专利检索 ap:("IBM") AND inv:"KWONG RANEE WAI-LING" 第 1 页

1.

发明公开
WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF 审中-公开
标题翻译： NASS可显影底部抗反射涂层组合物及其使用方法

公开(公告)号：EP2013659A4

公开(公告)日：2011-12-07

申请号：EP07760816

申请日：2007-04-18

申请人： IBM

发明人： CHEN KUANG-JUNG , KHOJASTEH MAHMOUD , KWONG RANEE WAI-LING , LAWSON MARGARET C , LI WENJIE , PATEL KAUSHAL S , VARANASI PUSHKARA R

IPC分类号： G03F7/09 , C08F220/28

CPC分类号： G03F7/091 , C08F220/28 , C08F222/40 , C08F232/08 , Y10S430/151

2.

发明公开
CHEMICALLY AMPLIFIED PHOTORESIST 失效
标题翻译： CHEMISCH AMPLIFIZIERTER PHOTOLACK

公开(公告)号：EP0698230A4

公开(公告)日：1995-10-24

申请号：EP94900495

申请日：1993-10-29

申请人： IBM

发明人： BRUNSVOLD WILLIAM ROSS , BREYTA GREGORY , DIPIETRO RICHARD ANTHONY , ITO HIROSHI , KNORS CHRISTOPHER JOHN , KWONG RANEE WAI-LING , MIURA STEVE SEIICHI , MONTGOMERY MELVIN WARREN , MOREAU WAYNE MARTIN , SACHDEV HARBANS SINGH , WELSH KEVIN MICHAEL

IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C5/16 , G03F7/029

CPC分类号： G03F7/039

摘要： Resists for use in ultraviolet, electron beam and x-ray exposure devices comprising a polymeric or molecular composition the solubility of which is dependent upon the presence of acid removable protecting groups and a sulfonic acid precursor which generates a strong acid upon exposure to such radiation. The preferred sulfonic acid precursors are triflate esters or benzenesulfonyloxy esters of N-hydroxyimides.