公开(公告)号：EP3027570A1

公开(公告)日：2016-06-08

申请号：EP14745102

申请日：2014-07-24

申请人： ZEISS CARL SMT GMBH

发明人： EVA ERIC

IPC分类号： C03C3/06 ,  C03C4/00 ,  G02B1/02

CPC分类号： C03B19/066 ,  C03B19/09 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G02B13/16 ,  G03F7/70958

摘要： The invention relates to a method for loading a blank made of quartz glass with hydrogen, wherein the loading comprises two steps. In the first step, the blank is loaded at a first temperature (T
1 ) and a first hydrogen partial pressure (p
1 ), and in the second step the blank is loaded at a second temperature (T
2 ) that is different from the first temperature, and a second hydrogen partial pressure (p
2 ) that is different from the first hydrogen partial pressure, wherein the first and the second temperature (Τ
1 , T
2 ) is lower than a threshold temperature (T
L ), at which a thermal formation of silane in the quartz glass of the blank sets in. The invention further relates to a lens element produced from such a blank, and to a projection object lens having at least one such lens element.

公开(公告)号：EP2431338A4

公开(公告)日：2016-04-20

申请号：EP10769441

申请日：2010-03-23

申请人： SHINETSU QUARTZ PROD ,  HERAEUS QUARZGLAS

发明人： YAMAGATA SHIGERU ,  USUI TOMOMI

IPC分类号： C03B19/09 ,  C30B15/10 ,  C30B29/06 ,  C30B35/00

CPC分类号： C03B19/09 ,  C03B19/095 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y02P40/57 ,  Y10T428/13 ,  Y10T428/131 ,  Y10T428/1317

摘要： The present invention provides a method for producing a silica container, wherein the method comprises: a step of forming a powder mixture by adding an Al compound or a crystal nucleating agent into a first powdered raw material (silica particles), a step of preliminarily molding to an intended shape by feeding the powder mixture to an inner wall of an outer frame while rotating the outer frame having aspiration holes, a step of forming a silica substrate, wherein the preliminarily molded article is degassed by aspiration from a peripheral side and at the same time heated from inside the preliminarily molded article at high temperature thereby making a peripheral part of the preliminarily molded article to a sintered body while an inner part to a fused glass body, and a step of forming a transparent silica glass layer on an inner surface of the silica substrate, wherein a second powdered raw material having a higher silica purity than the first powdered raw material is spread from inside the silica substrate and at the same time heated from the inside at high temperature. Accordingly, a method for producing a silica container with a high dimensional precision, a high durability, and suppressed gas release, and with a reduced energy consumption and a low production cost, by using a cheap and relatively low grade powdered silica as a main raw material, is provided.

公开(公告)号：EP2756237A1

公开(公告)日：2014-07-23

申请号：EP12761719.9

申请日：2012-09-13

申请人： Heraeus Quarzglas GmbH & Co. KG

发明人： BECKER, Klaus ,  HOFMANN, Achim ,  HÜNERMANN, Michael ,  SCHENK, Christian

IPC分类号： F24J2/07 ,  F24J2/50 ,  C03B20/00 ,  C30B15/10

CPC分类号： F24S10/40 ,  C03B19/09 ,  C03B19/095 ,  C03B29/02 ,  C03B2201/02 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/08 ,  F24S20/20 ,  F24S80/52 ,  F24S2080/503 ,  Y02E10/41

摘要： Common solar radiation receivers are equipped with a chamber for transmission of an operating gas which is directed along to an absorber for solar radiation for thermal absorption. The absorber has a dome-shaped entry window made of quartz glass, wherein the inner side facing the absorber assumes a nominal interior temperature Ti of at least 950°C during proper use, preferably at least 1000°C, whereas the outer side facing away from the absorber is exposed to the environment and subject to risk of devitrification. The invention relates to modifying the known solar radiation receiver so that a high absorber temperature can be set and thus a high efficiency of the solar thermal heating is enabled, without increasing the risk of devitrification in the region of the outer side of the entry window.

公开(公告)号：EP2133624B1

公开(公告)日：2014-04-16

申请号：EP09162569.9

申请日：2009-06-12

申请人： Shenzhen Tronsin Illuminating Technique Ltd.

