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1.发明公开LOW RESISTANCE AND INDUCTANCE BACKSIDE THROUGH VIAS AND METHODS OF FABRICATING SAME 审中-公开返回通路生产低电阻和低电感和过程
公开(公告)号：EP1979932A4
公开(公告)日：2012-03-14
申请号：EP07710130
申请日：2007-01-15
Applicant: IBM
Inventor： ERTURK METE , GROVES ROBERT A , JOHNSON JEFFREY B , JOSEPH ALVIN J , LIU QIZHI , SPROGIS EDMUND J , STAMPER ANTHONY K
IPC: H01L21/77 , H01L21/302 , H01L21/306 , H01L21/768 , H01L23/48
CPC classification number: H01L21/76898 , H01L23/481 , H01L2924/0002 , H01L2924/00
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