公开(公告)号：EP1546813A4

公开(公告)日：2006-08-30

申请号：EP03815294

申请日：2003-09-11

Applicant: IBM

Inventor： KHOJASTEH MAHMOUD M ,  WONG RANEE W ,  CHEN KUANG-JUNG ,  VARANASI PUSHKARA RAO ,  ALLEN ROBERT D ,  BROCK PHILLIP ,  HOULE FRANCES ,  SOORIYAKUMARAN RATNAM

IPC: G03F7/38 ,  G03F7/039 ,  G03F7/075 ,  G03F7/09

CPC classification number: G03F7/094 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

Abstract: The silicon-containing resist compositions which have low silicon outgassing and high resolution lithographic performance, especially in bilayer or multilayer lithographic applications using 193 nm or shorter wavelength imaging radiation are enabled by the presence of an imaging polymer having silicon-containing, non-acid-labile pendant groups. The resist compositions of the invention are preferably further characterized by the substantial absence of silicon-containing acid-labile moieties.

公开(公告)号：EP2742385A4

公开(公告)日：2014-06-18

申请号：EP12822200

申请日：2012-08-10

Applicant: IBM

Inventor： CHEN KUANG-JUNG ,  HOLMES STEVEN J ,  HUANG WU-SONG ,  LIU SEN

IPC: G03F7/004 ,  C09D133/04 ,  C09J133/14 ,  G03F7/038 ,  G03F7/039 ,  G03F7/09 ,  G03F7/095

CPC classification number: G03F7/0382 ,  C09J133/14 ,  G03F7/091 ,  G03F7/094 ,  G03F7/095

公开(公告)号：EP2212905A4

公开(公告)日：2012-03-07

申请号：EP08852871

申请日：2008-11-11

Applicant: IBM

Inventor： HUANG WU-SONG ,  CHEN KUANG-JUNG ,  VARANASI PUSHKARA RAO ,  LI WAI-KIN

IPC: G03F7/00 ,  G03F7/039 ,  G03F7/40 ,  H01L21/00

CPC classification number: G03F7/0048 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/40

公开(公告)号：EP2013659A4

公开(公告)日：2011-12-07

申请号：EP07760816

申请日：2007-04-18

Applicant: IBM

Inventor： CHEN KUANG-JUNG ,  KHOJASTEH MAHMOUD ,  KWONG RANEE WAI-LING ,  LAWSON MARGARET C ,  LI WENJIE ,  PATEL KAUSHAL S ,  VARANASI PUSHKARA R

IPC: G03F7/09 ,  C08F220/28

CPC classification number: G03F7/091 ,  C08F220/28 ,  C08F222/40 ,  C08F232/08 ,  Y10S430/151