公开(公告)号：EP0278290A3

公开(公告)日：1990-07-25

申请号：EP88100945.0

申请日：1988-01-22

申请人： International Business Machines Corporation

发明人： Fossum, Eric Roy ,  Pettit, George David ,  Woodall, Jerry Mac Pherson ,  Kirchner, Peter Daniel ,  Warren, Alan Clark

IPC分类号： H01L21/20 ,  H01L21/203 ,  H01L29/72 ,  H01L29/80 ,  H01L21/00

CPC分类号： H01L21/02395 ,  H01L21/02543 ,  H01L21/02546 ,  H01L21/02639 ,  H01L21/2633

摘要： Submicron structure fabrication is accomplished by providing vapor chemical erosion of a compound crystal by suppressing the more volatile elements so that the less volatile element is provided with an anti-­agglomeration and erosion rate limiting capability which can be followed by subsequent regrowth in the same environment. The erosion is sensitive to crystallo­graphic orientation.

公开(公告)号：EP0278290A2

公开(公告)日：1988-08-17

申请号：EP88100945.0

申请日：1988-01-22

申请人： International Business Machines Corporation

发明人： Fossum, Eric Roy ,  Pettit, George David ,  Woodall, Jerry Mac Pherson ,  Kirchner, Peter Daniel ,  Warren, Alan Clark

IPC分类号： H01L21/20 ,  H01L21/203 ,  H01L29/72 ,  H01L29/80 ,  H01L21/00

CPC分类号： H01L21/02395 ,  H01L21/02543 ,  H01L21/02546 ,  H01L21/02639 ,  H01L21/2633

摘要： Submicron structure fabrication is accomplished by providing vapor chemical erosion of a compound crystal by suppressing the more volatile elements so that the less volatile element is provided with an anti-­agglomeration and erosion rate limiting capability which can be followed by subsequent regrowth in the same environment. The erosion is sensitive to crystallo­graphic orientation.

摘要翻译： 亚微米结构的制造是通过抑制更多的挥发性元素来提供化合物晶体的蒸汽化学腐蚀来实现的，从而使挥发性较低的元件具有抗附聚和侵蚀速率限制能力，随后在相同的环境中再生长。 侵蚀对晶体取向敏感。