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公开(公告)号：EP1495365A4
公开(公告)日：2009-06-03
申请号：EP03723925
申请日：2003-04-01
申请人： IBM
发明人： PFEIFFER DIRK , ANGELOPOULOS MARIE , BABICH KATHERINA , BROCK PHILLIP , HUANG WU-SONG , MAHOROWALA ARPAN P , MEDEIROS DAVID R , SOORIYAKUMARAN RATNAM
IPC分类号： G03F7/11 , G03F7/004 , G03F7/038 , G03F7/075 , G03F7/09 , H01L21/027 , G03F7/00 , G03F7/26 , H01L21/312
CPC分类号： H01L21/0276 , G03F7/0045 , G03F7/0757 , G03F7/091 , Y10S430/151
摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantagously useful with shorter wavelenght lithographic processes and/or have minimal residual acid content.
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2.发明公开USE OF MIXED BASES TO ENHANCE PATTERNED RESIST PROFILES ON CHROME OR SENSITIVE SUBSTRATES 审中-公开- 混合基地改善抵制铬或敏感基材结构性PROFILES
公开(公告)号：EP1716450A4
公开(公告)日：2007-06-27
申请号：EP04710274
申请日：2004-02-11
申请人： IBM
CPC分类号： G03F7/0045 , G03F1/78 , G03F7/0392 , G03F7/40 , Y10S430/143
摘要： Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.
摘要翻译： 抗蚀剂甚至在困难的基板良好的基础性质的组合物通过使用包括室温下为固体的基础上，和液体低蒸气压碱碱添加剂的组合获得。 该组合物的爱在金属衬底上是特别有用的：如在掩模制造常用的含铬层。
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3.发明公开HIGH SENSITIVITY RESIST COMPOSITIONS FOR ELECTRON-BASED LITHOGRAPHY 有权E E E EN E E E E E E E E E E E
公开(公告)号：EP1586005A4
公开(公告)日：2009-05-13
申请号：EP02786917
申请日：2002-12-05
申请人： IBM
发明人： HUANG WU-SONG , LI WENJIE , MOREAU WAYNE , MEDEIROS DAVID E , PETRILLO KAREN E , LANG ROTBERT N , ANGELOPOULOS MARIE
CPC分类号： G03F7/0045 , G03F7/0392
摘要： The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the group consisting of dissolution-inhibiting acid generators, and (ii) a second radiation sensitive acid generator selected from the group consisting of unprotected acidic group-functionalized acid generators and acid labile group-protected acidic group-functionalized radiation sensitive acid generators; enables formation of high sensitivity resists suitable for use in EPL, EUV, soft x-ray, and other low energy intensity lithographic imaging applications. The resist compositions may be useful in other lithographic processes as well.
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公开(公告)号：EP1521797A4
公开(公告)日：2006-12-20
申请号：EP02765835
申请日：2002-07-11
申请人： IBM
发明人： ANGELOPOULOS MARIE , ARIRAM ARI , GUARNIERI C RICHARD , HUANG WU-SONG , KWONG RANEE , MOREAU WAYNE M
IPC分类号： C08G77/04 , C08K5/00 , B05D5/00 , B32B9/04 , C08G77/14 , C08G77/38 , C08J7/18 , C08K5/34 , C08K5/42 , C08L83/04 , C08L83/06 , G03C1/76 , G03F7/075 , G03F7/09 , H01L21/312 , H01L21/3213
CPC分类号： G03F7/091 , C08G77/04 , C08G77/38 , C08K5/3445 , C08K5/42 , C08L83/04 , C08L83/06 , C09D183/04 , G03F7/0752 , C08L2666/28 , C08L2666/36
摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
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5.发明公开
公开(公告)号：EP2742385A4
公开(公告)日：2014-06-18
申请号：EP12822200
申请日：2012-08-10
申请人： IBM
发明人： CHEN KUANG-JUNG , HOLMES STEVEN J , HUANG WU-SONG , LIU SEN
IPC分类号： G03F7/004 , C09D133/04 , C09J133/14 , G03F7/038 , G03F7/039 , G03F7/09 , G03F7/095
CPC分类号： G03F7/0382 , C09J133/14 , G03F7/091 , G03F7/094 , G03F7/095
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6.发明公开PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS 审中-公开PHOTO涂料组合并与MULTI-LAYER PHOTO涂料系统多重曝光方法
公开(公告)号：EP2212905A4
公开(公告)日：2012-03-07
申请号：EP08852871
申请日：2008-11-11
申请人： IBM
CPC分类号： G03F7/0048 , G03F7/0035 , G03F7/0397 , G03F7/40
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公开(公告)号：EP1820061A4
公开(公告)日：2010-09-22
申请号：EP05825085
申请日：2005-11-03
申请人： IBM
发明人： HUANG WU-SONG , BURNS SEAN , VARANASI PUSHKARA RAO
CPC分类号： G03F7/091 , G03F7/0046 , G03F7/0752 , G03F7/2041
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8.发明公开SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME 有权自身建设的反射涂料组合物抗性照片插图MIXES和程序
公开(公告)号：EP2389359A4
公开(公告)日：2012-06-13
申请号：EP10756762
申请日：2010-03-24
申请人： IBM
IPC分类号： C07C409/22 , G03C1/00
CPC分类号： C08F212/34 , C08F212/32 , C08F220/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/091
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9.发明公开LOW REFRACTIVE INDEX POLYMERS AS UNDERLAYERS FOR SILICON-CONTAINING PHOTORESISTS 审中-公开具有低折射率层的一种硅基光致抗蚀剂聚合物
公开(公告)号：EP1825325A4
公开(公告)日：2010-05-26
申请号：EP05857596
申请日：2005-11-30
申请人： IBM
发明人： HUANG WU-SONG , BURNS SEAN , KHOJASTEH MAHMOUD
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公开(公告)号：EP1678556A4
公开(公告)日：2010-01-13
申请号：EP04796270
申请日：2004-10-22
申请人： IBM
IPC分类号： G03C1/76 , G03F20060101 , G03F7/004 , G03F7/075
CPC分类号： G03F7/0757 , G03F7/0045 , G03F7/0046
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