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1.发明公开PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS 审中-公开PHOTO涂料组合并与MULTI-LAYER PHOTO涂料系统多重曝光方法
公开(公告)号：EP2212905A4
公开(公告)日：2012-03-07
申请号：EP08852871
申请日：2008-11-11
Applicant: IBM
Inventor： HUANG WU-SONG , CHEN KUANG-JUNG , VARANASI PUSHKARA RAO , LI WAI-KIN
CPC classification number: G03F7/0048 , G03F7/0035 , G03F7/0397 , G03F7/40
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2.发明公开
公开(公告)号：EP2089909A4
公开(公告)日：2009-12-23
申请号：EP07844145
申请日：2007-10-11
Applicant: IBM
Inventor： LI WAI-KIN , YANG HAINING
IPC: H01L21/28 , H01L21/336 , H01L29/423 , H01L29/49 , H01L29/78
CPC classification number: H01L29/42316 , H01L21/28097 , H01L21/28518 , H01L29/4975 , H01L29/66545 , H01L29/6656 , H01L29/78 , Y10S977/892
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