：EP0373952B1
公开(公告)日：1995-02-08
申请号：EP89313131.8
申请日：1989-12-15
发明人： Satoh, Kuniaki , Kojima, Yasunori , Tachiki, Shigeo , Kikuchi, Tohru , Ishimaru, Toshiaki , Hayashi, Nobuyuki , Kojima, Mitsumasa
CPC分类号： C08G77/54 , C08G69/42 , C08G73/1039 , C08G73/106 , G03F7/0387 , G03F7/0757
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公开(公告)号：EP0622682A1
公开(公告)日：1994-11-02
申请号：EP94302204.6
申请日：1994-03-28
发明人： Hagiwara, Hideo , Kaji, Makoto , Kojima, Yasunori
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/12
摘要： There is disclosed a positive type photosensitive resin composition which comprises an alkali-soluble polymer (A) having a carboxyl group and/or a phenolic hydroxyl group, and a compound (B) which forms an amine compound with irradiation of light.
摘要翻译： 公开了包含具有羧基和/或酚羟基的碱溶性聚合物（A）和通过照射形成胺化合物的化合物（B）的正型感光性树脂组合物。
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公开(公告)号：EP0622682B1
公开(公告)日：1998-03-04
申请号：EP94302204.6
申请日：1994-03-28
发明人： Hagiwara, Hideo , Kaji, Makoto , Kojima, Yasunori
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/12
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4.发明公开Photosensitive resin composition and photosensitive element using the same 失效一种光敏树脂组合物和使用该组合物的感光元件。
公开(公告)号：EP0373952A2
公开(公告)日：1990-06-20
申请号：EP89313131.8
申请日：1989-12-15
发明人： Satoh, Kuniaki , Kojima, Yasunori , Tachiki, Shigeo , Kikuchi, Tohru , Ishimaru, Toshiaki , Hayashi, Nobuyuki , Kojima, Mitsumasa
CPC分类号： C08G77/54 , C08G69/42 , C08G73/1039 , C08G73/106 , G03F7/0387 , G03F7/0757
摘要： A photosensitive resin composition comprising a photoinitiator and polymer containing a repeating unit of formula (I)
wherein R 1 is a tetravalent organic group, R 2 is a divalent organic group, either one or both of R 1 and R 2 contains at least one silicon atom and/or at least one fluorine atom, Y, is a monovalent group having an ethylenic unsaturated group; n is zero or 1, m is 1 or 2, and n + m = 2.摘要翻译： 一种光敏树脂组合物包括含有式（I）的重复单元worin R1的光引发剂和聚合物
是四价有机基团，R 2是二价有机基团，任一个或两个R1和R2含有至少一个硅原子 和/或至少一个氟原子，Y 1是具有烯属不饱和基的一价基团; n是零或1，m是1或2，且n + m = 2 -
5.发明公开
公开(公告)号：EP0373952A3
公开(公告)日：1990-10-03
申请号：EP89313131.8
申请日：1989-12-15
发明人： Satoh, Kuniaki , Kojima, Yasunori , Tachiki, Shigeo , Kikuchi, Tohru , Ishimaru, Toshiaki , Hayashi, Nobuyuki , Kojima, Mitsumasa
CPC分类号： C08G77/54 , C08G69/42 , C08G73/1039 , C08G73/106 , G03F7/0387 , G03F7/0757
摘要： A photosensitive resin composition comprising a photoinitiator and polymer containing a repeating unit of formula (I)
wherein R 1 is a tetravalent organic group, R 2 is a divalent organic group, either one or both of R 1 and R 2 contains at least one silicon atom and/or at least one fluorine atom, Y, is a monovalent group having an ethylenic unsaturated group; n is zero or 1, m is 1 or 2, and n + m = 2.
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