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1.
公开(公告)号:EP2168163A4
公开(公告)日:2012-08-01
申请号:EP08771894
申请日:2008-06-25
Applicant: IBM
Inventor: ESHUN EBENEZER E , JOHNSON JEFFREY B , PHELPS RICHARD A , RASSEL ROBERT M , ZIERAK MICHAEL L
IPC: H01L29/808 , H01L21/337 , H01L29/36
CPC classification number: H01L29/808 , H01L27/0617 , H01L27/098 , H01L29/36 , H01L29/66901
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2.LOW RESISTANCE AND INDUCTANCE BACKSIDE THROUGH VIAS AND METHODS OF FABRICATING SAME 审中-公开
Title translation: 返回通路生产低电阻和低电感和过程公开(公告)号:EP1979932A4
公开(公告)日:2012-03-14
申请号:EP07710130
申请日:2007-01-15
Applicant: IBM
Inventor: ERTURK METE , GROVES ROBERT A , JOHNSON JEFFREY B , JOSEPH ALVIN J , LIU QIZHI , SPROGIS EDMUND J , STAMPER ANTHONY K
IPC: H01L21/77 , H01L21/302 , H01L21/306 , H01L21/768 , H01L23/48
CPC classification number: H01L21/76898 , H01L23/481 , H01L2924/0002 , H01L2924/00
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3.METHOD FOR FORMING A ONE MASK HYPERABRUPT JUNCTION VARACTOR USING A COMPENSATED CATHODE CONTACT 有权
Title translation: 法形成EINMASKEN-超突变-ÜBERGANGSVARAKTOR与补偿的阴极接触的公开(公告)号:EP1839340A4
公开(公告)日:2009-09-09
申请号:EP05855611
申请日:2005-12-22
Applicant: IBM
Inventor: COOLBAUGH DOUGLAS D , FURKAY STEPHEN S , JOHNSON JEFFREY B , RASSEL ROBERT M
CPC classification number: H01L29/93
Abstract: A semiconductor structure comprising a hyperabrupt junction varactor with a compensated cathode contact as well as a method of fabricating the same are disclosed. The method includes a single implant mask which is used in forming the subcollector/cathode, collector/well and hyperabrupt junction.
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