发明人： Chen, Haisheng ,  Jiang, Naiqun ,  Zhang, Chunping ,  Liao, Hui

IPC分类号： F21V1/26 ,  F21V1/20 ,  B32B5/08 ,  B32B17/00 ,  C03B19/09 ,  C03B23/20

CPC分类号： F21V1/26 ,  C03B19/09 ,  C03B23/20 ,  F21V1/20

公开(公告)号：EP2486173A2

公开(公告)日：2012-08-15

申请号：EP10822197.9

申请日：2010-09-28

申请人： LG Siltron Inc.

发明人： CHOI, Il-Soo ,  MOON, Ji-Hun ,  KIM, Bong-Woo ,  KIM, Do-Yeon

IPC分类号： C30B15/10 ,  C03B19/09

CPC分类号： C03B19/09 ,  C03B2201/24 ,  C30B15/10 ,  C30B35/002 ,  Y02P40/57 ,  Y10T117/1032

摘要： Provided are a quartz crucible and a method of manufacturing the quartz crucible. The quartz crucible is used in a single crystal growth apparatus. The quartz crucible comprises an inner layer including silica, and an outer layer including silica disposed outside the inner layer to surround the inner layer, wherein a nitrogen is added in the silica of the outer layer.

摘要翻译： 提供石英坩埚和制造石英坩埚的方法。 石英坩埚用于单晶生长装置。 石英坩埚包括内层，包括二氧化硅，外层包括设置在内层外侧的二氧化硅，以包围内层，其中在外层的二氧化硅中加入氮。

公开(公告)号：EP2484813A1

公开(公告)日：2012-08-08

申请号：EP10815255.4

申请日：2010-08-20

申请人： Japan Super Quartz Corporation

发明人： YOSHIOKA Takuma ,  KISHI Hiroshi ,  FUJITA Takeshi ,  KANDA Minoru ,  SUZUKI Koichi ,  KITAHARA Ken ,  Sudo Toshiaki

IPC分类号： C30B29/06 ,  C03B20/00 ,  C30B15/10

CPC分类号： C04B41/5022 ,  C03B5/025 ,  C03B19/02 ,  C03B19/09 ,  C03B19/095 ,  C03C17/004 ,  C03C17/02 ,  C03C2217/213 ,  C03C2218/13 ,  C03C2218/17 ,  C04B35/185 ,  C04B41/009 ,  C04B41/86 ,  C04B2235/6027 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y02P40/57 ,  Y10T117/1032 ,  C04B41/4527

摘要： The purpose of the present invention is to provide a crucible which has high viscosity at high temperature, and can be used for a long time, and can be manufactured at low cost, and a method of manufacturing the same. The composite crucible 10 is characterized in the use of mullite (3A1 2 O 3 •2SiO 2 ) as the basic material of the crucible. The composite crucible 10 has the crucible body 11 made of mullite material whose main component is alumina and silica, and a transparent vitreous silica layer 12 formed on the inner surface of the crucible body 11. The thickness of the transparent vitreous silica layer 12 is smaller than that of the crucible body 11. The crucible body 11 can be formed by the slip casting method, and the transparent vitreous silica layer 12 can be formed by the thermal spraying method.

摘要翻译： 本发明的目的是提供一种在高温下具有高粘度的坩埚，并且可以长时间使用并且可以以低成本制造的坩埚及其制造方法。 复合坩埚10的特征在于使用莫来石（3A1 2 O 3€2SiO 2）作为坩埚的基本材料。 复合坩埚10具有由主成分为氧化铝和二氧化硅的莫来石材料制成的坩埚体11和形成在坩埚体11的内表面上的透明氧化硅玻璃层12.透明玻璃状石英层12的厚度较小 坩埚体11可以通过流延法形成，透明玻璃状二氧化硅层12可以通过热喷涂法形成。

公开(公告)号：EP1868951B1

公开(公告)日：2011-03-30

申请号：EP06743228.6

申请日：2006-03-30

申请人： Heraeus Quarzglas GmbH & Co. KG

发明人： KUEHN, Bodo ,  POGGE, Tobias ,  TROMMER, Martin ,  WEBER, Jürgen ,  KIRST, Ulrich ,  WERDECKER, Waltraud

IPC分类号： C03C3/06 ,  C03B19/14 ,  H01L21/00

CPC分类号： C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

摘要： An ideal quartz glass for a wafer holder for application in an etching environment is characterised both by high purity and also a high dry etching resistance. According to the invention, such a quartz glass may be achieved, whereby the quartz glass is doped with nitrogen, at least in a region near the surface, has an average content of metastable hydroxy groups of less than 30 wt. ppm, the fictive temperature is less than 1250 °C and the viscosity at a temperature of 1200 °C is at least 1013 dPas. A commercial method for production of such a quartz glass comprises the following method steps: fusion of a SiO2 raw material to give a quartz glass blank, whereby the SiO2 raw material or the quartz glass blank is subjected to a dehydration process, heating of the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050 °C and 1850 °C under an atmosphere containing ammonia, a temperature treatment, by means of which the quartz glass of the quartz glass blank is brought to a fictive temperature of 1250 °C or less and a surface treatment of the quartz glass blank to give the quartz glass holder.

