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    A black synthetic quartz glass with a transparent layer
    1.
    发明公开
    A black synthetic quartz glass with a transparent layer 审中-公开
    Schwarzes综合Quarzglas mit transparenter Schicht

    公开(公告)号：EP2048121A1

    公开(公告)日：2009-04-15

    申请号：EP08164123.5

    申请日：2008-09-11

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

    发明人： Sato, Tatsuhiro ,  Yoshida, Nobumasa

    IPC分类号： C03C3/06 ,  C03C23/00 ,  C03B19/14

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03C4/02 ,  C03C4/082 ,  C03C23/008 ,  C03C2201/02 ,  C03C2201/26 ,  C03C2203/54 ,  Y10T428/261

    摘要： To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.
    A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100°C and 1200°C and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heatingis carried out at a temperature between 1200°C and 2000°C to produce a compact glass body.

    摘要翻译： 为了提供在远红外区域具有高发射率的透明层的黑色合成石英玻璃，具有优异的遮光性，在金属杂质方面保持与合成石英玻璃相同的纯度，具有高温粘度 与天然石英玻璃相当的特性，可以进行焊接等高温处理，不会从表面释放碳; 以及其生产方法。 含有羟基的多孔二氧化硅玻璃体在100℃〜1200℃的温度下在挥发性有机硅化合物气氛中进行气相反应，反应开始后，达到真空度以上 在10mmHg（1343Pa）的温度下，在1200℃〜2000℃的温度下进行加热，得到紧凑的玻璃体。

    Method and device for manufacturing silica glass
    2.
    发明公开
    Method and device for manufacturing silica glass 审中-公开
    Verfahren und Vorrichtung zur Herstellung von Quarzglas

    公开(公告)号：EP2067751A1

    公开(公告)日：2009-06-10

    申请号：EP08019576.1

    申请日：2008-11-08

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

    发明人： Sato, Tatsuhiro ,  Yoshida, Nobumasa ,  Andou, Masaki

    IPC分类号： C03B19/01 ,  C03B19/09

    CPC分类号： C03B19/01 ,  C03B19/09

    摘要： The present invention refers to a method and device for manufacturing silica glass in which a silica glass powder is dropped from a powder supply device above a rotating furnace and layered in a centre portion of a furnace bottom, and then heat-fused and expanded in an outer circumferential direction of the furnace to form an ingot, the drop position and a fusion position of the silica glass powder is dispersed in the bottom portion of the furnace. The drop position of the silica glass powder is displaced from the centre portion of the bottom portion of the furnace, and the silica glass powder is preferably dispersed in the bottom portion of the furnace by the rotational movement of one or both of the powder supply device and the bottom portion of the furnace. The method and device for manufacturing silica glass facilitate the simple manufacture of a highly pure, bubble-free large flat-plate silica glass ingot in a short time.

    摘要翻译： 本发明涉及一种制造石英玻璃的方法和装置，其中将二氧化硅玻璃粉末从旋转炉上方的粉末供应装置滴下并层叠在炉底的中心部分，然后在 炉的外周方向形成铸块，石英玻璃粉末的下落位置和熔融位置分散在炉底部。 二氧化硅玻璃粉末的下落位置从炉底部的中心部分位移，石英玻璃粉末优选通过粉末供给装置中的一个或两个的旋转运动分散在炉底部 和炉底部分。 用于制造石英玻璃的方法和装置有助于在短时间内简单地制造高纯度，无气泡的大平板硅石玻璃锭。

    Opaque silica glass and the production process therefor
    6.
    发明公开
    Opaque silica glass and the production process therefor 失效
    Opakes Silikatglas und Verfahren zu dessen Herstellung

    公开(公告)号：EP0728709A1

    公开(公告)日：1996-08-28

    申请号：EP95102531.1

    申请日：1995-02-22

    申请人： Heraeus Quarzglas GmbH ,  SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

    发明人： Sato, Tatsuhiro ,  Fujinoki, Akira ,  Inaki, Kyoichi ,  Yoshida, Nobumasa ,  Yokota, Toru

    IPC分类号： C03C4/00 ,  C03C3/06 ,  C03C11/00 ,  C03B19/09

    CPC分类号： C03C3/06 ,  C03B19/09 ,  C03C11/00 ,  C03C2201/50 ,  C03C2201/80 ,  C03C2203/10

    摘要： Opaque silica glass having a density of 2.0 to 2.18 g/cm 3 , sodium and potassium elements concentrations in the silica glass of each 0.5 ppm or less and an OH group concentration of 30 ppm or less, and containing bubbles which are independent bubbles having the following physical values:

    (1) a bubble diameter of 300 µm or less, and
    (2) a bubble density of 100,000 to 1,000,000 bubbles/cm 3 , and
       a production process for opaque silica glass, comprising: filling quartz raw material grain having a particle size of 10 to 350 µm in a heat resistant mold,
       heating it in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50 to 150°C than a temperature at which the above raw material grain is melted at a temperature-raising speed not exceeding 50°C/minute, then, slowly heating it up to a temperature higher by 10 to 80°C than the temperature at which the quartz raw material grain is melted at the speed of 10°C/minute or less, and
       cooling after maintaining at the above temperature.

    摘要翻译： 密度为2.0〜2.18g / cm 3的不透明二氧化硅玻璃，二氧化硅玻璃中的钠和钾元素浓度为0.5ppm以下，OH基浓度为30ppm以下，并且含有独立气泡的气泡 具有以下物理值：（1）气泡直径为300μm以下，（2）泡孔密度为100,000〜1,000,000个气泡/ cm 3，以及不透明石英玻璃的制造方法，其特征在于，包括： 在耐热模具中具有10〜350μm的粒径的原料颗粒，在非氧化性气氛中从室温加热到比上述原料的温度低50〜150℃的温度 材料颗粒以不超过50℃/分钟的升温速度熔化，然后缓慢加热至比石英原料颗粒熔化温度高10至80℃的温度，速度为 10℃/分钟以下，mai后冷却 在上述温度下保持。