Light absorption layer
    1.
    发明公开
    Light absorption layer 审中-公开
    Lichtabsorptionsschicht

    公开(公告)号:EP2487722A1

    公开(公告)日:2012-08-15

    申请号:EP11151435.2

    申请日:2011-01-19

    申请人: Hitachi, Ltd.

    摘要: A method of fabricating a light absorption layer of a photovoltaic cell is disclosed. The method comprises depositing an alloy precursor on a base, the alloy precursor including a Group IB element, for example copper, a first Group IIIB element, for example indium, and a second Group IIIB element, for example gallium, annealing the alloy precursor so as to form an alloy and agitating the alloy precursor or alloy ultrasonically during and/or after annealing. The method may comprise zone annealing the alloy precursor.

    摘要翻译: 公开了一种制造光伏电池的光吸收层的方法。 该方法包括在基底上沉积合金前体,合金前体包括IB族元素,例如铜,第一IIIB族元素,例如铟,和第二IIIB族元素,例如镓,使合金前体退火 以形成合金并在退火过程中和/或之后超声波搅拌合金前体或合金。 该方法可以包括对合金前体进行区域退火。

    QUANTUM LEAKAGE
    2.
    发明公开
    QUANTUM LEAKAGE 审中-公开
    量子泄漏

    公开(公告)号:EP3264339A1

    公开(公告)日:2018-01-03

    申请号:EP16176751.2

    申请日:2016-06-28

    申请人: Hitachi, Ltd.

    IPC分类号: G06N99/00

    CPC分类号: G06N99/002

    摘要: A method of reducing quantum leakage in a qubit device is disclosed. The method comprises receiving a set of energy level values for a multi-level system which includes first and second working levels |o>, |1> which provide a qubit and at least one other level |2> and performing an iteration at least once. the iteration comprising determining quantum leakage from at least one of the first and second working levels to the at least one non-working level for a quantum operation A comprising at least one pulse wherein each pulse has a respective pulse duration, determining whether the quantum leakage is greater than or equal to a threshold value; and, in dependence on the quantum leakage being greater than or equal to the threshold value, changing the duration of at least one of the at least one pulse.

    摘要翻译: 公开了一种减小量子位器件中的量子泄漏的方法。 该方法包括:接收用于多级系统的一组能级值,该多级系统包括提供量子位和至少一个其他级| 2>的第一和第二工作级| o>,并且执行至少一次迭代 。 所述迭代包括确定量子操作A从第一和第二工作电平中的至少一个到至少一个非工作电平的量子泄漏,量子操作A包括至少一个脉冲,其中每个脉冲具有相应的脉冲持续时间,确定量子泄漏 大于或等于阈值; 并且根据量子泄漏大于或等于阈值,改变至少一个脉冲中的至少一个的持续时间。

    Magnetic field sensor
    3.
    发明公开
    Magnetic field sensor 有权
    磁场传感器

    公开(公告)号:EP2703831A1

    公开(公告)日:2014-03-05

    申请号:EP12182528.5

    申请日:2012-08-31

    申请人: Hitachi Ltd.

    IPC分类号: G01R33/09 G01R33/10 G01R33/00

    摘要: A magnetic field sensor comprises a substrate (13), an array (3) of magnetic field sensing elements (4) supported on the substrate, each magnetic field sensing element capable of measuring a minimum measurable magnetic field at a given frequency and means (5, 7) for processing signals from the magnetic field sensing elements to produce an output signal such that the magnetic field sensor is capable of measuring a magnetic field at the given frequency which is lower than the minimum measurable magnetic field for an element.

    摘要翻译: 一种磁场传感器包括衬底(13),支撑在衬底上的磁场感测元件(4)的阵列(3),每个磁场感测元件能够测量给定频率下的最小可测量磁场,以及装置 ,7),用于处理来自磁场感测元件的信号以产生输出信号,使得磁场传感器能够测量低于元件的最小可测量磁场的给定频率处的磁场。

    Multiple quantum well structure
    4.
    发明公开
    Multiple quantum well structure 审中-公开
    Mehrfach-Quantentopfstruktur

    公开(公告)号:EP2595193A1

    公开(公告)日:2013-05-22

    申请号:EP11189350.9

    申请日:2011-11-16

    申请人: Hitachi, Ltd.

    IPC分类号: H01L29/15 H01L31/0352

    摘要: A multiple quantum well structure (1) comprises a multiple layer structure comprising alternating well and barrier layers (3, 4) comprising first and second materials respectively stacked in a first direction (z). Each barrier layer has a plurality of holes (6) filled with a third material so to form a plurality of respective bridge regions (9) which connect adjacent well layers. The bridge regions have dimensions of no more than 50 nm in directions (x, y) perpendicular to the first direction.

    摘要翻译: 多量子阱结构(1)包括多层结构,其包括交替阱和包含沿第一方向(z)分别堆叠的第一和第二材料的阻挡层(3,4)。 每个阻挡层具有填充有第三材料的多个孔(6),以形成连接相邻阱层的多个相应的桥接区域(9)。 桥接区域垂直于第一方向的方向(x,y)具有不超过50nm的尺寸。

    Qubit device
    7.
    发明公开
    Qubit device 审中-公开
    量子位Vorrichtung

    公开(公告)号:EP2264653A1

    公开(公告)日:2010-12-22

    申请号:EP09163305.7

    申请日:2009-06-19

    申请人: Hitachi Ltd.

    IPC分类号: G06N99/00

    CPC分类号: G06N99/002 B82Y10/00

    摘要: A qubit device comprises at least one charge qubit (4, 5) including a qubit in a given state and gating means (6 1 , 6 2 , 7 1 , 7 2 , 8 1 , 8 2 , 9 1 , 9 2 ) for applying a pulse to the qubit for transforming the given state into a new state, wherein the gating means is configured to apply a pulse having zero or substantially zero electric potential gradient to at least part of the qubit.

    摘要翻译: 量子位设备包括至少一个在给定状态下包括量子位的电荷量子位(4,5),以及门控装置(6 1,6 2,7 1,7 2,8 1,8 2,9 1,9 2),用于 向所述量子位施加脉冲以将所述给定状态转换为新状态,其中所述选通装置被配置为向所述量子位的至少部分施加具有零或基本为零的电势梯度的脉冲。

    Nanoparticle material
    8.
    发明公开
    Nanoparticle material 审中-公开
    Nanopartikelmaterial

    公开(公告)号:EP2187445A1

    公开(公告)日:2010-05-19

    申请号:EP08169054.7

    申请日:2008-11-13

    申请人: Hitachi, Ltd.

    摘要: A material comprises an array of nanoparticles comprising a first semiconducting material and nanoparticles comprising a second, different semiconducting material. The nanoparticles form a heterostructure. The nanoparticles have dimensions and the materials yield band offsets such that the material exhibits a localised state which is higher in energy than a delocalised state.

    摘要翻译: 材料包括包含第一半导体材料的纳米颗粒阵列和包含第二不同半导体材料的纳米颗粒。 纳米颗粒形成异质结构。 纳米颗粒具有尺寸,并且材料产生带偏移,使得材料表现出比离域状态更高的能量的局部状态。