公开(公告)号：EP1160209B1

公开(公告)日：2007-07-18

申请号：EP01113080.4

申请日：2001-05-29

申请人： Tosoh Quartz Corporation

发明人： Gotoh, Yoshihiko ,  Satoh, Shinichi ,  Kudoh, Masakazu

IPC分类号： C03B19/01 ,  C03B19/09 ,  C03B19/14 ,  C03B17/04 ,  C03B17/06

CPC分类号： F23D14/32 ,  C03B17/04 ,  C03B17/06 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1407 ,  C03B19/1423 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/42 ,  C03B2207/54 ,  F23C2900/9901 ,  F23D14/22

公开(公告)号：EP1411032A1

公开(公告)日：2004-04-21

申请号：EP02747689.4

申请日：2002-07-18

申请人： MITSUBISHI CHEMICAL CORPORATION

发明人： KATSURO, Yoshio, c/o Mitsubishi Chemical Corp. ,  YAMAHARA, Keiji, c/o Mitsubishi Chemical Corp. ,  YAMAGUCHI, Takashi, c/o Mitsubishi Chemical Corp. ,  MORI, Yutaka, c/o Mitsubishi Chemical Corporation

IPC分类号： C01B33/18 ,  C03B20/00 ,  C03B8/02

CPC分类号： C03C1/006 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B19/1095 ,  C03B2201/03 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/26

摘要： Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion.
The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1, 700°C, generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO 2 is 30 nl/g or smaller.

摘要翻译： 石英粉，优选通过溶胶 - 凝胶法制备的合成石英粉，当从室温加热至1700℃时，产生含有300纳升/克或更低的纳米/ g或更小; 制备石英粉的方法和通过熔化石英粉末并形成所得熔融石英制备的成形玻璃制品。 石英粉具有非常高的纯度和质量，并且形成的玻璃制品含有极少量的泡沫。

公开(公告)号：EP1148035A3

公开(公告)日：2003-12-10

申请号：EP01108924.0

申请日：2001-04-10

申请人： Heraeus Quarzglas GmbH & Co. KG

发明人： Gertig, Udo ,  Werdecker, Waltraud ,  Leist, Johann ,  Leber, Helmut

IPC分类号： C03B19/09 ,  C03B23/047 ,  C03C3/06 ,  C03C11/00

CPC分类号： C03C3/06 ,  C03B19/09 ,  C03B19/095 ,  C03B23/047 ,  C03B23/0496 ,  C03C11/00 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2201/80 ,  C03C2204/06 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/139 ,  Y10T428/1393

摘要： Die Erfindung betrifft ein Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas und ein nach dem Verfahren hergestelltes Quarzglasrohr. Um die kostengünstige Herstellung von Bauteilen, insbesondere von dünnwandigen Rohren oder Rohrteilen aus opakem Quarzglas hoher chemischer Reinheit und hoher Maßhaltigkeit zu ermöglichen wird erfindungsgemäß vorgeschlagen, ein Ausgangsmaterials bereitzustellen in Form eines Granulats aus synthetischem, hochreinem SiO 2 , das aus mindestens teilweise porösen Agglomeraten von SiO 2 -Primärteilchen gebildet ist und das eine Stampfdichte von mindestens 0,8 g/cm 3 aufweist, das Granulats in eine Form einzubringen und zu einer Vorform aus opakem Quarzglas zu erschmelzen und die Vorform in einem Heißumformprozess unter Bildung des Bauteils aus opakem Quarzglas umzuformen. Ein nach dem Verfahren hergestelltes Quarzglasrohr, das insbesondere zur Verwendung bei der Halbleiterfabrikation geeignet ist, zeichnet sich dadurch aus, dass es aus Quarzglas besteht, das aus einem Granulat aus synthetischem SiO 2 mit einem Lithium-Gehalt von maximal 100 Gew.-ppb hergestellt ist, und dass es eine Wandstärke im Bereich von 0,5 bis 15 mm aufweist.